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公开(公告)号：US6143460A
公开(公告)日：2000-11-07
申请号：US314124
申请日：1999-05-19
CPC分类号： G03F7/0045 , G03F7/039 , Y10S430/106
摘要： A novel diazodisulfone compound capable of generating acid having high sensitivity to far ultraviolet rays typified by a KrF excimer laser and the like and capable of providing a resist with superior resolution and patterns when used as a photoacid generator for a chemically amplified resist, and a radiation-sensitive resin composition comprising the diazodisulfone compound. The diazodisulfone compound is represented by the following formulas (1) and (2). ##STR1## The radiation-sensitive resin composition comprises the diazodisulfone compound and resin represented by 4-hydroxystyrene/4-(1'-ethoxyethoxy)styrene copolymer.
摘要翻译： 一种能够产生以KrF准分子激光器等为代表的远紫外线具有高灵敏度的酸并且当用作化学放大抗蚀剂的光酸产生剂时能够提供具有优异分辨率和图案的抗蚀剂的新型重氮二砜化合物， 包含重氮二砜化合物的敏感性树脂组合物。 重氮二砜化合物由下式（1）和（2）表示。 辐射敏感性树脂组合物包含重氮二砜化合物和由4-羟基苯乙烯/ 4-（1'-乙氧基乙氧基）苯乙烯共聚物表示的树脂。
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2.发明申请Positive Photosensitive Insulating Resin Composition And Cured Product Thereof 审中-公开正极敏感绝缘树脂组合物及其固化产品公开(公告)号：US20080097032A1
公开(公告)日：2008-04-24
申请号：US11718303
申请日：2005-10-28
IPC分类号： C08G73/00
CPC分类号： C08F212/14 , C08F8/12 , C08F212/12 , C08F2220/281 , C08G8/38 , C08J5/18 , C08K5/28 , C08L25/18 , C08L61/06 , C09D125/18 , G03F7/0226 , G03F7/0233 , G03F7/0751 , G03F7/40 , C08F112/14 , C08L2666/14 , C08F212/08
摘要： Disclosed is a positive photosensitive insulating resin composition which comprises: (A) a copolymer comprising (A1) 10 to 99 mol % of a structural unit of the formula (1) and (A2) 90 to 1 mol % of a structural unit of the formula (2); (B) a quinone diazide group-containing compound; (C) at least one compound selected from the group consisting of (C1) an aromatic compound containing a methylol group and/or an alkoxy methyl group (except for aromatic compounds containing an amino group), (C2) an aromatic aldehyde compound, (C3) an aliphatic aldehyde compound, (C4) an alkyl-etherified amino group-containing compound and (C5) an epoxy group-containing compound; (D) a solvent; and (E) an adhesion assistant. Disclosed also is a cured product obtainable from the composition. wherein Ra and Rb are each an alkyl group having 1 to 4 carbon atoms, alkoxy group or aryl group, Rb and Rc are each hydrogen or a methyl group, n is an integer of 0 to 3 and m is an integer of 1 to 3. The cured product has excellent resolution, electrical insulating properties, thermal shock resistance, adhesion and other properties.
摘要翻译： 公开了一种正性感光性绝缘性树脂组合物，其包含：（A）包含（A1）10〜99摩尔％的式（1）和（A2）的结构单元的共聚物，90〜1摩尔％的结构单元 公式（2）; （B）含醌二叠氮基的化合物; （C）至少一种选自（C1）含有羟甲基和/或烷氧基甲基的芳族化合物（除了含有氨基的芳香族化合物之外）的化合物，（C2）芳族醛化合物，（ C3）脂族醛化合物，（C4）烷基醚化氨基化合物和（C5）含环氧基化合物; （D）溶剂; 和（E）粘附助剂。 还公开了可从该组合物获得的固化产物。 其中，Ra和Rb分别为碳原子数1〜4的烷基，烷氧基或芳基，Rb和Rc分别为氢或甲基，n为0〜3的整数，m为1〜3的整数。 固化产品具有优异的分辨率，电绝缘性能，耐热冲击性，附着力等特性。
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公开(公告)号：US6136500A
公开(公告)日：2000-10-24
申请号：US135855
申请日：1998-08-18
CPC分类号： G03F7/004 , Y10S430/115 , Y10S430/122
摘要： Positive as well as negative radiation sensitive resin compositions that, in addition to being capable of providing excellent resolution and pattern profile, are particularly excellent in avoiding the problems of "nano-edge roughness" or "coating surface roughness". The positive type radiation sensitive resin composition comprises (A) (a) an acid-decomposable group-containing resin, or (b) an alkali-soluble resin and an alkali dissolution controller, and (B) a photoacid generator comprising "a compound that upon exposure to radiation generates a carboxylic acid having a boiling point of 150.degree. C. or higher", and "a compound that upon exposure to radiation generates an acid other than a carboxylic acid". The negative type radiation sensitive resin composition comprises (C) an alkali-soluble resin, (D) a cross-linking agent, and the component (B) as described above.
