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23 条记录 (耗时 0.031 秒)

    Process for recovering uranium and/or thorium from a liquid containing uranium and/or thorium
    1.
    发明授权
    Process for recovering uranium and/or thorium from a liquid containing uranium and/or thorium 失效
    从含铀和/或钍的液体中回收铀和/或钍的工艺

    公开(公告)号：US4338286A

    公开(公告)日：1982-07-06

    申请号：US143116

    申请日：1980-04-23

    申请人： Eiichiro Nakai ,  Hiroshi Kojima ,  Shoichi Tanaka ,  Toshiyuki Kai ,  Shinichi Hasegawa

    发明人： Eiichiro Nakai ,  Hiroshi Kojima ,  Shoichi Tanaka ,  Toshiyuki Kai ,  Shinichi Hasegawa

    IPC分类号： C01B15/047 ,  C01F15/00 ,  C01G43/00 ,  C01G43/01 ,  G21F9/06 ,  G21F9/10 ,  C01G56/00

    CPC分类号： C01B15/0475 ,  C01F15/00 ,  C01G43/00 ,  C01G43/01 ,  G21F9/10 ,  C01P2006/80

    摘要： A process for recovering uranium and/or thorium from a liquid containing uranium and/or thorium is disclosed, which comprises making a precipitate composed mainly of amorphous silica formed by adding water glass to the liquid containing uranium and/or thorium, capturing the uranium and/or thorium in the liquid by the precipitate, treating the precipitate with acid to elute the captured uranium and/or thorium, adding ammonia or hydrogen peroxide to an acidic solution containing the eluted uranium and/or thorium to form a precipitate composed of ammonium salt or peroxide of the uranium and/or thorium, and filtering out the ammonium salt or peroxide precipitate. Thus, high purity solid uranium and/or thorium reutilizable for manufacture of nuclear fuel material can be recovered in high yield.

    摘要翻译： 公开了一种从含有铀和/或钍的液体中回收铀和/或钍的方法，其中包括通过向含有铀和/或钍的液体中加入水玻璃而形成主要由无定形二氧化硅组成的沉淀物，捕获铀和 /或通过沉淀物处理液体中的钍，用酸处理沉淀物以洗脱捕获的铀和/或钍，向含有洗脱的铀和/或钍的酸性溶液中加入氨或过氧化氢以形成由铵盐 或铀和/或钍的过氧化物，并过滤出铵盐或过氧化物沉淀物。 因此，可以以高产率回收用于制造核燃料材料的高纯度固体铀和/或钍。

    FUNCTIONAL FOOD FOR AMELIORATING ENGOGENOUS MELATONIN SECRETION RHYTHM AND FUNCTIONAL FOOD FOR AMELIORATING CIRCADIAN RHYTHM
    3.
    发明申请
    FUNCTIONAL FOOD FOR AMELIORATING ENGOGENOUS MELATONIN SECRETION RHYTHM AND FUNCTIONAL FOOD FOR AMELIORATING CIRCADIAN RHYTHM 审中-公开
    功能性食品，用于调理植物油分泌蛋白质和功能性食品

    公开(公告)号：US20070207134A1

    公开(公告)日：2007-09-06

    申请号：US10599446

    申请日：2005-03-31

    申请人： Yoshinori Moriyama ,  Seiji Tsuboi ,  Akihiro Masuyama ,  Toshiaki Takano ,  Keita Ueno ,  Toshiyuki Kai

    发明人： Yoshinori Moriyama ,  Seiji Tsuboi ,  Akihiro Masuyama ,  Toshiaki Takano ,  Keita Ueno ,  Toshiyuki Kai

    IPC分类号： A61K35/74 ,  A61K38/17

    CPC分类号： A61K35/747 ,  A23L33/10 ,  A61K35/20

    摘要： The invention provides agents for phase-adjusting or enhancing the amplitude of an endogenous melatonin secretion rhythm and for improving a circadian rhythm, which may be taken daily and continuously, have excellent safety, and may effectively prevent or ameliorate disorders of an endogenous melatonin secretion rhythm or of a circadian rhythm without administration of exogenous melatonin, as well as functional food containing such an agent, which may prevent or ameliorate various symptoms, such as sleep disorder or prolonged sleep latency. The agent for phase-adjusting or enhancing the amplitude of an endogenous melatonin secretion rhythm according to the invention contains whey as the active component. The functional food for improving an endogenous melatonin secretion rhythm according to the invention contains the agent for phase-adjusting or enhancing the amplitude of an endogenous melatonin secretion rhythm. The functional food for improving a circadian rhythm contains the agent for improving a circadian rhythm.

