公开(公告)号：US20070151583A1

公开(公告)日：2007-07-05

申请号：US11543365

申请日：2006-10-04

申请人： Erik M. Freer ,  John M. deLarios ,  Katrina Mikhaylichenko ,  Michael Ravkin ,  Mikhail Korolik ,  Fritz C. Redeker

发明人： Erik M. Freer ,  John M. deLarios ,  Katrina Mikhaylichenko ,  Michael Ravkin ,  Mikhail Korolik ,  Fritz C. Redeker

IPC分类号： B08B3/00 ,  B08B3/12

CPC分类号： B08B3/024 ,  B08B3/003 ,  B08B3/08 ,  B08B6/00 ,  H01L21/67051

摘要： A method and system for cleaning a surface, having particulate matter thereon, of a substrate features impinging upon the surface a jet of a liquid having coupling elements entrained therein. A sufficient drag force is imparted upon the coupling elements to have the same move with respect to the liquid and cause the particulate matter to move with respect to the substrate.

摘要翻译： 一种用于清洁其上具有颗粒物质的表面的表面的方法和系统，其特征在于其表面上具有夹带在其中的具有耦合元件的液体的射流。 赋予联接元件足够的拖曳力以相对于液体具有相同的移动并使颗粒物质相对于基底移动。

公开(公告)号：US08480810B2

公开(公告)日：2013-07-09

申请号：US11543365

申请日：2006-10-04

申请人： Erik M. Freer ,  John M. de Larios ,  Katrina Mikhaylichenko ,  Michael Ravkin ,  Mikhail Korolik ,  Fritz C. Redeker

发明人： Erik M. Freer ,  John M. de Larios ,  Katrina Mikhaylichenko ,  Michael Ravkin ,  Mikhail Korolik ,  Fritz C. Redeker

IPC分类号： B08B7/04

CPC分类号： B08B3/024 ,  B08B3/003 ,  B08B3/08 ,  B08B6/00 ,  H01L21/67051

摘要： A method and system for cleaning a surface, having particulate matter thereon, of a substrate features impinging upon the surface a jet of a liquid having coupling elements entrained therein. A sufficient drag force is imparted upon the coupling elements to have the same move with respect to the liquid and cause the particulate matter to move with respect to the substrate.

摘要翻译： 一种用于清洁其上具有颗粒物质的表面的表面的方法和系统，其特征在于其表面上具有夹带在其中的具有耦合元件的液体的射流。 赋予耦合元件足够的阻力以相对于液体具有相同的移动并使颗粒物质相对于基底移动。

公开(公告)号：US08475599B2

公开(公告)日：2013-07-02

申请号：US11641362

申请日：2006-12-18

申请人： Erik M. Freer ,  John M. de Larios ,  Michael Ravkin ,  Mikhail Korolik ,  Katrina Mikhaylichenko ,  Fritz C. Redeker

发明人： Erik M. Freer ,  John M. de Larios ,  Michael Ravkin ,  Mikhail Korolik ,  Katrina Mikhaylichenko ,  Fritz C. Redeker

IPC分类号： B08B7/00

CPC分类号： H01L21/6715 ,  B05D3/10 ,  C11D3/14 ,  C11D11/0047 ,  C11D17/0004 ,  C11D17/0013 ,  C23G1/00 ,  G03F7/42 ,  H01L21/02052 ,  H01L21/02057 ,  H01L21/02096 ,  H01L21/67051

摘要： A method for making a solution for use in preparing a surface of a substrate is provided. The method includes providing a continuous medium that adds a polymer material to the continuous medium. A fatty acid is adding to the continuous medium having the polymer material, and the polymer material defines a physical network that exerts forces in the solution that overcome buoyancy forces experienced by the fatty acid, thus preventing the fatty acids from moving within the solution until a yield stress of the polymer material is exceeded by an applied agitation. The applied agitation is from transporting the solution from a container to a preparation station that applies the solution to the surface of the substrate.

