公开(公告)号：US20080278702A1

公开(公告)日：2008-11-13

申请号：US11797901

申请日：2007-05-08

申请人： Engelbertus Antonius Fransiscus Van Der Pasch ,  Emiel Jozef Melanie Eussen ,  Stefan Gertrud Marie Hendriks ,  Erik Roelof Loopstra ,  Jacob Willem Vink ,  Ruud Antonius Catharina Maria Beerens ,  Lodewijk Alexander Schijvenaars ,  Tom Van Zutphen

发明人： Engelbertus Antonius Fransiscus Van Der Pasch ,  Emiel Jozef Melanie Eussen ,  Stefan Gertrud Marie Hendriks ,  Erik Roelof Loopstra ,  Jacob Willem Vink ,  Ruud Antonius Catharina Maria Beerens ,  Lodewijk Alexander Schijvenaars ,  Tom Van Zutphen

IPC分类号： G03B27/42

CPC分类号： G03F7/70775 ,  G03F7/70516

摘要： A method for calibrating an auxiliary sensor system is provided. The auxiliary sensor system measures a position of a grating relative to a reference, the grating forming part of an encoder measurement system. The encoder measurement system is adapted to measure a position of a substrate table of a lithographic apparatus and further comprises a sensor mounted to the substrate table. The method comprises exciting the grating to make a movement in at least one measurement direction of the auxiliary sensor system, obtaining an auxiliary sensor system output signal from the sensor system during the movement, and adjusting a parameter of the auxiliary sensor system based on the output signal obtained during the movement to thereby calibrate the auxiliary sensor system.

摘要翻译： 提供了一种用于校准辅助传感器系统的方法。 辅助传感器系统测量光栅相对于参考的位置，光栅形成编码器测量系统的一部分。 编码器测量系统适于测量光刻设备的衬底台的位置，还包括安装到衬底台的传感器。 该方法包括激励光栅以在辅助传感器系统的至少一个测量方向上移动，在运动期间从传感器系统获得辅助传感器系统输出信号，并且基于输出调整辅助传感器系统的参数 信号，从而校准辅助传感器系统。

公开(公告)号：US07999912B2

公开(公告)日：2011-08-16

申请号：US11797901

申请日：2007-05-08

申请人： Engelbertus Antonius Fransiscus Van Der Pasch ,  Emiel Jozef Melanie Eussen ,  Stefan Gertrud Marie Hendriks ,  Erik Roelof Loopstra ,  Jacob Willem Vink ,  Ruud Antonius Catharina Maria Beerens ,  Lodewijk Alexander Schijvenaars ,  Tom Van Zutphen

发明人： Engelbertus Antonius Fransiscus Van Der Pasch ,  Emiel Jozef Melanie Eussen ,  Stefan Gertrud Marie Hendriks ,  Erik Roelof Loopstra ,  Jacob Willem Vink ,  Ruud Antonius Catharina Maria Beerens ,  Lodewijk Alexander Schijvenaars ,  Tom Van Zutphen

IPC分类号： G03B27/42

CPC分类号： G03F7/70775 ,  G03F7/70516

摘要： A method for calibrating an auxiliary sensor system is provided. The auxiliary sensor system measures a position of a grating relative to a reference, the grating forming part of an encoder measurement system. The encoder measurement system is adapted to measure a position of a substrate table of a lithographic apparatus and further comprises a sensor mounted to the substrate table. The method comprises exciting the grating to make a movement in at least one measurement direction of the auxiliary sensor system, obtaining an auxiliary sensor system output signal from the sensor system during the movement, and adjusting a parameter of the auxiliary sensor system based on the output signal obtained during the movement to thereby calibrate the auxiliary sensor system.

摘要翻译： 提供了一种用于校准辅助传感器系统的方法。 辅助传感器系统测量光栅相对于参考的位置，光栅形成编码器测量系统的一部分。 编码器测量系统适于测量光刻设备的衬底台的位置，还包括安装到衬底台的传感器。 该方法包括激励光栅以在辅助传感器系统的至少一个测量方向上移动，在运动期间从传感器系统获得辅助传感器系统输出信号，并且基于输出调整辅助传感器系统的参数 信号，从而校准辅助传感器系统。

公开(公告)号：US06977461B2

公开(公告)日：2005-12-20

申请号：US10735605

申请日：2003-12-15

申请人： Stefan Gertrud Marie Hendriks ,  Thomas Augustus Mattaar ,  Gerardus Jacobus Cornelis Catharina Maria Leenheers

发明人： Stefan Gertrud Marie Hendriks ,  Thomas Augustus Mattaar ,  Gerardus Jacobus Cornelis Catharina Maria Leenheers

IPC分类号： B81B3/00 ,  B81B7/02 ,  G03F7/20 ,  H01L21/027 ,  H01L41/09 ,  H02N2/00 ,  H01L41/08

CPC分类号： G03F7/70825 ,  G03F7/70758 ,  H02N2/021

摘要： A piezo actuator system, is presented herein. A piezo actuator system comprises a number of piezo actuators which may lengthen and shear. Using the lengthening and shearing, the piezo actuator system grips and moves an object in response to a first and a second control signal, respectively. The possible displacement of the object is limited by the maximum shear of the piezo actuators. To increase the possible displacement, the piezo actuators may be controlled to perform a linear shear sequence or a shuffle sequence. During the linear shear sequence, the object is moved; during the shuffle sequence the object is substantially stationary, while the piezo actuators are repositioned with respect to the object, after which the object may be moved further using the linear shear sequence.A piezo actuator system may be adapted to perform a slow shuffle sequence, being a relatively slowly performed shuffle sequence, during which the linear shear sequence may be performed simultaneously, preventing any dead time during movement.