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公开(公告)号：US20080278702A1
公开(公告)日：2008-11-13
申请号：US11797901
申请日：2007-05-08
申请人： Engelbertus Antonius Fransiscus Van Der Pasch , Emiel Jozef Melanie Eussen , Stefan Gertrud Marie Hendriks , Erik Roelof Loopstra , Jacob Willem Vink , Ruud Antonius Catharina Maria Beerens , Lodewijk Alexander Schijvenaars , Tom Van Zutphen
发明人： Engelbertus Antonius Fransiscus Van Der Pasch , Emiel Jozef Melanie Eussen , Stefan Gertrud Marie Hendriks , Erik Roelof Loopstra , Jacob Willem Vink , Ruud Antonius Catharina Maria Beerens , Lodewijk Alexander Schijvenaars , Tom Van Zutphen
IPC分类号： G03B27/42
CPC分类号： G03F7/70775 , G03F7/70516
摘要： A method for calibrating an auxiliary sensor system is provided. The auxiliary sensor system measures a position of a grating relative to a reference, the grating forming part of an encoder measurement system. The encoder measurement system is adapted to measure a position of a substrate table of a lithographic apparatus and further comprises a sensor mounted to the substrate table. The method comprises exciting the grating to make a movement in at least one measurement direction of the auxiliary sensor system, obtaining an auxiliary sensor system output signal from the sensor system during the movement, and adjusting a parameter of the auxiliary sensor system based on the output signal obtained during the movement to thereby calibrate the auxiliary sensor system.
摘要翻译： 提供了一种用于校准辅助传感器系统的方法。 辅助传感器系统测量光栅相对于参考的位置，光栅形成编码器测量系统的一部分。 编码器测量系统适于测量光刻设备的衬底台的位置，还包括安装到衬底台的传感器。 该方法包括激励光栅以在辅助传感器系统的至少一个测量方向上移动，在运动期间从传感器系统获得辅助传感器系统输出信号，并且基于输出调整辅助传感器系统的参数 信号，从而校准辅助传感器系统。
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公开(公告)号：US07999912B2
公开(公告)日：2011-08-16
申请号：US11797901
申请日：2007-05-08
申请人： Engelbertus Antonius Fransiscus Van Der Pasch , Emiel Jozef Melanie Eussen , Stefan Gertrud Marie Hendriks , Erik Roelof Loopstra , Jacob Willem Vink , Ruud Antonius Catharina Maria Beerens , Lodewijk Alexander Schijvenaars , Tom Van Zutphen
发明人： Engelbertus Antonius Fransiscus Van Der Pasch , Emiel Jozef Melanie Eussen , Stefan Gertrud Marie Hendriks , Erik Roelof Loopstra , Jacob Willem Vink , Ruud Antonius Catharina Maria Beerens , Lodewijk Alexander Schijvenaars , Tom Van Zutphen
IPC分类号： G03B27/42
CPC分类号： G03F7/70775 , G03F7/70516
摘要： A method for calibrating an auxiliary sensor system is provided. The auxiliary sensor system measures a position of a grating relative to a reference, the grating forming part of an encoder measurement system. The encoder measurement system is adapted to measure a position of a substrate table of a lithographic apparatus and further comprises a sensor mounted to the substrate table. The method comprises exciting the grating to make a movement in at least one measurement direction of the auxiliary sensor system, obtaining an auxiliary sensor system output signal from the sensor system during the movement, and adjusting a parameter of the auxiliary sensor system based on the output signal obtained during the movement to thereby calibrate the auxiliary sensor system.
摘要翻译： 提供了一种用于校准辅助传感器系统的方法。 辅助传感器系统测量光栅相对于参考的位置，光栅形成编码器测量系统的一部分。 编码器测量系统适于测量光刻设备的衬底台的位置，还包括安装到衬底台的传感器。 该方法包括激励光栅以在辅助传感器系统的至少一个测量方向上移动，在运动期间从传感器系统获得辅助传感器系统输出信号，并且基于输出调整辅助传感器系统的参数 信号，从而校准辅助传感器系统。
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公开(公告)号：US07978307B2
公开(公告)日：2011-07-12
申请号：US11417222
申请日：2006-05-04
申请人： Bastiaan Lambertus Wilhelmus Marinus Van De Ven , Johannes Adrianus Antonius Theodorus Dams , Jacob Willem Vink
发明人： Bastiaan Lambertus Wilhelmus Marinus Van De Ven , Johannes Adrianus Antonius Theodorus Dams , Jacob Willem Vink
CPC分类号： G03F7/70816 , F16C29/025 , F16C32/0603
摘要： A gas bearing has a first bearing part defining a first bearing surface and a second bearing part defining a second bearing surface. Between the first bearing surface and the second bearing surface there is a gap. A gas supply device supplies a gas to the gap. The first bearing part is at least partly ferromagnetic, and the second bearing part has at least one permanent magnet interacting with the first bearing part for pre-tensioning the gas bearing. The gas bearing may be part of a lithographic apparatus.