摘要翻译： 提供了制备用于制备基底表面的溶液的方法。 该方法包括提供将聚合物材料添加到连续介质的连续介质。 将脂肪酸加入到具有聚合物材料的连续介质中，并且聚合物材料限定了在溶液中施加力的物理网络，其克服了脂肪酸所经受的浮力，从而防止脂肪酸在溶液中移动直到 通过施加的搅拌超过聚合物材料的屈服应力。 施加的搅拌是将溶液从容器运送到将溶液施加到基材表面的制备工位上。

公开(公告)号：US20070155640A1

公开(公告)日：2007-07-05

申请号：US11641362

申请日：2006-12-18

申请人： Erik M. Freer ,  John M. de Larios ,  Michael Ravkin ,  Mikhail Korolik ,  Katrina Mikhaylichenko ,  Fritz C. Redeker

发明人： Erik M. Freer ,  John M. de Larios ,  Michael Ravkin ,  Mikhail Korolik ,  Katrina Mikhaylichenko ,  Fritz C. Redeker

IPC分类号： B08B3/00 ,  B08B3/12 ,  C11D7/32

CPC分类号： H01L21/6715 ,  B05D3/10 ,  C11D3/14 ,  C11D11/0047 ,  C11D17/0004 ,  C11D17/0013 ,  C23G1/00 ,  G03F7/42 ,  H01L21/02052 ,  H01L21/02057 ,  H01L21/02096 ,  H01L21/67051

摘要： A method for making a solution for use in preparing a surface of a substrate is provided. The method includes providing a continuous medium that adds a polymer material to the continuous medium. A fatty acid is adding to the continuous medium having the polymer material, and the polymer material defines a physical network that exerts forces in the solution that overcome buoyancy forces experienced by the fatty acid, thus preventing the fatty acids from moving within the solution until a yield stress of the polymer material is exceeded by an applied agitation. The applied agitation is from transporting the solution from a container to a preparation station that applies the solution to the surface of the substrate.

摘要翻译： 提供了制备用于制备基底表面的溶液的方法。 该方法包括提供将聚合物材料添加到连续介质的连续介质。 将脂肪酸加入到具有聚合物材料的连续介质中，并且聚合物材料限定了在溶液中施加力的物理网络，其克服了脂肪酸所经受的浮力，从而防止脂肪酸在溶液中移动直到 通过施加的搅拌超过聚合物材料的屈服应力。 施加的搅拌是将溶液从容器运输到将溶液施加到基材表面的制备工位上。

公开(公告)号：US08608859B2

公开(公告)日：2013-12-17

申请号：US12768349

申请日：2010-04-27

申请人： Erik M. Freer ,  John M. deLarios ,  Katrina Mikhaylichenko ,  Michael Ravkin ,  Mikhail Korolik ,  Fred C. Redeker

发明人： Erik M. Freer ,  John M. deLarios ,  Katrina Mikhaylichenko ,  Michael Ravkin ,  Mikhail Korolik ,  Fred C. Redeker

IPC分类号： C11D7/50

CPC分类号： H01L21/02052 ,  B08B7/02 ,  C11D9/00 ,  C11D9/02 ,  C11D9/267 ,  C11D11/0047 ,  C11D17/0013 ,  C11D17/0017 ,  C23G1/18 ,  G03F7/42 ,  H01L21/02057 ,  H01L21/02096

摘要： A method is provided for removing contamination from a substrate. The method includes applying a cleaning solution having a dispersed phase, a continuous phase and particles dispersed within the continuous phase to a surface of the substrate. The method includes forcing one of the particles dispersed within the continuous phase proximate to one of the surface contaminants. The forcing is sufficient to overcome any repulsive forces between the particles and the surface contaminants so that the one of the particles and the one of the surface contaminants are engaged. The method also includes removing the engaged particle and surface contaminant from the surface of the substrate. A process to manufacture the cleaning material is also provided.

摘要翻译： 提供了一种用于从衬底去除污染物的方法。 该方法包括将具有分散相，连续相和分散在连续相内的颗粒的清洗溶液施加到基材的表面。 该方法包括迫使分散在连续相内的颗粒中的一种接近一种表面污染物。 强制足以克服颗粒和表面污染物之间的任何排斥力，使得颗粒中的一个和表面污染物之一接合。 该方法还包括从基材的表面除去接合的颗粒和表面污染物。 还提供了制造清洁材料的方法。

公开(公告)号：US08522801B2

公开(公告)日：2013-09-03

申请号：US11612371

申请日：2006-12-18

申请人： Erik M. Freer ,  John M. deLarios ,  Katrina Mikhaylichenko ,  Michael Ravkin ,  Mikhail Korolik ,  Fred C. Redeker

发明人： Erik M. Freer ,  John M. deLarios ,  Katrina Mikhaylichenko ,  Michael Ravkin ,  Mikhail Korolik ,  Fred C. Redeker