    摘要翻译： 本发明提供用于相位调节或增强内源性褪黑激素分泌节律的振幅并改善可以每天和连续摄取的昼夜节律的药剂，具有优异的安全性，并且可以有效地预防或改善内源性褪黑激素分泌节律的病症 或不伴有外源性褪黑激素的昼夜节律，以及含有这种药剂的功能食品，其可以预防或改善诸如睡眠障碍或延长睡眠潜伏期的各种症状。 根据本发明的用于相位调节或增强内源性褪黑激素分泌节律的幅度的试剂含有乳清作为活性成分。 根据本发明的用于改善内源性褪黑激素分泌节律的功能性食物含有用于相位调节或增强内源性褪黑素分泌节律的幅度的试剂。 用于改善昼夜节律的功能性食物包含用于改善昼夜节律的药剂。

    Method of forming pattern, composition for forming upper-layer film, and composition for forming under-layer film
    4.
    发明授权
    Method of forming pattern, composition for forming upper-layer film, and composition for forming under-layer film 有权
    形成图案的方法，用于形成上层膜的组合物和用于形成底层膜的组合物

    公开(公告)号：US08119324B2

    公开(公告)日：2012-02-21

    申请号：US12375915

    申请日：2007-07-27

    申请人： Hikaru Sugita ,  Nobuji Matsumura ,  Daisuke Shimizu ,  Toshiyuki Kai ,  Tsutomu Shimokawa

    发明人： Hikaru Sugita ,  Nobuji Matsumura ,  Daisuke Shimizu ,  Toshiyuki Kai ,  Tsutomu Shimokawa

    IPC分类号： G03F7/00 ,  G03F7/004 ,  G03F7/20 ,  G03F7/26 ,  G03F7/40

    CPC分类号： G03F7/11 ,  G03F7/0045 ,  G03F7/0757 ,  G03F7/265

    摘要： A pattern formation method suitable for forming micro-patterns using electron beams (EB), X-rays, or extreme ultraviolet radiation (EUV) is provided. The method includes the following steps in the following order: (1) a step of forming and curing a under-layer film containing a radiation-sensitive acid generator which generates an acid upon exposure to radiation on a substrate, (2) a step of irradiating the under-layer film with radiation through a mask to cause an acid to be selectively generated in the exposed area of the under-layer film, (3) a step of forming an upper-layer film which does not contain a radiation-sensitive acid generator, but contains a composition capable of polymerization or crosslinking by the action of an acid, (4) a step of forming a cured film by polymerization or crosslinking selectively in the area of the upper-layer film corresponding to the area of the under-layer film in which the acid has been generated, and (5) a step of removing the area of the upper-layer film corresponding to the area of the under-layer film in which the acid has not been generated.

    摘要翻译： 提供了适用于使用电子束（EB），X射线或极紫外线（EUV）形成微图案的图形形成方法。 该方法按以下顺序包括以下步骤：（1）形成和固化含有辐射敏感性酸产生剂的底层膜的步骤，所述辐射敏感酸产生剂在暴露于基材上时产生酸，（2）步骤 通过掩模用辐射照射底层膜以在底层膜的暴露区域中选择性地产生酸，（3）形成不含辐射敏感性的上层膜的步骤 酸产生剂，但含有能够通过酸的作用聚​​合或交联的组合物，（4）通过聚合或选择性地在上层膜对应于下面的区域的区域中选择性地交联固化膜的步骤 产生酸的层 - 膜，以及（5）除去与未生成酸的下层膜的面积对应的上层膜的面积的工序。

