摘要:
A lithographic projection apparatus according to one embodiment of the invention includes a projection system having a plurality of optical elements or sensors mounted on a frame. The frame includes support portions made of a material (e.g. a glass ceramic) having a coefficient of thermal expansion of less than or approximately equal to 0.1×10−6 K−1.
摘要翻译:根据本发明的一个实施例的光刻投影设备包括具有安装在框架上的多个光学元件或传感器的投影系统。 框架包括由热膨胀系数小于或大约等于0.1×10 -6 K -1的材料(例如玻璃陶瓷)制成的支撑部分。
摘要:
A lithographic projection apparatus contains a projection system configured to project a patterned beam of radiation onto a target portion of a substrate. The projection system contains one or more optically active mirrors and heat shields located to intercept heat radiation to or from the mirrors and/or their support. The heat shields are actively cooled and the mirrors and the heat shields and the mirrors are supported separately on a support frame to reduce vibration of the mirrors due to active cooling. The heat shields may include heat shields that intercept heat radiation to or from the support and/or respective heat shields for individual mirrors that intercept heat radiation to or from the mirrors.
摘要:
A lithographic projection apparatus includes an active reflector in a radiation system providing a projection beam of radiation and/or in a projection system. The active reflector includes a body member, a reflective multilayer and at least one actuator controllable to adjust the surface figure of the reflecting multilayer, wherein the actuator exerts a substantial force component in a direction parallel to the surface figure of said reflective multilayer. The actuator may be operative to apply torques to said reflector.
摘要:
A lithographic apparatus for patterning a beam of radiation and projecting it onto a substrate, comprising at least two spectral purity filters configured to reduce the intensity of radiation in the beam of radiation in at least one undesirable range of radiation wavelength, wherein the two spectral purity filters are provided with different radiation filtering structures from each other.
摘要:
A lithographic apparatus is disclosed that includes a support constructed to support a patterning device, the patterning device being capable of imparting a radiation beam with a pattern in its cross-section to form a patterned radiation beam and a substrate table constructed to hold a substrate. Further, the lithographic apparatus includes a projection system configured to project the patterned radiation beam onto a target portion of the substrate, the projection system being mounted to a reference element of the lithographic apparatus by a resilient mount to reduce a transfer of high frequency vibration from the reference element to the projection system and a control system to counteract a position error of the substrate table and the support relative to the projection system.
摘要:
A lithographic apparatus includes a projection system including a movable optical element. The movable optical element is capable, by a displacement thereof to influence a position quantity of a radiation beam projected by the projection system. A control device is provided to drive the optical element actuator to influence a position quantity of the movable optical element, thereby influencing a position quantity of the radiation beam as projected by the projection system. The control device is adapted to move the movable optical element to position the radiation beam as projected by the projection system with respect to the substrate, or to correct a position quantity of the radiation beam as projected by the projection system caused by any type of disturbance on the projection system.
摘要:
A lithographic apparatus is disclosed that includes a support constructed to support a patterning device, the patterning device being capable of imparting a radiation beam with a pattern in its cross-section to form a patterned radiation beam and a substrate table constructed to hold a substrate. Further, the lithographic apparatus includes a projection system configured to project the patterned radiation beam onto a target portion of the substrate, the projection system being mounted to a reference element of the lithographic apparatus by a resilient mount to reduce a transfer of high frequency vibration from the reference element to the projection system and a control system to counteract a position error of the substrate table and the support relative to the projection system.
摘要:
A lithographic projection apparatus includes an active reflector in a radiation system providing a projection beam of radiation and/or in a projection system. The active reflector includes a body member, a reflective multilayer and at least one actuator controllable to adjust the surface figure of the reflecting multilayer, wherein the actuator exerts a substantial force component in a direction parallel to the surface figure of said reflective multilayer. The actuator may be operative to apply torques to said reflector.
摘要:
A measurement system configured to measure wave front aberrations of a projection system, as well as a lithographic apparatus including such a measurement system, is provided wherein the measurement system includes a diffractive element and structure configured to increase the pupil filling of the radiation in the pupil of the projection system, both movable into the projection beam between a radiation system and the projection system, and a sensor module configured to sense radiation that has traversed the projection system to measure wave front aberrations of the projection system.
摘要:
A radiation system is configured to generate a radiation beam. The radiation system comprising a chamber that includes a radiation source configured to generate radiation, a radiation beam emission aperture, and a radiation collector configured to collect radiation generated by the source, and to transmit the collected radiation to the radiation beam emission aperture. The radiation collector includes a spectral purity filter configured to enhance a spectral purity of the radiation to be emitted via the aperture.