IPC分类号： B08B3/00

CPC分类号： B08B7/00 ,  B08B3/00 ,  B08B7/02 ,  C11D9/02 ,  C11D11/0047 ,  C11D17/0017 ,  C23G1/18 ,  G03F7/423 ,  H01L21/02052 ,  H01L21/31133 ,  H01L21/67028 ,  H01L21/6708 ,  H01L21/67086

摘要： A method for cleaning a substrate is provided. The method initiates with disposing a fluid layer having solid components therein to a surface of the substrate. A shear force directed substantially parallel to the surface of the substrate and toward an outer edge of the substrate is then created. The shear force may result from a normal or tangential component of a force applied to a solid body in contact with the fluid layer in one embodiment. The surface of the substrate is rinsed to remove the fluid layer. A cleaning system and apparatus are also provided.

摘要翻译： 提供一种清洗基板的方法。 该方法通过将其中具有固体组分的流体层设置在基底的表面来启动。 然后产生基本上平行于衬底的表面并朝向衬底的外边缘的剪切力。 在一个实施例中，剪切力可以由施加到与流体层接触的固体的力的正常或切向分量产生。 漂洗基材的表面以除去流体层。 还提供清洁系统和装置。

公开(公告)号：US08316866B2

公开(公告)日：2012-11-27

申请号：US11612352

申请日：2006-12-18

申请人： Erik M. Freer ,  John M. deLarios ,  Katrina Mikhaylichenko ,  Michael Ravkin ,  Mikhail Korolik ,  Fred C. Redeker

发明人： Erik M. Freer ,  John M. deLarios ,  Katrina Mikhaylichenko ,  Michael Ravkin ,  Mikhail Korolik ,  Fred C. Redeker

IPC分类号： B08B3/00

CPC分类号： H01L21/67092 ,  B08B3/00 ,  B08B7/00 ,  B08B7/02 ,  C11D9/02 ,  C11D11/0047 ,  C11D17/0017 ,  C23G1/18 ,  G03F7/423 ,  H01L21/02052 ,  H01L21/02057 ,  H01L21/02096 ,  H01L21/31133 ,  H01L21/67028 ,  H01L21/6708 ,  H01L21/67086 ,  Y10T137/4891

摘要： A method for cleaning a substrate is provided. The method initiates with applying an activation solution to a surface of the substrate. The activation solution and the surface of the substrate are contacted with a surface of a solid cleaning surface. The activation solution is absorbed into a portion of the solid cleaning element and then the substrate or the solid cleaning surface is moved relative to each other to clean the surface of the substrate. A method for cleaning the surface of the substrate with a solid cleaning element that experiences plastic deformation is also provided. Corresponding cleaning apparatuses are also provided.

摘要翻译： 提供一种清洗基板的方法。 该方法通过将激活溶液施加到基底的表面来启动。 活化溶液和基材的表面与固体清洁表面的表面接触。 活化溶液被吸收到固体清洁元件的一部分中，然后基底或固体清洁表面相对于彼此移动以清洁基底的表面。 还提供了一种用经历塑性变形的固体清洁元件来清洁基板的表面的方法。 还提供了相应的清洁装置。

公开(公告)号：US20100206340A1

公开(公告)日：2010-08-19

申请号：US12768349

申请日：2010-04-27

申请人： Erik M. Freer ,  John M. deLarios ,  Katrina Mikhaylichenko ,  Michael Ravkin ,  Mikhail Korolik ,  Fred C. Redeker

发明人： Erik M. Freer ,  John M. deLarios ,  Katrina Mikhaylichenko ,  Michael Ravkin ,  Mikhail Korolik ,  Fred C. Redeker

IPC分类号： B08B3/00

CPC分类号： H01L21/02052 ,  B08B7/02 ,  C11D9/00 ,  C11D9/02 ,  C11D9/267 ,  C11D11/0047 ,  C11D17/0013 ,  C11D17/0017 ,  C23G1/18 ,  G03F7/42 ,  H01L21/02057 ,  H01L21/02096

摘要： A method is provided for removing contamination from a substrate. The method includes applying a cleaning solution having a dispersed phase, a continuous phase and particles dispersed within the continuous phase to a surface of the substrate. The method includes forcing one of the particles dispersed within the continuous phase proximate to one of the surface contaminants. The forcing is sufficient to overcome any repulsive forces between the particles and the surface contaminants so that the one of the particles and the one of the surface contaminants are engaged. The method also includes removing the engaged particle and surface contaminant from the surface of the substrate. A process to manufacture the cleaning material is also provided.