摘要翻译： 除了能够提供优异的分辨率和图案轮廓之外，正面和负面的辐射敏感性树脂组合物在避免“纳米边缘粗糙度”或“涂层表面粗糙度”的问题方面特别优异。 正型辐射敏感性树脂组合物包含（A）（a）含酸可分解基团的树脂，或（b）碱溶性树脂和碱溶解控制剂，和（B）光酸产生剂，其包含“ 暴露于辐射后会产生沸点为150℃以上的羧酸“，”暴露于辐射后的化合物会产生羧酸以外的酸“。 负型辐射敏感性树脂组合物包含（C）碱溶性树脂，（D）交联剂和如上所述的组分（B）。
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公开(公告)号：US6120972A
公开(公告)日：2000-09-19
申请号：US136051
申请日：1998-08-18
CPC分类号： G03F7/0045 , G03F7/039
摘要： A radiation-sensitive resin composition comprising (A) a copolymer which comprises (a) a repeating unit (I) formed by cleavage of a carbon--carbon double bond of a monomer having one polymerizable carbon--carbon double bond and (b) a repeating unit (II) formed by cleavage of a carbon--carbon double bond of a monomer having two or more polymerizable carbon--carbon double bonds and at least one divalent group decomposed by an acid of the following formulas (1) or (2), ##STR1## wherein R.sup.1, R.sup.2, R.sup.3 and R.sup.4 are an alkyl group having 1-5 carbon atoms or an aryl group having 6-14 carbon atoms individually, said monomer having a structure in which each carbon--carbon double bond combines via said divalent group, and (B) a photoacid generator. The radiation-sensitive resin composition exhibits excellent sensitivity and resolution, fewer effect from the swing curves, excellent pattern profile, and superior heat resistance, high sensitivity to ultraviolet rays, far ultraviolet rays, X-rays, and various types of radiation such as charged particle rays, and is useful as a chemically amplified positive tone resist used in the manufacture of integrated circuit devices.
摘要翻译： 一种辐射敏感性树脂组合物，其包含（A）共聚物，其包含（a）通过裂解具有一个可聚合碳 - 碳双键的单体的碳 - 碳双键形成的重复单元（I）和（b）重复 通过裂解具有两个或多个可聚合碳 - 碳双键的单体的碳 - 碳双键形成的单元（II）和由下式（1）或（2）的酸分解的至少一个二价基团，其中 R1，R2，R3和R4分别是具有1-5个碳原子的烷基或具有6-14个碳原子的芳基，所述单体具有其中每个碳 - 碳双键通过所述二价基团结合的结构和（ B）光致酸发生器。 辐射敏感性树脂组合物表现出优异的灵敏度和分辨率，较少的挥发曲线影响，优异的图案轮廓和优异的耐热性，对紫外线，远紫外线，X射线以及各种类型的辐射如带电的高灵敏度 粒子射线，并且可用作用于制造集成电路器件的化学放大正色调抗蚀剂。
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公开(公告)号：US06235446B1
公开(公告)日：2001-05-22
申请号：US09134163
申请日：1998-08-14
IPC分类号： G03F7004
CPC分类号： G03F7/039 , G03F7/0045 , Y10S430/106 , Y10S430/111
摘要： A radiation sensitive resin composition comprising (A) a copolymer possessing recurring units of the formulas (1), (2), and (3), which turns alkali soluble in the presence of acid and (B) a photosensitive acid generator. Because the composition can resolve line-and-space patterns, isolated patterns, and contact hole patterns with satisfactory appearance and high resolution, it is useful as a chemically amplified positive resist for use in the manufacture of semiconductor devices.
摘要翻译： 一种辐射敏感性树脂组合物，其包含（A）具有式（1），（2）和（3）的重复单元的共聚物，其在酸的存在下使碱溶解，并且（B）感光酸产生剂。 因为该组合物可以分辨线和空间图案，隔离图案和具有令人满意的外观和高分辨率的接触孔图案，因此它可用作用于制造半导体器件的化学放大型正性抗蚀剂。
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公开(公告)号：US5994022A
公开(公告)日：1999-11-30
申请号：US965432
申请日：1997-11-06
IPC分类号： G03F7/004 , G03F7/039 , H01L21/027
CPC分类号： G03F7/039 , G03F7/0045 , Y10S430/106 , Y10S430/109 , Y10S430/111 , Y10S430/121
摘要： A radiation sensitive resin composition useful as a chemically amplified positive tone resist is provided. The composition comprises (A) a copolymer which becomes soluble in an alkali developing solution by the action of an acid, the copolymer containing a recurring unit (I) having a structure which is decomposed by the action of an acid and increases the solubility in an alkaline developing solution and a recurring unit(II) obtained from a compound having at least two (meth)acryloyl groups in the molecule by the cleavage of the carbon-carbon double bond, and (B) a photoacid generator which produces an acid on being irradiated by a radiation. The composition exhibits high resolution, superb capability of producing superior pattern forms, and excellent resistance to PED, and high process stability, is affected by a standing wave only to a minimum extent, and possessed prominent heat resistance.
