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    System and method for optimizing optical and digital system designs
    2.
    发明授权
    System and method for optimizing optical and digital system designs 有权
    用于优化光学和数字系统设计的系统和方法

    公开(公告)号：US07860699B2

    公开(公告)日：2010-12-28

    申请号：US12341359

    申请日：2008-12-22

    申请人： Edward R. Dowski, Jr. ,  Gregory E. Johnson ,  Kenneth S. Kubala ,  Kenneth Ashley Macon ,  Goran M. Rauker

    发明人： Edward R. Dowski, Jr. ,  Gregory E. Johnson ,  Kenneth S. Kubala ,  Kenneth Ashley Macon ,  Goran M. Rauker

    IPC分类号： G06G7/48 ,  G06G7/62 ,  G06F17/50 ,  G02B27/44 ,  G02B27/46 ,  G02B27/14

    CPC分类号： G02B27/0025 ,  G02B27/0012

    摘要： A software product includes instructions stored on computer-readable media, that when executed by a computer, perform steps for optimizing an optical system design and a digital system design. The instructions are for simulating an optical model of the optical system design, simulating a digital model of the digital system design, analyzing simulated output of the optical model and simulated output of the digital model, to produce a score, modifying the optical model and the digital model, based upon the score, controlling re-execution of the instructions for simulating the optical model, the instructions for simulating the digital model, the instructions for analyzing and the instructions for modifying to produce an optimized optical model and an optimized digital model, and outputting predicted performance of the optimized optical and digital models.

    摘要翻译： 软件产品包括存储在计算机可读介质上的指令，当由计算机执行时，执行优化光学系统设计和数字系统设计的步骤。 该指令用于模拟光学系统设计的光学模型，模拟数字系统设计的数字模型，分析光学模型的模拟输出和数字模型的模拟输出，以产生分数，修改光学模型和 数字模型，基于分数，控制用于模拟光学模型的指令的重新执行，用于模拟数字模型的指令，用于分析的指令和用于修改的指令以产生优化的光学模型和优化的数字模型， 并输出优化的光学和数字模型的预测性能。

    System And Method For Optimizing Optical And Digital System Designs
    3.
    发明申请
    System And Method For Optimizing Optical And Digital System Designs 有权
    优化光数字系统设计的系统与方法

    公开(公告)号：US20090143874A1

    公开(公告)日：2009-06-04

    申请号：US12341359

    申请日：2008-12-22

    申请人： Edward R. Dowski, JR. ,  Gregory E. Johnson ,  Kenneth S. Kubala ,  Kenneth Ashley Macon ,  Goran M. Rauker

    发明人： Edward R. Dowski, JR. ,  Gregory E. Johnson ,  Kenneth S. Kubala ,  Kenneth Ashley Macon ,  Goran M. Rauker

    IPC分类号： G05B13/04 ,  G06G7/62 ,  G06G7/66

    CPC分类号： G02B27/0025 ,  G02B27/0012

    摘要： A software product includes instructions stored on computer-readable media, that when executed by a computer, perform steps for optimizing an optical system design and a digital system design. The instructions are for simulating an optical model of the optical system design, simulating a digital model of the digital system design, analyzing simulated output of the optical model and simulated output of the digital model, to produce a score, modifying the optical model and the digital model, based upon the score, controlling re-execution of the instructions for simulating the optical model, the instructions for simulating the digital model, the instructions for analyzing and the instructions for modifying to produce an optimized optical model and an optimized digital model, and outputting predicted performance of the optimized optical and digital models.

    摘要翻译： 软件产品包括存储在计算机可读介质上的指令，当由计算机执行时，执行优化光学系统设计和数字系统设计的步骤。 该指令用于模拟光学系统设计的光学模型，模拟数字系统设计的数字模型，分析光学模型的模拟输出和数字模型的模拟输出，以产生分数，修改光学模型和 数字模型，基于分数，控制用于模拟光学模型的指令的重新执行，用于模拟数字模型的指令，用于分析的指令和用于修改的指令以产生优化的光学模型和优化的数字模型， 并输出优化的光学和数字模型的预测性能。

    System and method for optimizing optical and digital system designs
    4.
    发明授权
    System and method for optimizing optical and digital system designs 有权
    用于优化光学和数字系统设计的系统和方法

    公开(公告)号：US07469202B2

    公开(公告)日：2008-12-23

    申请号：US11000819

    申请日：2004-12-01

    申请人： Edward R. Dowski, Jr. ,  Gregory E. Johnson ,  Kenneth S. Kubala ,  Kenneth Ashley Macon ,  Goran M. Rauker

    发明人： Edward R. Dowski, Jr. ,  Gregory E. Johnson ,  Kenneth S. Kubala ,  Kenneth Ashley Macon ,  Goran M. Rauker

    IPC分类号： G06G7/48 ,  G06G7/62 ,  G06F17/50 ,  G02B27/44 ,  G02B27/46 ,  G02B27/14

    CPC分类号： G02B27/0025 ,  G02B27/0012

    摘要： A system, method and software product to optimize optical and/or digital system designs. An optical model of the optical system design is generated. A digital model of the digital system design is generated. Simulated output of the optical and digital models is analyzed to produce a score. The score is processed to determine whether the simulated output achieves one or more goals. One or more properties of at least one of the optical model and the digital model is modified if the goals are not achieved. The analyzing, processing and modifying is repeated until the goals are achieved, and an optimized optical system design and optimized digital system design are generated from the optical and digital models.