摘要翻译： 提供了一种用于从衬底去除污染物的方法。 该方法包括将具有分散相，连续相和分散在连续相内的颗粒的清洗溶液施加到基材的表面。 该方法包括迫使分散在连续相内的颗粒中的一种接近一种表面污染物。 强制足以克服颗粒和表面污染物之间的任何排斥力，使得颗粒中的一个和表面污染物之一接合。 该方法还包括从基材的表面除去接合的颗粒和表面污染物。 还提供了制造清洁材料的方法。

公开(公告)号：US08388762B2

公开(公告)日：2013-03-05

申请号：US11743283

申请日：2007-05-02

申请人： Erik M. Freer ,  John M. deLarios ,  Michael Ravkin ,  Mikhail Korolik ,  Fritz C. Redeker

发明人： Erik M. Freer ,  John M. deLarios ,  Michael Ravkin ,  Mikhail Korolik ,  Fritz C. Redeker

IPC分类号： B08B3/04

CPC分类号： H01L21/02057 ,  H01L21/02052 ,  H01L21/67034 ,  H01L21/67057 ,  H01L21/67751

摘要： A method and system for cleaning opposed surfaces of a semiconductor wafer having particulate matter thereon. The method includes generating relative movement between a fluid and the substrate. The relative movement is in a direction that is transverse to a normal to one of the opposed surfaces and creates two spaced-apart flows. Each of the flows is adjacent to one of the opposed surfaces that is different from the opposed surface that is adjacent to the remaining flow of the plurality of flows. The fluid has coupling elements entrained therein, and the relative movement is established to impart sufficient drag upon a subset of the coupling elements to create movement of the coupling elements of the subset within the fluid. In this manner, a quantity of the drag is imparted upon the particulate matter to cause the particulate matter to move with respect to the substrate.

摘要翻译： 一种用于清洁其上具有颗粒物质的半导体晶片的相对表面的方法和系统。 该方法包括产生流体和衬底之间的相对运动。 相对运动在与相对表面之一的法线横向的方向上，并且产生两个间隔开的流动。 每个流体与相对于与多个流动的剩余流动相邻的相对表面不同的一个相对表面相邻。 流体具有夹带在其中的耦合元件，并且建立相对运动以在联接元件的子集上施加足够的阻力以产生该流体内该子集的耦合元件的运动。 以这种方式，将一定量的阻力赋予颗粒物质以使颗粒物质相对于基底移动。

公开(公告)号：US20080271749A1

公开(公告)日：2008-11-06

申请号：US11743283

申请日：2007-05-02

申请人： Erik M. Freer ,  John M. deLarios ,  Michael Ravkin ,  Mikhail Korolik ,  Fritz C. Redeker

发明人： Erik M. Freer ,  John M. deLarios ,  Michael Ravkin ,  Mikhail Korolik ,  Fritz C. Redeker

IPC分类号： C25F3/30 ,  B08B3/00 ,  B08B3/10

CPC分类号： H01L21/02057 ,  H01L21/02052 ,  H01L21/67034 ,  H01L21/67057 ,  H01L21/67751

摘要： A method and system for cleaning opposed surfaces of a semiconductor wafer having particulate matter thereon. The method includes generating relative movement between a fluid and the substrate. The relative movement is in a direction that is transverse to a normal to one of the opposed surfaces and creates two spaced-apart flows. Each of the flows is adjacent to one of the opposed surfaces that is different from the opposed surface that is adjacent to the remaining flow of the plurality of flows. The fluid has coupling elements entrained therein, and the relative movement is established to impart sufficient drag upon a subset of the coupling elements to create movement of the coupling elements of the subset within the fluid. In this manner, a quantity of the drag is imparted upon the particulate matter to cause the particulate matter to move with respect to the substrate.

摘要翻译： 一种用于清洁其上具有颗粒物质的半导体晶片的相对表面的方法和系统。 该方法包括产生流体和衬底之间的相对运动。 相对运动在与相对表面之一的法线横向的方向上，并且产生两个间隔开的流动。 每个流体与相对于与多个流动的剩余流动相邻的相对表面不同的一个相对表面相邻。 流体具有夹带在其中的耦合元件，并且建立相对运动以在联接元件的子集上施加足够的阻力以产生该流体内该子集的耦合元件的运动。 以这种方式，将一定量的阻力赋予颗粒物质以使颗粒物质相对于基底移动。