摘要:
A lithographic projection apparatus according to one embodiment of the invention includes a projection system having a plurality of optical elements or sensors mounted on a frame. The frame includes support portions made of a material (e.g. a glass ceramic) having a coefficient of thermal expansion of less than or approximately equal to 0.1×10−6 K−1.
摘要翻译:根据本发明的一个实施例的光刻投影设备包括具有安装在框架上的多个光学元件或传感器的投影系统。 框架包括由热膨胀系数小于或大约等于0.1×10 -6 K -1的材料(例如玻璃陶瓷)制成的支撑部分。
摘要:
An optical system, in particular an exposure lens for semiconductor lithography, with a plurality of optical elements has at least one load-dissipating structure. The load-dissipating structure diverts the forces originating from the optical elements. The optical system also has a measuring structure constructed independently of the at least one load-dissipating structure.
摘要:
The present invention is a process by which optical surfaces of lenses, particularly plastic progressive lenses and molding shells for producing lenses are manufactured directly in a single step according to didicidual data. A blank from which an optical surface or a molding shell is to be manufactured is held at the workpiece carrier of a spindle axis (Z axis) of a shaping machine and is directly turned into its final form by a turning tool which can move relative to the blank (in the X axis), i.e., transversely to the direction of displacement of the tool. During each rotation of the spindle, the turning tool is incrementally adjusted towards or away from the blank depending on the characteristic surface data, which may be predetermined or calculated on-line.