公开(公告)号：US06750949B2

公开(公告)日：2004-06-15

申请号：US10193688

申请日：2002-07-12

申请人： Erik Roelof Loopstra ,  Dominicus Jacobus Petrus Adrianus Franken ,  Josephus Jacobus Smits ,  Antonius Johannes Josephus Van Dijsseldonk ,  Johannes Hubertus Josephina Moors ,  Albrecht Hof ,  Günter Maul ,  Michael Mühlbeyer ,  Klaus Mehlkopp

发明人： Erik Roelof Loopstra ,  Dominicus Jacobus Petrus Adrianus Franken ,  Josephus Jacobus Smits ,  Antonius Johannes Josephus Van Dijsseldonk ,  Johannes Hubertus Josephina Moors ,  Albrecht Hof ,  Günter Maul ,  Michael Mühlbeyer ,  Klaus Mehlkopp

IPC分类号： G03B2742

CPC分类号： G03F7/70258 ,  G02B7/008 ,  G02B7/02 ,  G03F7/70833

摘要： A lithographic projection apparatus according to one embodiment of the invention includes a projection system having a plurality of optical elements or sensors mounted on a frame. The frame includes support portions made of a material (e.g. a glass ceramic) having a coefficient of thermal expansion of less than or approximately equal to 0.1×10−6 K−1.

摘要翻译： 根据本发明的一个实施例的光刻投影设备包括具有安装在框架上的多个光学元件或传感器的投影系统。 框架包括由热膨胀系数小于或大约等于0.1×10 -6 K -1的材料（例如玻璃陶瓷）制成的支撑部分。

公开(公告)号：US09594306B2

公开(公告)日：2017-03-14

申请号：US14002000

申请日：2011-12-21

申请人： Vadim Yevgenyevich Banine ,  Wilhelmus Petrus De Boeij ,  Antonius Johannes Josephus Van Dijsseldonk Van Dijsseldonk ,  Erik Roelof Loopstra ,  Johannes Hubertus Josephina Moors ,  Jan Bernard Plechelmus Van Schoot ,  Gerardus Hubertus Petrus Maria Swinkels ,  Andrei Mikhailovich Yakunin

发明人： Vadim Yevgenyevich Banine ,  Wilhelmus Petrus De Boeij ,  Antonius Johannes Josephus Van Dijsseldonk Van Dijsseldonk ,  Erik Roelof Loopstra ,  Johannes Hubertus Josephina Moors ,  Jan Bernard Plechelmus Van Schoot ,  Gerardus Hubertus Petrus Maria Swinkels ,  Andrei Mikhailovich Yakunin

IPC分类号： G03F7/20 ,  B82Y10/00 ,  G21K1/06 ,  H05G2/00

CPC分类号： G03F7/70191 ,  B82Y10/00 ,  G02B1/11 ,  G02B5/1838 ,  G02B5/281 ,  G02B5/283 ,  G03F7/70008 ,  G03F7/702 ,  G03F7/70308 ,  G03F7/70575 ,  G21K1/062 ,  G21K1/067 ,  G21K2201/061 ,  G21K2201/067 ,  H05G2/003 ,  H05G2/005 ,  H05G2/008

摘要： A lithographic apparatus for patterning a beam of radiation and projecting it onto a substrate, comprising at least two spectral purity filters configured to reduce the intensity of radiation in the beam of radiation in at least one undesirable range of radiation wavelength, wherein the two spectral purity filters are provided with different radiation filtering structures from each other.

摘要翻译： 一种光刻设备，用于将辐射束图案化并将其投影到衬底上，包括至少两个光谱纯度滤光器，其被配置为在至少一个不期望的辐射波长范围内降低辐射束中的辐射强度，其中两个光谱纯度 过滤器具有彼此不同的辐射过滤结构。

公开(公告)号：US06597431B2

公开(公告)日：2003-07-22

申请号：US09899560

申请日：2001-07-06

申请人： Jozef Petrus Henricus Benschop ,  Oscar Fransiscus Jozephus Noordman ,  Michael Jozefa Mathijs Renkens ,  Erik Roelof Loopstra ,  Vadim Yevgenyevich Banine ,  Johannes Hubertus Josephina Moors ,  Antonius Johannes Josephus van Dijsseldonk

发明人： Jozef Petrus Henricus Benschop ,  Oscar Fransiscus Jozephus Noordman ,  Michael Jozefa Mathijs Renkens ,  Erik Roelof Loopstra ,  Vadim Yevgenyevich Banine ,  Johannes Hubertus Josephina Moors ,  Antonius Johannes Josephus van Dijsseldonk

IPC分类号： G03B2772

CPC分类号： G03F7/70483 ,  G03F7/70058 ,  G03F7/70216 ,  G03F7/708

摘要： A lithographic projection apparatus includes a radiation system for supplying a projection beam of radiation having a propagation direction, a support structure for supporting patterning structure, the patterning structure serving to pattern the projection beam according to a desired pattern, a substrate table for holding a substrate and a projection system for projecting the patterned beam onto a target portion of the substrate, wherein the lithographic projection apparatus further includes a sensor for measuring a movement of the projection beam perpendicular to its propagation direction and a controller to control a received dose of the projection beam on a target portion of the substrate in response to an output from the sensor.

