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公开(公告)号：US06750949B2
公开(公告)日：2004-06-15
申请号：US10193688
申请日：2002-07-12
申请人： Erik Roelof Loopstra , Dominicus Jacobus Petrus Adrianus Franken , Josephus Jacobus Smits , Antonius Johannes Josephus Van Dijsseldonk , Johannes Hubertus Josephina Moors , Albrecht Hof , Günter Maul , Michael Mühlbeyer , Klaus Mehlkopp
发明人： Erik Roelof Loopstra , Dominicus Jacobus Petrus Adrianus Franken , Josephus Jacobus Smits , Antonius Johannes Josephus Van Dijsseldonk , Johannes Hubertus Josephina Moors , Albrecht Hof , Günter Maul , Michael Mühlbeyer , Klaus Mehlkopp
IPC分类号： G03B2742
CPC分类号： G03F7/70258 , G02B7/008 , G02B7/02 , G03F7/70833
摘要： A lithographic projection apparatus according to one embodiment of the invention includes a projection system having a plurality of optical elements or sensors mounted on a frame. The frame includes support portions made of a material (e.g. a glass ceramic) having a coefficient of thermal expansion of less than or approximately equal to 0.1×10−6 K−1.
摘要翻译： 根据本发明的一个实施例的光刻投影设备包括具有安装在框架上的多个光学元件或传感器的投影系统。 框架包括由热膨胀系数小于或大约等于0.1×10 -6 K -1的材料（例如玻璃陶瓷）制成的支撑部分。
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2.发明授权Lithographic apparatus, device manufacturing method, and device manufactured thereby 有权平版印刷设备，器件制造方法和由此制造的器件公开(公告)号：US07116399B2
公开(公告)日：2006-10-03
申请号：US10844570
申请日：2004-05-13
申请人： Wilhelmus Josephus Box , Antonius Johannes Josephus Van Dijsseldonk , Dominicus Jacobus Petrus Adrianus Franken , Martinus Hendrikus Antonius Leenders , Erik Roelof Loopstra , Josephus Jacobus Smits , Marc Wilhelmus Maria Van Der Wijst
发明人： Wilhelmus Josephus Box , Antonius Johannes Josephus Van Dijsseldonk , Dominicus Jacobus Petrus Adrianus Franken , Martinus Hendrikus Antonius Leenders , Erik Roelof Loopstra , Josephus Jacobus Smits , Marc Wilhelmus Maria Van Der Wijst
CPC分类号： G03F7/70808 , G03F7/70825 , G03F7/70833 , G03F7/70858 , G03F7/70891 , G03F7/709 , G03F7/70991
摘要： A lithographic projection apparatus contains a projection system configured to project a patterned beam of radiation onto a target portion of a substrate. The projection system contains one or more optically active mirrors and heat shields located to intercept heat radiation to or from the mirrors and/or their support. The heat shields are actively cooled and the mirrors and the heat shields and the mirrors are supported separately on a support frame to reduce vibration of the mirrors due to active cooling. The heat shields may include heat shields that intercept heat radiation to or from the support and/or respective heat shields for individual mirrors that intercept heat radiation to or from the mirrors.
摘要翻译： 光刻投影设备包含投影系统，该投影系统配置成将图案化的辐射束投影到基板的目标部分上。 投影系统包含一个或多个光学反射镜和隔热罩，其被定位成拦截到达镜子和/或其支撑件的热辐射。 热屏蔽被主动冷却，镜子和隔热罩和镜子分别支撑在支撑框架上，以减少由于主动冷却引起的反射镜振动。 隔热罩可以包括热屏蔽件，该隔热板截取向支撑和/或相应的隔热板的热辐射，用于隔离到或从反射镜散发的各个反射镜。
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3.发明授权Lithographic apparatus device manufacturing method and device manufactured thereby 有权由此制造的平版印刷装置的制造方法和装置公开(公告)号：US06967756B2
公开(公告)日：2005-11-22
申请号：US10834834
申请日：2004-04-30
申请人： Antonius Johannes Josephus Van Dijsseldonk , Erik Roelof Loopstra , Dominicus Jacobus Petrus Adrianus Franken
发明人： Antonius Johannes Josephus Van Dijsseldonk , Erik Roelof Loopstra , Dominicus Jacobus Petrus Adrianus Franken
CPC分类号： G03F7/70141 , G02B7/185 , G02B26/0825 , G03F7/70258 , G03F7/70266
摘要： A lithographic projection apparatus includes an active reflector in a radiation system providing a projection beam of radiation and/or in a projection system. The active reflector includes a body member, a reflective multilayer and at least one actuator controllable to adjust the surface figure of the reflecting multilayer, wherein the actuator exerts a substantial force component in a direction parallel to the surface figure of said reflective multilayer. The actuator may be operative to apply torques to said reflector.