摘要翻译： 提供了可用作化学放大正性抗蚀剂的辐射敏感性树脂组合物。 该组合物包含（A）通过酸作用而变得可溶于碱性显影液的共聚物，该共聚物含有具有通过酸作用分解的结构的重复单元（I），并增加其在 碱性显影液和通过裂解碳 - 碳双键从分子中具有至少两个（甲基）丙烯酰基的化合物获得的重复单元（II），和（B）产生酸的光致酸产生剂 用辐射照射。 该组合物表现出高分辨率，优异的图案形式的出色能力和优异的耐PED性，并且工艺稳定性高，仅受驻波的影响最小，具有显着的耐热性。
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公开(公告)号：US5952150A
公开(公告)日：1999-09-14
申请号：US892200
申请日：1997-07-14
CPC分类号： G03F7/038 , G03F7/0045 , G03F7/039 , Y10S430/122 , Y10S430/128
摘要： A positive-tone or negative-tone radiation sensitive resin composition which allows easy preparation of a resist, exhibits superior storage stability, high sensitivity, and high resolution capability, and is capable of producing excellent resist patterns. The positive-tone type composition comprises (A) a disulfonylmethane derivative in which the main chain with two sulfonyl groups bonded forms a three to eleven member cyclic carbon structure and (B) (a) a resin protected by an acid decomposable group or (b) an alkali-soluble resin and an alkali-solubility control agent. The negative-tone type composition comprises the component (A), (C) an alkali-soluble resin, and (D) a cross-linking agent.
摘要翻译： 可以容易地制备抗蚀剂的正色调或负色度辐射敏感性树脂组合物，显示出优异的储存稳定性，高灵敏度和高分辨能力，并且能够产生优异的抗蚀剂图案。 正调型组合物包含（A）二磺酰基甲烷衍生物，其中具有两个磺酰基键合的主链形成三至十一个环状碳结构，（B）（a）由酸可分解基团保护的树脂或（b ）碱溶性树脂和碱溶性控制剂。 负色型组合物包含组分（A），（C）碱溶性树脂和（D）交联剂。
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8.发明授权Acrylic copolymer and reflection-preventing film-forming composition containing the same 有权丙烯酸共聚物和含有它的防反射膜成膜组合物公开(公告)号：US06242161B1
公开(公告)日：2001-06-05
申请号：US09320450
申请日：1999-05-27
申请人： Kazuo Kawaguchi , Akio Saito , Shin-ichiro Iwanaga
发明人： Kazuo Kawaguchi , Akio Saito , Shin-ichiro Iwanaga
IPC分类号： G03F711
CPC分类号： G03F7/091 , C08F220/18 , C08F220/58 , Y10T428/1462 , Y10T428/1471
摘要： A reflection-preventing film-forming composition including a copolymer having structural units represented by the following general formulas (1) and (2) and a solvent: wherein R1 represents a hydrogen atom, a halogen atom, a hydrocarbon group, etc.; R2 represents a hydrogen atom or a methyl group; and m represents an integer of 1 to 9; wherein R3 represents a hydrogen atom or a methyl group, and R4 represents a hydrogen atom or an organic group. Reflection-preventing films formed of this composition have a high reflection-preventing effect, may cause no intermixing with the resist, have a high etching rate and also can form a resist pattern having superior resolution and precision.
摘要翻译： 一种防反射膜成型组合物，其包含具有由以下通式（1）和（2）表示的结构单元的共聚物和溶剂：其中R1表示氢原子，卤素原子，烃基等; R2表示氢原子或甲基; m表示1〜9的整数，R 3表示氢原子或甲基，R 4表示氢原子或有机基团。 由该组合物形成的防反射膜具有高防反射效果，可能不会与抗蚀剂混合，蚀刻速度高，并且还可以形成具有优异分辨率和精度的抗蚀剂图案。
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公开(公告)号：US6007961A
公开(公告)日：1999-12-28
申请号：US988068
申请日：1997-12-10
CPC分类号： G03F7/022
摘要： A radiation-sensitive resin composition including an alkali soluble resin and a quinonediazide compound is provided. The quinonediazide compound has the formula (1), for example: ##STR1## wherein, R.sup.1 to R.sup.6 are an alkyl, cycloalkyl or aryl group; a and b are an integer of 1 to 3; D.sup.1 and D.sup.2 are independently a hydrogen atom or a 1,2-quinonediazidosulfonyl group, provided that at least one of D.sup.1 is a 1,2-quinonediazidosulfonyl group; A is a bonding such as single bond; and x and y are an integer of 0 to 2. The composition is suitable as a positive resist, which effectively restrains the occurrence of scum, and excellent in developability, pattern shape, sensitivity, resolution and focus latitude.