摘要翻译： 光刻投影装置包括用于提供具有传播方向的投影射束的辐射系统，用于支撑图案形成结构的支撑结构，用于根据期望图案对投影光束进行图案化的图案形成结构，用于保持基板的基板台 以及用于将图案化的光束投影到基板的目标部分上的投影系统，其中所述光刻投影装置还包括用于测量垂直于其传播方向的投影光束的移动的传感器，以及用于控制投影的接收剂量的控制器 响应于来自传感器的输出，在基板的目标部分上射束。

公开(公告)号：US20140085619A1

公开(公告)日：2014-03-27

申请号：US14002000

申请日：2011-12-21

申请人： Vadim Yevgenyevich Banine ,  Wilhelmus Petrus De Boeij ,  Antonius Johannes Josephus Van Dijsseldonk ,  Erik Roelof Loopstra ,  Johannes Hubertus Josephina Moors ,  Jan Bernard Plechelmus Van Schoot ,  Gerardus Hubertus Petrus Maria Swinkels ,  Andrei Mikhailovich Yakunin

发明人： Vadim Yevgenyevich Banine ,  Wilhelmus Petrus De Boeij ,  Antonius Johannes Josephus Van Dijsseldonk ,  Erik Roelof Loopstra ,  Johannes Hubertus Josephina Moors ,  Jan Bernard Plechelmus Van Schoot ,  Gerardus Hubertus Petrus Maria Swinkels ,  Andrei Mikhailovich Yakunin

IPC分类号： G03F7/20

CPC分类号： G03F7/70191 ,  B82Y10/00 ,  G02B1/11 ,  G02B5/1838 ,  G02B5/281 ,  G02B5/283 ,  G03F7/70008 ,  G03F7/702 ,  G03F7/70308 ,  G03F7/70575 ,  G21K1/062 ,  G21K1/067 ,  G21K2201/061 ,  G21K2201/067 ,  H05G2/003 ,  H05G2/005 ,  H05G2/008

摘要： A lithographic apparatus for patterning a beam of radiation and projecting it onto a substrate, comprising at least two spectral purity filters configured to reduce the intensity of radiation in the beam of radiation in at least one undesirable range of radiation wavelength, wherein the two spectral purity filters are provided with different radiation filtering structures from each other.

摘要翻译： 一种光刻设备，用于将辐射束图案化并将其投影到衬底上，包括至少两个光谱纯度滤光器，其被配置为在至少一个不期望的辐射波长范围内降低辐射束中的辐射强度，其中两个光谱纯度 过滤器具有彼此不同的辐射过滤结构。

公开(公告)号：US06940587B2

公开(公告)日：2005-09-06

申请号：US10670801

申请日：2003-09-26

申请人： Hans Van Der Laan ,  Johannes Jacobus Matheus Baselmans ,  Antonius Johannes Josephus Van Dijsseldonk ,  Martinus Hendrikus Antonius Leenders ,  Johannes Hubertus Josephina Moors

发明人： Hans Van Der Laan ,  Johannes Jacobus Matheus Baselmans ,  Antonius Johannes Josephus Van Dijsseldonk ,  Martinus Hendrikus Antonius Leenders ,  Johannes Hubertus Josephina Moors

IPC分类号： G01M11/02 ,  G03F7/20 ,  H01L21/027 ,  G03B27/52 ,  G03B27/54 ,  G03B27/68

CPC分类号： G03F7/706

摘要： A measurement system configured to measure wave front aberrations of a projection system, as well as a lithographic apparatus including such a measurement system, is provided wherein the measurement system includes a diffractive element and structure configured to increase the pupil filling of the radiation in the pupil of the projection system, both movable into the projection beam between a radiation system and the projection system, and a sensor module configured to sense radiation that has traversed the projection system to measure wave front aberrations of the projection system.