摘要翻译： 光刻投影设备包括在辐射系统中的有源反射器，该辐射系统提供辐射的投影光束和/或投影系统。 主动反射器包括主体构件，反射多层和至少一个可控制的致动器，用于调节反射多层的表面图形，其中致动器沿平行于所述反射多层的表面图形的方向施加显着的力分量。 致动器可操作以将扭矩施加到所述反射器。
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公开(公告)号：US20080074629A1
公开(公告)日：2008-03-27
申请号：US11527729
申请日：2006-09-27
申请人： Rogier Herman Mathijs Groeneveld , Antonius Johannes Josephus Van Dijsseldonk , Dominicus Jacobus Petrus Adrianus Franken , Bastiaan Stephanus Hendricus Jansen , Robertus Johannes Marinus De Jongh , Marc Wilhelmus Maria Van Der Wijst , Maurice Wijckmans
发明人： Rogier Herman Mathijs Groeneveld , Antonius Johannes Josephus Van Dijsseldonk , Dominicus Jacobus Petrus Adrianus Franken , Bastiaan Stephanus Hendricus Jansen , Robertus Johannes Marinus De Jongh , Marc Wilhelmus Maria Van Der Wijst , Maurice Wijckmans
IPC分类号： G03B27/42
CPC分类号： G03F7/709 , G03F7/70833
摘要： A lithographic apparatus is disclosed that includes a support constructed to support a patterning device, the patterning device being capable of imparting a radiation beam with a pattern in its cross-section to form a patterned radiation beam and a substrate table constructed to hold a substrate. Further, the lithographic apparatus includes a projection system configured to project the patterned radiation beam onto a target portion of the substrate, the projection system being mounted to a reference element of the lithographic apparatus by a resilient mount to reduce a transfer of high frequency vibration from the reference element to the projection system and a control system to counteract a position error of the substrate table and the support relative to the projection system.
摘要翻译： 公开了一种光刻设备，其包括构造成支撑图案形成装置的支撑件，所述图案形成装置能够在其横截面中赋予具有图案的辐射束以形成图案化的辐射束，以及被构造成保持衬底的衬底台。 此外，光刻设备包括投影系统，其配置成将图案化的辐射束投影到基板的目标部分上，投影系统通过弹性安装件安装到光刻设备的参考元件，以减少高频振动从 投影系统的参考元件和用于抵消衬底台和支撑件相对于投影系统的位置误差的控制系统。
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5.发明授权Lithographic apparatus, device manufacturing method, and device manufactured thereby 有权平版印刷设备，器件制造方法和由此制造的器件公开(公告)号：US06765712B2
公开(公告)日：2004-07-20
申请号：US09902490
申请日：2001-07-11
申请人： Antonius Johannes Josephus Van Dijsseldonk , Erik Roeloff Loopstra , Dominicus Jacobus Petrus Adrianus Franken
发明人： Antonius Johannes Josephus Van Dijsseldonk , Erik Roeloff Loopstra , Dominicus Jacobus Petrus Adrianus Franken
IPC分类号： G02B2600
CPC分类号： G03F7/70141 , G02B7/185 , G02B26/0825 , G03F7/70258 , G03F7/70266
摘要： A lithographic projection apparatus includes an active reflector in a radiation system providing a projection beam of radiation and/or in a projection system. The active reflector includes a body member, a reflective multilayer and at least one actuator controllable to adjust the surface figure of the reflecting multilayer, wherein the actuator exerts a substantial force component in a direction parallel to the surface figure of said reflective multilayer. The actuator may be operative to apply torques to said reflector.
