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    Lithographic apparatus and device manufacturing method
    2.
    发明申请
    Lithographic apparatus and device manufacturing method 有权

    公开(公告)号：US20060227309A1

    公开(公告)日：2006-10-12

    申请号：US11224308

    申请日：2005-09-13

    申请人： Erik Loopstra ,  Engelbertus Antonius Van Der Pasch

    发明人： Erik Loopstra ,  Engelbertus Antonius Van Der Pasch

    IPC分类号： G03B27/42

    CPC分类号： G03F7/70775

    摘要： A lithographic apparatus includes a displacement measuring system configured to measure the position of a substrate table in at least three degrees of freedom. The displacement measuring system includes a first x-sensor configured to measure the position of the substrate table in a first direction and a first and a second y-sensor configured to measure the position of the substrate table in a second direction. Said displacement measuring system further comprises a second x-sensor. The first and second x-sensor and first and second y-sensors are encoder type sensors configured to measure the position of each of the sensors with respect to at least one grid plate. The displacement measuring system is configured to selectively use, depending on the position of the substrate table, three of the first and second x-sensors and the first and second y-sensors to determine the position of the substrate table in three degrees of freedom.

    Position measurement unit, measurement system and lithographic apparatus comprising such position measurement unit
    3.
    发明申请
    Position measurement unit, measurement system and lithographic apparatus comprising such position measurement unit 有权
    位置测量单元，测量系统和包括该位置测量单元的光刻设备

    公开(公告)号：US20070058172A1

    公开(公告)日：2007-03-15

    申请号：US11226460

    申请日：2005-09-15

    申请人： Engelbertus Antonius Van Der Pasch ,  Erik Loopstra

    发明人： Engelbertus Antonius Van Der Pasch ,  Erik Loopstra

    IPC分类号： G01B9/02

    CPC分类号： G01B9/02051 ,  G01B9/02029 ,  G01B2290/70 ,  G03F7/70775

    摘要： A measurement unit to determine a position in a first and second dimension includes a diffraction type encoder and an interferometer. The diffraction type encoder determines by means of a diffraction on a first and a second diffraction grating the position in the first dimension of the second grating with respect to the first grating, The interferometer determines the position in the second dimension of a mirror. The measurement unit includes a combined optical unit to transfer an encoder measurement beam as well as an interferometer measurement beam. Further, the measurement unit may include a combined light source for the encoder as well as the interferometer. One of the first and second diffraction gratings may further show some degree of zero order reflection to provide the mirror of the interferometer.

    摘要翻译： 用于确定第一和第二维度中的位置的测量单元包括衍射型编码器和干涉仪。 衍射型编码器通过第一和第二衍射光栅上的衍射来确定第二光栅相对于第一光栅的第一维度中的位置。干涉仪确定反射镜的第二维度中的位置。 测量单元包括用于传送编码器测量光束以及干涉仪测量光束的组合光学单元。 此外，测量单元可以包括用于编码器的组合光源以及干涉仪。 第一和第二衍射光栅中的一个可进一步示出一些零级反射以提供干涉仪的反射镜。

    Lithographic apparatus and device manufacturing method
    4.
    发明申请
    Lithographic apparatus and device manufacturing method 有权
    平版印刷设备和器件制造方法

    公开(公告)号：US20070216881A1

    公开(公告)日：2007-09-20

    申请号：US11377636

    申请日：2006-03-17

    申请人： Harmen Van Der Schoot ,  Erik Loopstra ,  Fransicus Jacobs ,  Godfried Franciscus Geelen

    发明人： Harmen Van Der Schoot ,  Erik Loopstra ,  Fransicus Jacobs ,  Godfried Franciscus Geelen

    IPC分类号： G03B27/42

    CPC分类号： G03B27/42 ,  G03F7/70341 ,  G03F7/70716 ,  G03F7/70733

    摘要： A moveable member is provided which extends the top surface of a substrate table, in plan, beyond a bumper which protects the substrate table during collision. The moveable member may be retracted to a retracted position in which it no longer extends beyond the bumper. In this way it is possible to move two substrate tables together and to allow the retractable member to pass under a liquid supply system which normally provides liquid between the projection system and a substrate without turning off of the liquid supply system.

