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58 条记录 (耗时 0.025 秒)

    Bi-layer barrier for photoreceptors
    1.
    发明授权
    Bi-layer barrier for photoreceptors 失效
    光感受器的双层屏障

    公开(公告)号：US5756246A

    公开(公告)日：1998-05-26

    申请号：US897024

    申请日：1997-07-18

    申请人： Edward J. Woo ,  David A. Ender

    发明人： Edward J. Woo ,  David A. Ender

    IPC分类号： G03G5/147

    CPC分类号： G03G5/14795 ,  G03G5/147 ,  G03G5/14704

    摘要： This invention is a photoreceptor element comprising, in order, an electroconductive support, a photoconductive layer, a barrier, and, preferably, a release layer. The barrier is a two layer system comprising:1) adjacent to the photoconductive layer, a non-conductive, charge blocking layer, and 2) over the non-conductive, charge blocking layer, an electrically conductive barrier layer.

    摘要翻译： 本发明是一种感光元件，依次包括导电载体，光电导层，势垒层，优选为释放层。 阻挡层是一个双层体系，包括：1）与光电导层相邻，非导电的电荷阻挡层，和2）在非导电的电荷阻挡层上的导电阻挡层。

    Structured abrasive article and method of making and using the same
    3.
    发明授权
    Structured abrasive article and method of making and using the same 有权
    结构磨料制品及其制造和使用方法

    公开(公告)号：US07410413B2

    公开(公告)日：2008-08-12

    申请号：US11380444

    申请日：2006-04-27

    申请人： Edward J. Woo ,  Craig F. Lamphere ,  Gregory A. Koehnle

    发明人： Edward J. Woo ,  Craig F. Lamphere ,  Gregory A. Koehnle

    IPC分类号： B24D11/00

    CPC分类号： B24D11/001 ,  B24D2203/00

    摘要： A structured abrasive article comprises a backing, a structured abrasive layer affixed to the backing, the structured abrasive layer comprising: a plurality of raised abrasive regions, each raised abrasive region consisting essentially of a close-packed plurality of pyramidal abrasive composites; and a network consisting essentially of close-packed truncated pyramidal abrasive composites, wherein the network continuously abuts and separates the raised abrasive regions from one another. The height of the pyramidal abrasive composites is greater than the height of the truncated pyramidal abrasive composites. Methods of making and using the same are also disclosed.

    摘要翻译： 结构化磨料制品包括背衬，固定到背衬上的结构化磨料层，所述结构化研磨层包括：多个凸起的磨料区域，每个凸起的磨料区域基本上由紧密堆积的多个金字塔形磨料复合材料组成; 以及基本上由紧密堆积的截顶锥形磨料复合材料组成的网络，其中网络将凸起的磨料区域彼此连续地邻接和分离。 锥体磨料复合材料的高度大于截顶棱锥磨料复合材料的高度。 还公开了制备和使用它们的方法。

    Abrasive article and methods of making same
    4.
    发明授权
    Abrasive article and methods of making same 有权
    磨料制品及其制作方法

    公开(公告)号：US07329175B2

    公开(公告)日：2008-02-12

    申请号：US11321505

    申请日：2005-12-29

    申请人： Edward J. Woo ,  Thomas W. Rambosek ,  Curtis J. Schmidt

    发明人： Edward J. Woo ,  Thomas W. Rambosek ,  Curtis J. Schmidt

    IPC分类号： B24D11/00

    CPC分类号： B24D11/02

    摘要： A porous abrasive article that allows air and dust particles to pass through. The abrasive article has a screen abrasive and a porous attachment interface. The screen abrasive has an abrasive layer comprising a plurality of erectly oriented abrasive particles and at least one binder. The porous attachment interface cooperates with the screen abrasive to allow the flow of particles through the abrasive article.

    摘要翻译： 允许空气和灰尘颗粒通过的多孔磨料制品。 磨料制品具有筛网研磨剂和多孔附着界面。 筛网研磨剂具有包括多个直立取向的磨料颗粒和至少一个粘合剂的研磨层。 多孔附着界面与筛网研磨剂配合使颗粒流过磨料制品。

    Release layer for photoreceptors
    7.
    发明授权
    Release layer for photoreceptors 失效
    光感受器释放层

    公开(公告)号：US5733698A

    公开(公告)日：1998-03-31

    申请号：US724073

    申请日：1996-09-30

    申请人： Gaye K. Lehman ,  Claire A. Jalbert ,  Edward J. Woo ,  Kathryn R. Bretscher ,  James A. Baker ,  Mark C. Berens

    发明人： Gaye K. Lehman ,  Claire A. Jalbert ,  Edward J. Woo ,  Kathryn R. Bretscher ,  James A. Baker ,  Mark C. Berens

    IPC分类号： G03G5/147

    CPC分类号： G03G5/14773 ,  G03G5/147 ,  G03G5/14704 ,  G03G5/14708 ,  G03G5/14721 ,  G03G5/14726 ,  G03G5/14734

    摘要： The invention is photoconductor construction comprising a release layer which controls the carrier liquid on the surface of the photoreceptor and minimizes beading of toner carrier liquid. According to one embodiment this invention is a photoconductor construction comprising a photoconductor layer applied to an electroconductive substrate, an interlayer applied to the photoconductor layer, and a release layer over the interlayer. The release layer is a swellable polymer. According to another embodiment this invention is a photoconductor construction comprising a polymeric release layer that has a surface with an average roughness, Ra, of at least 10 nm.