摘要翻译： 光刻投影设备包括在辐射系统中的有源反射器，该辐射系统提供辐射的投影光束和/或投影系统。 主动反射器包括主体构件，反射多层和至少一个可控制的致动器，用于调节反射多层的表面图形，其中致动器沿平行于所述反射多层的表面图形的方向施加显着的力分量。 致动器可操作以将扭矩施加到所述反射器。
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公开(公告)号：US08908144B2
公开(公告)日：2014-12-09
申请号：US11527729
申请日：2006-09-27
申请人： Rogier Herman Mathijs Groeneveld , Antonius Johannes Josephus Van Dijsseldonk , Dominicus Jacobus Petrus Adrianus Franken , Bastiaan Stephanus Hendricus Jansen , Robertus Johannes Marinus De Jongh , Marc Wilhelmus Maria Van Der Wijst , Maurice Willem Jozef Etiënne Wijckmans
发明人： Rogier Herman Mathijs Groeneveld , Antonius Johannes Josephus Van Dijsseldonk , Dominicus Jacobus Petrus Adrianus Franken , Bastiaan Stephanus Hendricus Jansen , Robertus Johannes Marinus De Jongh , Marc Wilhelmus Maria Van Der Wijst , Maurice Willem Jozef Etiënne Wijckmans
CPC分类号： G03F7/709 , G03F7/70833
摘要： A lithographic apparatus is disclosed that includes a support constructed to support a patterning device, the patterning device being capable of imparting a radiation beam with a pattern in its cross-section to form a patterned radiation beam and a substrate table constructed to hold a substrate. Further, the lithographic apparatus includes a projection system configured to project the patterned radiation beam onto a target portion of the substrate, the projection system being mounted to a reference element of the lithographic apparatus by a resilient mount to reduce a transfer of high frequency vibration from the reference element to the projection system and a control system to counteract a position error of the substrate table and the support relative to the projection system.
摘要翻译： 公开了一种光刻设备，其包括构造成支撑图案形成装置的支撑件，所述图案形成装置能够在其横截面中赋予具有图案的辐射束以形成图案化的辐射束，以及构造成保持衬底的衬底台。 此外，光刻设备包括投影系统，其配置成将图案化的辐射束投影到基板的目标部分上，投影系统通过弹性安装件安装到光刻设备的参考元件，以减少高频振动从 投影系统的参考元件和用于抵消衬底台和支撑件相对于投影系统的位置误差的控制系统。
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公开(公告)号：US07307262B2
公开(公告)日：2007-12-11
申请号：US11019524
申请日：2004-12-23
申请人： Antonius Johannes Josephus Van Dijsseldonk , Dominicus Jacobus Petrus Adrianus Franken , Robertus Johannes Marinus De Jongh , Jacob Kleijn , Bastiaan S H Jansen , Marc Van Der Wijst
发明人： Antonius Johannes Josephus Van Dijsseldonk , Dominicus Jacobus Petrus Adrianus Franken , Robertus Johannes Marinus De Jongh , Jacob Kleijn , Bastiaan S H Jansen , Marc Van Der Wijst
IPC分类号： G21G5/00
CPC分类号： G03F7/709 , G03F7/70266 , G03F7/70825
摘要： A lithographic apparatus includes a projection system including a movable optical element. The movable optical element is capable, by a displacement thereof to influence a position quantity of a radiation beam projected by the projection system. A control device is provided to drive the optical element actuator to influence a position quantity of the movable optical element, thereby influencing a position quantity of the radiation beam as projected by the projection system. The control device is adapted to move the movable optical element to position the radiation beam as projected by the projection system with respect to the substrate, or to correct a position quantity of the radiation beam as projected by the projection system caused by any type of disturbance on the projection system.