摘要翻译： 提供了包含碱溶性树脂和醌二叠氮化合物的辐射敏感性树脂组合物。 醌二叠氮化合物具有式（1），例如：其中，R 1至R 6为烷基，环烷基或芳基; a和b为1〜3的整数， D1和D2独立地为氢原子或1,2-醌二叠氮基磺酰基，条件是D1中的至少一个为1,2-醌二叠氮基磺酰基; A是单键键合; x和y为0〜2的整数。该组合物适合作为正性抗蚀剂，其有效地抑制浮渣的发生，显影性，图案形状，灵敏度，分辨率和聚焦纬度优异。
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10.发明授权Rubber composition comprising a thermosetting resin and a functional rubber-like copolymer 失效包含热固性树脂和功能橡胶状共聚物的橡胶组合物
公开(公告)号：US4599382A
公开(公告)日：1986-07-08
申请号：US714032
申请日：1985-03-20
IPC分类号： C08F236/04 , C08L19/00 , C08L33/06 , C08L61/00 , C08L61/10
CPC分类号： C08L19/006 , C08F236/04 , C08L33/062 , C08L61/00 , C08L61/06 , C08L61/24 , C08L61/28
摘要： A rubber composition consisting essentially of 5-99 parts by weight of a thermosetting resin and 94-1 parts by weight of one of the following functional rubber-like copolymers (I) to (III) having a Mooney viscosity ML.sub.1+4.sup.100 of 20-120:(I) a functional rubber-like copolymer consisting of 1-20% by weight of a monomer having epoxy groups, hydroxyl groups or amino groups, 15-50% by weight of acrylonitrile and 40-80% by weight of butadiene and/or isoprene as monomer units constituting the polymer,(II) a functional rubber-like copolymer consisting of 1-20% by weight of a monomer having epoxy groups, hydroxyl groups or amino groups, 40-99% by weight of an alkyl (meth)acrylate and/or an alkoxyalkyl (meth)acrylate and 0-30% by weight of monomers copolymerizable therewith other than butadiene and isoprene, as the monomer units constituting the polymer, and(III) a functional rubber-like copolymer consisting of 1-20% by weight of a monomer having epoxy groups, hydroxyl groups or amino groups, 15-50% by weight of acrylonitrile, 20-60% by weight of butadiene and/or isoprene and 5-65% by weight of an alkyl (meth)acrylate and/or an alkoxy (meth)acrylate as the monomer units constituting the polymer.Said functional rubber copolymer may include 10% by weight or less of a polyfunctional monomer as a monomer unit constituting the polymer. In this case, the ratio of the thermosetting resin to the functional rubber-like copolymer is 50-99 parts by weight of the former to 1-50 parts by weight of the latter.
摘要翻译： 基本上由5-99重量份的热固性树脂和94-1重量份具有门尼粘度ML1 + 4100为20〜20的功能性橡胶状共聚物（I）〜（III）之一组成的橡胶组合物， 120：（I）由1-20重量％的具有环氧基，羟基或氨基的单体，15-50重量％的丙烯腈和40-80重量％的丁二烯组成的功能性橡胶状共聚物，以及 /或异戊二烯作为构成聚合物的单体单元，（II）由1-20重量％的具有环氧基，羟基或氨基的单体组成的官能橡胶状共聚物，40-99重量％的烷基（ （甲基）丙烯酸酯和/或（甲基）丙烯酸烷氧基烷基酯和0-30重量％的除丁二烯和异戊二烯之外可共聚的单体作为构成聚合物的单体单元，和（III）由1 -20重量％的具有环氧基，羟基或氨基的单体，15 -50重量％的丙烯腈，20-60重量％的丁二烯和/或异戊二烯和5-65重量％的（甲基）丙烯酸烷基酯和/或烷氧基（甲基）丙烯酸酯作为构成聚合物的单体单元 。 所述功能橡胶共聚物可以包含10重量％以下的作为构成聚合物的单体单元的多官能单体。 在这种情况下，热固性树脂与官能橡胶状共聚物的比例为前者的50-99重量份，后者的1-50重量份。
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