    摘要翻译： 提供了可移动构件，其以平面方式延伸衬底台的顶表面超过在碰撞期间保护衬底台的保险杠。 可移动构件可以缩回到缩回位置，在缩回位置，其不再延伸超过保险杠。 以这种方式，可以将两个基板台移动到一起，并允许可伸缩构件在液体供应系统之下通过，该液体供应系统通常在投影系统和基板之间提供液体而不关闭液体供应系统。

    Lithographic apparatus and device manufacturing method
    5.
    发明申请
    Lithographic apparatus and device manufacturing method 有权
    平版印刷设备和器件制造方法

    公开(公告)号：US20070146678A1

    公开(公告)日：2007-06-28

    申请号：US11316359

    申请日：2005-12-23

    申请人： Erik Loopstra ,  Bernardus Antonius Luttikhuis

    发明人： Erik Loopstra ,  Bernardus Antonius Luttikhuis

    IPC分类号： G03B27/58

    CPC分类号： G03F7/70741 ,  G03F7/70733

    摘要： A lithographic apparatus includes an illumination system to condition a radiation beam, a patterning device support to support a patterning device in a projection plane, the patterning device to pattern the radiation beam, a substrate table to hold a substrate, a projection system to project the patterned beam onto the substrate, and an exchange device to exchange an exchangeable object with an exchangeable object support that holds the exchangeable object during projection. The exchange device includes a load unit and an unload unit that each have a holding device to hold an exchangeable object. The holding devices are positioned substantially adjacent to each other and configured to hold an exchangeable object in a plane substantially parallel to the plane in which the exchangeable object is held in the exchangeable object support during projection. The exchangeable object support exchanges an exchangeable object with each of the holding devices.

    摘要翻译： 光刻设备包括用于调节辐射束的照明系统，图案形成装置支撑件以支撑投影平面中的图案形成装置，图案形成装置对辐射束进行图案化，衬底台以保持衬底，投影系统将投影系统投影 图案化的光束到基板上，以及交换装置，用于在可投影对象期间交换可交换对象与可更换物体的支撑。 交换装置包括负载单元和卸载单元，每个都具有用于保持可更换对象的保持装置。 保持装置基本上彼此相邻地定位，并且构造成将可交换物体保持在基本上平行于平面的平面中，在该平面中可交换物体在投影期间被保持在可更换物体支撑件中。 可交换对象支持与每个保持装置交换可交换对象。

    Lithographic apparatus and device manufacturing method
    6.
    发明申请
    Lithographic apparatus and device manufacturing method 有权
    平版印刷设备和器件制造方法

    公开(公告)号：US20070263201A1

    公开(公告)日：2007-11-15

    申请号：US11433767

    申请日：2006-05-15

    申请人： Erik Loopstra ,  Joost Ottens

    发明人： Erik Loopstra ,  Joost Ottens

    IPC分类号： G03B27/58

    CPC分类号： G03F7/70875 ,  G03F7/70341 ,  G03F7/707

    摘要： An article support constructed to support an article for lithographic processing purposes is disclosed. The article support includes a channel configuration arranged to guide thermally stabilizing media in the article support to provide thermal stabilization to the article, wherein the channel configuration comprises an input channel structure and an output channel structure, the input and output channel structures arranged in a nested configuration and connected to each other by a fine grid structure provided at or near a surface of the article support. A lithographic apparatus and device manufacturing incorporating the article support is also disclosed.

    摘要翻译： 公开了一种用于支撑用于光刻处理目的的物品的物品支撑。 物品支撑件包括布置成引导物品支撑件中的热稳定剂介质以向物品提供热稳定性的通道配置，其中通道配置包括输入通道结构和输出通道结构，输入和输出通道结构布置成嵌套 配置并且通过设置在物品支撑件的表面处或附近的细格栅结构彼此连接。 还公开了并入物品支撑件的光刻设备和设备制造。

    Optical element for correction of aberration, and a lithographic apparatus comprising same
    7.
    发明申请
    Optical element for correction of aberration, and a lithographic apparatus comprising same 有权
    用于校正像差的光学元件，以及包括其的光刻设备

    公开(公告)号：US20070247605A1

    公开(公告)日：2007-10-25

    申请号：US11410282

    申请日：2006-04-25

    申请人： Erik Loopstra ,  Paul Graupner ,  Johannes Mulkens

    发明人： Erik Loopstra ,  Paul Graupner ,  Johannes Mulkens

    IPC分类号： G03B27/52

    CPC分类号： G03B27/52 ,  G02B27/0068 ,  G03F7/70266

    摘要： An optical element for correcting aberrations in an optical apparatus has a casing. The casing is filled with liquid and has a support layer and a cover layer designed to pass light of a predetermined wavelength range. The casing accommodates several actuators. Each actuator has a first end supporting the cover layer and a second end supporting the support layer. Each actuator is able to locally change a local distance between the support layer and the cover layer to correct for local aberrations in a light beam directed to the optical element by providing local phase shifts. The optical element may be used in a lithographic apparatus.

    摘要翻译： 用于校正光学装置中的像差的光学元件具有壳体。 壳体充满液体并具有支撑层和设计成使预定波长范围的光通过的覆盖层。 外壳容纳几个执行器。 每个致动器具有支撑覆盖层的第一端和支撑支撑层的第二端。 每个致动器能够局部地改变支撑层和覆盖层之间的局部距离，以通过提供局部相移来校正指向光学元件的光束中的局部像差。 光学元件可以用在光刻设备中。