摘要翻译： 光刻设备包括包括可移动光学元件的投影系统。 可移动光学元件能够通过其位移来影响由投影系统投射的辐射束的位置量。 提供控制装置以驱动光学元件致动器来影响可移动光学元件的位置量，从而影响由投影系统投射的辐射束的位置量。 控制装置适于移动可移动光学元件以将投影系统相对于基板投射的辐射束定位，或者校正由任何类型的扰动引起的由投影系统投影的辐射束的位置量 在投影系统上。
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公开(公告)号：US07436484B2
公开(公告)日：2008-10-14
申请号：US11022936
申请日：2004-12-28
申请人： Marc Wilhelmus Maria Van Der Wijst , Dominicus Jacobus Petrus Adrianus Franken , Erik Roelof Loopstra , Marius Ravensbergen
发明人： Marc Wilhelmus Maria Van Der Wijst , Dominicus Jacobus Petrus Adrianus Franken , Erik Roelof Loopstra , Marius Ravensbergen
CPC分类号： G03F7/70266 , G03F7/70825
摘要： A lithographic apparatus is disclosed having a deformable lens element through which a patterned radiation beam is arranged to pass before reaching a substrate and having a deformable lens actuator configured to transmit a combination of a force substantially parallel to the optical axis of the projection system and a localized torque about an axis substantially perpendicular to the optical axis independently at a plurality of sub-regions on the deformable lens element.
摘要翻译： 公开了一种光刻设备，其具有可变形透镜元件，图案化的辐射束通过该可变形透镜元件布置成在到达基板之前通过，并且具有被配置为透射基本上平行于投影系统的光轴的力的组合的可变形透镜致动器，以及 围绕可变形透镜元件上的多个子区域处于基本垂直于光轴的轴的局部扭矩。
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公开(公告)号：US07049592B2
公开(公告)日：2006-05-23
申请号：US10615421
申请日：2003-07-09
申请人： Dominicus Jacobus Petrus Adrianus Franken , Erik Roelof Loopstra , Pertrus Rutgerus Bartray , Marc Wilhelmus Maria Van Der Wijst , Michael Jozefa Mathijs Renkens , Gerard Van Schothorst , Johan Juliana Dries
发明人： Dominicus Jacobus Petrus Adrianus Franken , Erik Roelof Loopstra , Pertrus Rutgerus Bartray , Marc Wilhelmus Maria Van Der Wijst , Michael Jozefa Mathijs Renkens , Gerard Van Schothorst , Johan Juliana Dries
CPC分类号： G03F7/70833 , G03F7/709
摘要： A lithographic apparatus includes a projection system mounted on a reference frame, which in turn is mounted on a base which supports the apparatus. Vibrations and displacement errors in the base are filtered through two sets of isolation mounts operatively between the base and reference frame and between the reference frame and a projection frame of the projection system and therefore disturbance of the projection system is reduced.
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公开(公告)号：US07999914B2
公开(公告)日：2011-08-16
申请号：US12081975
申请日：2008-04-24
申请人： Marc Wilhelmus Maria Van Der Wijst , Dominicus Jacobus Petrus Adrianus Franken , Erik Roelof Loopstra , Marius Ravensbergen
发明人： Marc Wilhelmus Maria Van Der Wijst , Dominicus Jacobus Petrus Adrianus Franken , Erik Roelof Loopstra , Marius Ravensbergen
CPC分类号： G03F7/70266 , G03F7/70825
摘要： A lithographic apparatus is disclosed having a deformable lens element through which a patterned radiation beam is arranged to pass before reaching a substrate and having a deformable lens actuator configured to transmit a combination of a force substantially parallel to the optical axis of the projection system and a localized torque about an axis substantially perpendicular to the optical axis independently at a plurality of sub-regions on the deformable lens element.
摘要翻译： 公开了一种光刻设备，其具有可变形透镜元件，图案化的辐射束通过该可变形透镜元件布置成在到达基板之前通过，并且具有被配置为透射基本上平行于投影系统的光轴的力的组合的可变形透镜致动器，以及 围绕可变形透镜元件上的多个子区域处于基本垂直于光轴的轴的局部扭矩。
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