    Radiation-sensitive composition and process for producing low-molecular compound for use therein
    8.
    发明授权
    Radiation-sensitive composition and process for producing low-molecular compound for use therein 有权
    辐射敏感组合物及其制备用于其中的低分子化合物的制备方法

    公开(公告)号：US08361691B2

    公开(公告)日：2013-01-29

    申请号：US12439860

    申请日：2007-08-28

    申请人： Nobuji Matsumura ,  Daisuke Shimizu ,  Toshiyuki Kai

    发明人： Nobuji Matsumura ,  Daisuke Shimizu ,  Toshiyuki Kai

    IPC分类号： G03F7/004 ,  G03F7/039 ,  C07C309/12 ,  C07C381/12 ,  C07C69/96 ,  H01L21/027

    CPC分类号： G03F7/004 ,  C07C309/12 ,  C07C381/12 ,  G03F7/0045

    摘要： A radiation-sensitive composition contains (A) a low-molecular-weight compound having one or more acid-dissociable groups which decompose by the action of an acid to enhance solubility in an alkaline developing solution and one or more radiation-sensitive acid-generating groups which generate an acid upon application of an active ray or radiation per molecule, and having a polystyrene-reduced number-average molecular weight (Mn) measured by gel permeation chromatography (GPC) of 500 to 4,000, and (B) a solvent.

    摘要翻译： 辐射敏感性组合物包含（A）具有一个或多个酸解离基团的低分子量化合物，其通过酸的作用分解以增强在碱性显影溶液中的溶解度和一种或多种辐射敏感的产酸 并且通过凝胶渗透色谱法（GPC）测定的聚苯乙烯换算的数均分子量（Mn）为500〜4000，以及（B）溶剂，在每分子施用活性射线或辐射时产生酸的基团。

    Method of forming pattern and composition for forming of organic thin-film for use therein
    10.
    发明授权
    Method of forming pattern and composition for forming of organic thin-film for use therein 有权
    形成用于形成有机薄膜的图案和组合物的方法

    公开(公告)号：US08173348B2

    公开(公告)日：2012-05-08

    申请号：US12305893

    申请日：2007-06-21

    申请人： Daisuke Shimizu ,  Hikaru Sugita ,  Nobuji Matsumura ,  Toshiyuki Kai ,  Tsutomu Shimokawa

    发明人： Daisuke Shimizu ,  Hikaru Sugita ,  Nobuji Matsumura ,  Toshiyuki Kai ,  Tsutomu Shimokawa

    IPC分类号： G03F7/00 ,  G03F7/004 ,  G03F7/075 ,  G03F7/40

    CPC分类号： C07D333/18 ,  G03F7/0045 ,  G03F7/0757 ,  G03F7/265

    摘要： A method for forming a pattern contains (1) a step of forming an underlayer film containing (A) a radiation-sensitive acid generator capable of generating an acid upon exposure to radiation rays or (B) a radiation-sensitive base generator capable of generating a base upon exposure to radiation rays on a substrate; (2) a step of irradiating the underlayer film with radiation rays through a mask with a predetermined pattern to obtain an exposed underlayer film portion having been selectively exposed through the predetermined pattern; (3) a step of forming (C) an organic thin film on the underlayer film so as to attain chemical bonding of the exposed underlayer film portion with the organic thin-film formed on the exposed underlayer film portion; and (4) a step of removing the organic thin film formed on areas of the underlayer film other than the exposed underlayer film portion.

    摘要翻译： 形成图案的方法包括（1）形成下层膜的步骤，其含有（A）在暴露于辐射线时能够产生酸的辐射敏感性酸产生剂，或（B）能够产生 基底上暴露于辐射线; （2）通过具有预定图案的掩模的辐射线照射下层膜以获得通过预定图案选择性曝光的曝光的下层膜部分的步骤; （3）在下层膜上形成（C）有机薄膜以使曝光的下层膜与形成在曝光的下层膜部上的有机薄膜化学接合的工序; 以及（4）除去在下层膜以外的形成在有机薄膜上的除了曝光的下层膜部分以外的部分的工序。