-
公开(公告)号：US20070146678A1
公开(公告)日：2007-06-28
申请号：US11316359
申请日：2005-12-23
IPC分类号： G03B27/58
CPC分类号： G03F7/70741 , G03F7/70733
摘要： A lithographic apparatus includes an illumination system to condition a radiation beam, a patterning device support to support a patterning device in a projection plane, the patterning device to pattern the radiation beam, a substrate table to hold a substrate, a projection system to project the patterned beam onto the substrate, and an exchange device to exchange an exchangeable object with an exchangeable object support that holds the exchangeable object during projection. The exchange device includes a load unit and an unload unit that each have a holding device to hold an exchangeable object. The holding devices are positioned substantially adjacent to each other and configured to hold an exchangeable object in a plane substantially parallel to the plane in which the exchangeable object is held in the exchangeable object support during projection. The exchangeable object support exchanges an exchangeable object with each of the holding devices.
摘要翻译： 光刻设备包括用于调节辐射束的照明系统，图案形成装置支撑件以支撑投影平面中的图案形成装置，图案形成装置对辐射束进行图案化，衬底台以保持衬底，投影系统将投影系统投影 图案化的光束到基板上，以及交换装置，用于在可投影对象期间交换可交换对象与可更换物体的支撑。 交换装置包括负载单元和卸载单元，每个都具有用于保持可更换对象的保持装置。 保持装置基本上彼此相邻地定位，并且构造成将可交换物体保持在基本上平行于平面的平面中，在该平面中可交换物体在投影期间被保持在可更换物体支撑件中。 可交换对象支持与每个保持装置交换可交换对象。
-
2.发明申请公开(公告)号：US20070263197A1
公开(公告)日：2007-11-15
申请号：US11430196
申请日：2006-05-09
申请人： Bernardus Antonius Luttikhuis , Henrikus Cox , Erik Loopstra , Engelbertus Antonius Van Der Pasch , Harmen Van Der Schoot
发明人： Bernardus Antonius Luttikhuis , Henrikus Cox , Erik Loopstra , Engelbertus Antonius Van Der Pasch , Harmen Van Der Schoot
IPC分类号： G03B27/52
CPC分类号： G03B27/53 , G03F7/70733 , G03F7/70775
摘要： A displacement measurement system, in particular for measuring the displacement of a substrate table in a lithographic apparatus relative to a reference frame is presented. The displacement measure system includes a plurality of displacement sensors mounted to the substrate table and a target associated with each displacement sensor mounted to the reference frame.
摘要翻译： 提出了一种位移测量系统，特别是用于测量光刻设备中的衬底台相对于参考系的位移。 位移测量系统包括安装到衬底台的多个位移传感器和与安装到参考框架的每个位移传感器相关联的目标。
-
公开(公告)号：US20060007414A1
公开(公告)日：2006-01-12
申请号：US10888513
申请日：2004-07-12
申请人： Bernardus Antonius Luttikhuis , Petrus Bartray , Johannes Henricus Jacobs , Thijs Harink , Paulus Liebregts
发明人： Bernardus Antonius Luttikhuis , Petrus Bartray , Johannes Henricus Jacobs , Thijs Harink , Paulus Liebregts
CPC分类号： G03F7/70841
摘要： A lithographic apparatus is disclosed. The apparatus includes a support constructed to support a patterning device, the patterning device being capable of imparting a radiation beam with a pattern in its cross-section to form a patterned radiation beam. A projection system is configured to project the patterned radiation beam onto a target portion of a substrate. A first vacuum environment contains the projection system, a second vacuum environment contains the patterning device support, and a separator separates the first and second vacuum environments. The separator includes an aperture for passing the projection beam from the first vacuum environment towards the patterning device and/or vice-versa. The patterning device forms at least part of a seal for substantially sealing the aperture of the separator.
-
4.发明申请公开(公告)号：US20050248739A1
公开(公告)日：2005-11-10
申请号：US10838525
申请日：2004-05-05
IPC分类号： G03F7/20 , G03B27/52 , H01L21/027
CPC分类号： G03F7/70833 , G03F7/70891
摘要： A lithographic apparatus having an illumination system configured to provide a radiation beam; a support structure configured to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section, thus providing a patterned radiation beam; a substrate table configured to hold a substrate; a projection system arranged to project the patterned radiation beam onto a target portion of the substrate, and a projection system support configured to support the projection system on a reference frame. The lithographic apparatus further includes a thermal conditioning system configured to thermally condition the projection system support. The invention further relates to a thermal conditioning system constructed and arranged to thermally condition a projection system support. The invention further relates to a device manufacturing method and a method for manufacturing a device.
摘要翻译： 一种具有被配置为提供辐射束的照明系统的光刻设备; 构造成支撑图案形成装置的支撑结构，所述图案形成装置能够在其横截面中赋予所述辐射束图案，从而提供图案化的辐射束; 被配置为保持基板的基板台; 投影系统，布置成将图案化的辐射束投影到基板的目标部分上;以及投影系统支撑件，被配置为将投影系统支撑在参考系上。 光刻设备还包括被配置为热调节投影系统支撑件的热调节系统。 本发明还涉及一种构造和布置成对投影系统支撑件进行热调节的热调节系统。 本发明还涉及一种用于制造器件的器件制造方法和方法。
-
公开(公告)号：US20050105070A1
公开(公告)日：2005-05-19
申请号：US10735847
申请日：2003-12-16
IPC分类号： H01L21/027 , G02B7/02 , G03B27/42 , G03F7/20
CPC分类号： G03F7/7095 , G02B7/028 , G03F7/70833 , G03F7/70858 , G03F7/709
摘要： A lithographic apparatus is disclosed. The apparatus includes an illumination system that provides a beam of radiation, and a support structure that supports a patterning structure. The patterning structure is configured to impart the beam of radiation with a pattern in its cross-section. The apparatus also includes a substrate support that supports a substrate, a projection system that projects the patterned beam onto a target portion of the substrate, and a reference frame that provides a reference surface with respect to which a position of at least one of the substrate and the patterning structure is measured. The reference frame includes a material that has a coefficient of thermal expansion of greater than about 2.9×10−6/K.
摘要翻译： 公开了一种光刻设备。 该装置包括提供辐射束的照明系统和支撑图形结构的支撑结构。 图案形成结构被配置为在其横截面中赋予辐射束图案。 该装置还包括支撑基板的基板支撑件，将图案化的光束投影到基板的目标部分上的投影系统以及提供参考表面的参考框架，基准面相对于基板的至少一个基板 并且测量图案结构。 参考框架包括具有大于约2.9×10 -6 / K的热膨胀系数的材料。
-
-
-
-
搜索结果
5 条记录 (耗时 0.016 秒)