摘要翻译： 气体轴承具有限定第一轴承表面的第一轴承部分和限定第二轴承表面的第二轴承部件。 在第一支承面和第二支承面之间存在间隙。 气体供给装置向间隙供给气体。 第一轴承部分至少部分是铁磁性的，并且第二轴承部分具有与第一轴承部件相互作用的至少一个永磁体，用于预紧气体轴承。 气体轴承可以是光刻设备的一部分。
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公开(公告)号：US07078715B2
公开(公告)日：2006-07-18
申请号：US10915702
申请日：2004-08-11
申请人： Jacob Willem Vink , Sjoerd Nicolaas Lambertus Donders , Theodorus Marinus Modderman , Theodorus Petrus Maria Cadee
发明人： Jacob Willem Vink , Sjoerd Nicolaas Lambertus Donders , Theodorus Marinus Modderman , Theodorus Petrus Maria Cadee
IPC分类号： G21K5/10
CPC分类号： G03F7/707 , G03F7/70783 , G03F7/70925 , G03F7/70975
摘要： A lithographic projection apparatus includes a beam production system for projecting a patterned beam of radiation onto a target portion of a substrate, and a support table for supporting an article. The support table has a support surface and an array of protrusions extending from the support surface to support the article on the protrusions. The apparatus also includes a detector for detecting height deviations of the protrusions that affect a surface flatness of the article, a height adjustment device arranged to independently modify a height of the individual protrusions when the support table is operable in the apparatus, and a controller coupled between the detector and the height adjustment device and arranged to control the height adjustment device to adjust the height of the protrusions corresponding to the detected height deviations of the protrusions that affect the surface flatness of the article.
摘要翻译： 光刻投影装置包括用于将图案化的辐射束投射到基板的目标部分上的光束产生系统和用于支撑物品的支撑台。 支撑台具有从支撑表面延伸的支撑表面和突出的阵列，以将物品支撑在突起上。 该装置还包括检测器，用于检测影响物品的表面平坦度的突起的高度偏差;高度调节装置，其布置成当支撑台在装置中可操作时独立地改变各个突起的高度;以及控制器 在所述检测器和所述高度调节装置之间，并布置成控制所述高度调节装置，以根据检测到的突出物的高度偏差来调节所述突起的高度，所述高度偏差影响所述物品的表面平坦度。
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公开(公告)号：US07639345B2
公开(公告)日：2009-12-29
申请号：US11252230
申请日：2005-10-18
申请人： Joost Jeroen Ottens , Aschwin Lodewijk Hendricus Johannes Van Meer , Wim Tjibbo Tel , Jacob Willem Vink , Rene Theodorus Petrus Compen , Petrus Johannes Gerrits
发明人： Joost Jeroen Ottens , Aschwin Lodewijk Hendricus Johannes Van Meer , Wim Tjibbo Tel , Jacob Willem Vink , Rene Theodorus Petrus Compen , Petrus Johannes Gerrits
CPC分类号： G03F7/70916 , G03F7/7065 , G03F7/707 , G03F9/7003
摘要： The invention provides a height detecting apparatus for a lithographic apparatus. The height mapping apparatus includes a height mapping unit for providing at least one height map of a top surface of an object to be placed in a radiation beam of the lithographic apparatus, the object to be clamped by a clamping force applied thereto on a support constructed to support the object. The height mapping apparatus also includes a control unit for controlling the mapping unit to provide the at least one height map of the object relative to at least two different clamping pressure levels.
摘要翻译： 本发明提供一种用于光刻设备的高度检测装置。 高度测绘装置包括高度测绘单元，用于提供待放置在光刻设备的辐射束中的待放置物体的顶表面的至少一个高度图，待施加到其上的夹持力夹持在被构造的支撑体上 支持对象。 高度测绘装置还包括控制单元，用于控制映射单元以相对于至少两个不同的夹紧压力水平提供对象的至少一个高度图。
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公开(公告)号：US07405810B2
公开(公告)日：2008-07-29
申请号：US10875537
申请日：2004-06-25
CPC分类号： G03F7/70633 , G03F7/70716 , G03F9/7011 , G03F9/7015
摘要： The invention relates to a method for positioning a substrate relative to a substrate table, is presented. When the substrate is positioned on the substrate table for a first time, a first relative position of the substrate with respect to the substrate table is determined. When the substrate is positioned on the substrate table a second subsequent time, a second relative position of the substrate with respect to the substrate table is determined and the position of the substrate table with respect to the substrate is adjusted based on the first and second relative positions, so that the substrate is positioned with respect to the substrate table substantially equally to the first relative position.
摘要翻译： 本发明涉及一种用于相对于衬底台定位衬底的方法。 当衬底首次位于衬底台上时，确定衬底相对于衬底台的第一相对位置。 当衬底位于衬底台上第二个随后的时间时，确定衬底相对于衬底台的第二相对位置，并且基于第一和第二相对位置来调整衬底台相对于衬底的位置 位置，使得基底相对于基底台基本上等于第一相对位置。
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