    摘要翻译： 一种用于优化光学和/或数字系统设计的系统，方法和软件产品。 生成光学系统设计的光学模型。 产生数字系统设计的数字模型。 对光学和数字模型的模拟输出进行分析，得出分数。 处理得分以确定模拟输出是否达到一个或多个目标。 如果没有实现目标，则修改光学模型和数字模型中的至少一个的一个或多个属性。 重复分析，处理和修改，直到实现目标，并从光学和数字模型生成优化的光学系统设计和优化的数字系统设计。

    Wafer level optical packaging system, and associated method of aligning optical wafers
    7.
    发明授权
    Wafer level optical packaging system, and associated method of aligning optical wafers 有权
    晶圆级光学封装系统以及对准光学晶片的相关方法

    公开(公告)号：US09035406B2

    公开(公告)日：2015-05-19

    申请号：US13113857

    申请日：2011-05-23

    申请人： Goran M. Rauker ,  George C. Barnes, IV

    发明人： Goran M. Rauker ,  George C. Barnes, IV

    IPC分类号： H01L31/0232 ,  G02B7/00 ,  G02B3/00 ,  H01L27/146

    CPC分类号： G02B7/004 ,  G02B3/0068 ,  G02B3/0075 ,  H01L27/14625

    摘要： An optical system has a first relief-type diffraction grating fiducial, or alignment mark, on a transparent surface of a first optical wafer or plate, the grating arranged to deflect light away from an optical path and appear black. The first wafer may have lenses. The first fiducial is aligned to another fiducial on a second wafer having further optical devices as part of system assembly; or the fiducials are aligned to alignment marks or fiducials on an underlying photosensor. Once the optical devices are aligned and the wafers bonded, they are diced to provide aligned optical structures for a completed camera system. Alternatively, an optical wafer is made by aligning a second relief-type diffraction grating fiducial on a first master to a first relief-type diffraction grating fiducial on an optical wafer preform, pressing the first master into a blob to form optical shapes and adhere the blob to the optical wafer preform.

    摘要翻译： 光学系统在第一光学晶片或板的透明表面上具有第一浮雕型衍射光栅基准或对准标记，所述光栅布置成使光偏离光路并且显现为黑色。 第一晶片可以具有透镜。 第一个基准与第二个晶片上的另一个基准对准，其另外的光学装置作为系统组件的一部分; 或者基准面与底层光电传感器上的对准标记或基准对齐。 一旦光学器件对准并且晶片结合，它们被切割以提供用于完成的相机系统的对准的光学结构。 或者，光学晶片是通过将第一母版上的第二浮雕型衍射光栅基准与光学晶片预制件上的第一浮雕型衍射光栅基准对准而制成的，将第一母版压入斑块以形成光学形状， 斑点到光学晶片预制件。

    Wafer Level Optical Packaging System, And Associated Method Of Aligning Optical Wafers
    8.
    发明申请
    Wafer Level Optical Packaging System, And Associated Method Of Aligning Optical Wafers 有权
    晶圆级光学包装系统以及对准光学晶片的关联方法

    公开(公告)号：US20120299138A1

    公开(公告)日：2012-11-29

    申请号：US13113857

    申请日：2011-05-23

    申请人： Goran M. Rauker ,  George C. Barnes, IV

    发明人： Goran M. Rauker ,  George C. Barnes, IV

    IPC分类号： H01L31/0232 ,  B29D11/00 ,  H01L31/18

    CPC分类号： G02B7/004 ,  G02B3/0068 ,  G02B3/0075 ,  H01L27/14625

    摘要： An optical system has a first relief-type diffraction grating fiducial, or alignment mark, on a transparent surface of a first optical wafer or plate, the grating arranged to deflect light away from an optical path and appear black. The first wafer may have lenses. The first fiducial is aligned to another fiducial on a second wafer having further optical devices as part of system assembly; or the fiducials are aligned to alignment marks or fiducials on an underlying photosensor. Once the optical devices are aligned and the wafers bonded, they are diced to provide aligned optical structures for a completed camera system. Alternatively, an optical wafer is made by aligning a second relief-type diffraction grating fiducial on a first master to a first relief-type diffraction grating fiducial on an optical wafer preform, pressing the first master into a blob to form optical shapes and adhere the blob to the optical wafer preform.

    摘要翻译： 光学系统在第一光学晶片或板的透明表面上具有第一浮雕型衍射光栅基准或对准标记，所述光栅布置成使光偏离光路并且显现为黑色。 第一晶片可以具有透镜。 第一个基准与第二个晶片上的另一个基准对准，其另外的光学装置作为系统组件的一部分; 或者基准面与底层光电传感器上的对准标记或基准对齐。 一旦光学器件对准并且晶片结合，它们被切割以提供用于完成的相机系统的对准的光学结构。 或者，光学晶片是通过将第一母版上的第二浮雕型衍射光栅基准与光学晶片预制件上的第一浮雕型衍射光栅基准对准而制成的，将第一母版按压成斑块以形成光学形状， 斑点到光学晶片预制件。