    摘要翻译： 本发明是光电导体结构，其包括释放层，其控制感光体表面上的载体液体并使调色剂载体液体的珠粒最小化。 根据一个实施例，本发明是一种光电导体结构，其包括施加到导电基底的光电导体层，施加到光电导体层的中间层，以及中间层上的释放层。 脱模层是可溶胀聚合物。 根据另一个实施方案，本发明是一种光电导体结构，其包含具有至少10nm的平均粗糙度Ra的表面的聚合物释放层。

    ROTARY BUFFING PAD
    8.
    发明申请
    ROTARY BUFFING PAD 审中-公开
    旋转缓冲垫

    公开(公告)号：US20120258652A1

    公开(公告)日：2012-10-11

    申请号：US13497621

    申请日：2010-11-09

    申请人： Gregory A. Koehnle ,  Scott R. Culler ,  Brant A. Moegenburg ,  Schoen A. Schuknecht ,  Edward J. Woo

    发明人： Gregory A. Koehnle ,  Scott R. Culler ,  Brant A. Moegenburg ,  Schoen A. Schuknecht ,  Edward J. Woo

    IPC分类号： B24D13/14

    CPC分类号： B24B37/26

    摘要： Provided is a flat-faced buffing pad that includes a plurality of apertures of variable size. The apertures are generally larger in the areas toward the center of the pad, while being generally smaller in the areas toward the periphery of the pad. Some embodiments further include apertures disposed along one or more concentric circular rings located along the front surface and generally symmetrical about the rotation axis. These configurations of apertures provide both superior cut performance and superior finish. Moreover, these configurations minimize several undesirable aspects in a polishing operation, such as slinging of the polishing compound, vibration, wobbling, and drag felt by the operator as the rotary pad slides across the surface to be polished.

    摘要翻译： 提供了一种平面抛光垫，其包括多个可变尺寸的孔。 在朝向垫的中心的区域中，孔通常较大，而在朝向垫周边的区域中通常较小。 一些实施例还包括沿着沿着前表面定位并且围绕旋转轴线大致对称的一个或多个同心圆环设置的孔。 孔的这些构造提供了优异的切割性能和优异的光洁度。 此外，这些构造使抛光操作中的几个不期望的方面最小化，例如当旋转垫滑过待抛光表面时抛光化合物的吊带，振动，摆动和由操作者感到的阻力。

    DOATED ABRASIVE ARTICLE AND METHODS OF ABLATING COATED ABRASIVE ATRICLES
    9.
    发明申请
    DOATED ABRASIVE ARTICLE AND METHODS OF ABLATING COATED ABRASIVE ATRICLES 有权
    抛光磨砂制品及其涂敷方法

    公开(公告)号：US20120122383A1

    公开(公告)日：2012-05-17

    申请号：US13377743

    申请日：2010-07-23

    申请人： Edward J. Woo ,  Pingfan Wu ,  Patrick R. Fleming ,  Lan R. Oven ,  Schoen A. Schuknecht ,  Frederick LaPlant

    发明人： Edward J. Woo ,  Pingfan Wu ,  Patrick R. Fleming ,  Lan R. Oven ,  Schoen A. Schuknecht ,  Frederick LaPlant

    IPC分类号： B24D3/00 ,  B24D18/00

    CPC分类号： B24D11/04 ,  B24D11/008 ,  B24D11/02 ,  B41M5/267

    摘要： A coated abrasive article comprises an abrasive layer secured to a backing. The abrasive layer comprises abrasive particles secured by at least one binder to a first major surface of the backing. A supersize is disposed on at least a portion of the abrasive layer. The coated abrasive article has a melt flow zone adjacent to an edge of the coated abrasive article, wherein the melt flow zone has a maximum width of less than 100 micrometers, and the melt flow zone has a maximum height of less than 40 micrometers. Methods of using infrared lasers to ablate coated abrasive articles are also disclosed, wherein a laser wavelength is matched to a component of the coated abrasive article.

    摘要翻译： 涂覆的磨料制品包括固定到背衬的磨料层。 研磨层包括通过至少一个粘合剂固定到背衬的第一主表面的研磨颗粒。 在磨料层的至少一部分上设置超大尺寸。 涂覆的磨料制品具有与涂覆的磨料制品的边缘相邻的熔体流动区域，其中熔体流动区域具有小于100微米的最大宽度，并且熔体流动区域具有小于40微米的最大高度。 还公开了使用红外激光来烧蚀涂覆的磨料制品的方法，其中激光波长与涂覆的磨料制品的组分相匹配。