摘要翻译： 提供了一种被配置为测量投影系统的波前像差的测量系统以及包括这种测量系统的光刻设备，其中测量系统包括衍射元件和结构，其被配置为增加瞳孔中的瞳孔填充 所述投影系统可移动到辐射系统和投影系统之间的投影光束中;以及传感器模块，被配置为感测已经穿过投影系统的辐射以测量投影系统的波前像差。

公开(公告)号：US08373846B2

公开(公告)日：2013-02-12

申请号：US12553368

申请日：2009-09-03

申请人： Erik Roelof Loopstra ,  Gerardus Hubertus Petrus Maria Swinkels ,  Vadim Yevgenyevich Banine ,  Johannes Hubertus Josephina Moors

发明人： Erik Roelof Loopstra ,  Gerardus Hubertus Petrus Maria Swinkels ,  Vadim Yevgenyevich Banine ,  Johannes Hubertus Josephina Moors

IPC分类号： G03B27/54 ,  G03B27/42

CPC分类号： H05G2/006 ,  G03F7/70033 ,  G03F7/70891 ,  G03F7/70916 ,  G21K1/06 ,  H05G2/003 ,  H05G2/005 ,  H05G2/008

摘要： A radiation source is configured to produce extreme ultraviolet radiation. The radiation source includes a chamber in which, in use, a plasma is generated, and an evaporation surface configured to evaporate a material formed as a by-product from the plasma and that is emitted to the evaporation surface. A method for removing a by-product material in or from a plasma radiation source of a lithographic apparatus includes evaporating a material which, in use, is emitted to that surface from the plasma.

公开(公告)号：US08368040B2

公开(公告)日：2013-02-05

申请号：US12832258

申请日：2010-07-08

申请人： Erik Roelof Loopstra ,  Vladimir Vitalevich Ivanov ,  Johannes Hubertus Josephina Moors ,  Gerardus Hubertus Petrus Maria Swinkels ,  Andrei Mikhailovich Yakunin ,  Dennis De Graaf ,  Uwe Bruno Heini Stamm

发明人： Erik Roelof Loopstra ,  Vladimir Vitalevich Ivanov ,  Johannes Hubertus Josephina Moors ,  Gerardus Hubertus Petrus Maria Swinkels ,  Andrei Mikhailovich Yakunin ,  Dennis De Graaf ,  Uwe Bruno Heini Stamm

IPC分类号： G21K5/04 ,  H01J35/20

CPC分类号： H05G2/003 ,  G03F7/70033 ,  H05G2/005 ,  H05G2/008

摘要： A radiation system includes a target material supply configured to supply droplets of target material along a trajectory, and a laser system that includes an amplifier and optics. The optics are configured to establish a first beam path which passes through the amplifier and through a first location on the trajectory, and to establish a second beam path which passes through the amplifier and through a second location on the trajectory. The laser system is configured to generate a first pulse of laser radiation when photons emitted from the amplifier are reflected along the first beam path by a droplet of target material at the first location on the trajectory. The laser system is configured to generate a second pulse of laser radiation when photons emitted from the amplifier are reflected along the second beam path by the droplet of target material at the second location on the trajectory.

摘要翻译： 辐射系统包括被配置为沿着轨迹提供目标材料的液滴的目标材料供应，以及包括放大器和光学器件的激光系统。 光学器件被配置成建立穿过放大器并通过轨迹上的第一位置的第一光束路径，并且建立穿过放大器并通过轨迹上的第二位置的第二光束路径。 激光系统被配置为当从放大器发射的光子在轨迹上的第一位置处通过目标材料的液滴沿着第一光束路径反射时，产生激光辐射的第一脉冲。 激光系统被配置为当从放大器发射的光子在轨道上的第二位置处由靶材料的液滴沿着第二光束路径反射时，产生激光辐射的第二脉冲。

公开(公告)号：US07459690B2

公开(公告)日：2008-12-02

申请号：US11432365

申请日：2006-05-12

申请人： Jan Evert Van Der Werf ,  Mark Kroon ,  Wilhelmus Cornelis Keur ,  Vadim Yevgenyevich Banine ,  Hans Van Der Laan ,  Johannes Hubertus Josephina Moors ,  Erik Roelof Loopstra

发明人： Jan Evert Van Der Werf ,  Mark Kroon ,  Wilhelmus Cornelis Keur ,  Vadim Yevgenyevich Banine ,  Hans Van Der Laan ,  Johannes Hubertus Josephina Moors ,  Erik Roelof Loopstra

IPC分类号： G01J1/42

CPC分类号： G03F7/70558 ,  G01J1/58 ,  G03F7/70741 ,  G03F7/7085 ,  G03F7/70916 ,  G03F7/70983

摘要： A radiation sensor for use with a lithographic apparatus is disclosed, the radiation sensor comprising a radiation-sensitive material which converts incident radiation of wavelength λ1 into secondary radiation; and sensing means capable of detecting the secondary radiation emerging from said layer.

摘要翻译： 公开了一种用于光刻设备的辐射传感器，辐射传感器包括将波长λ1的入射辐射转换成次级辐射的辐射敏感材料; 以及能够检测从所述层出现的二次辐射的感测装置。

公开(公告)号：US08507882B2

公开(公告)日：2013-08-13

申请号：US12543578

申请日：2009-08-19

申请人： Gerardus Hubertus Petrus Maria Swinkels ,  Vadim Yevgenyevich Banine ,  Erik Roelof Loopstra ,  Johannes Hubertus Josephina Moors

发明人： Gerardus Hubertus Petrus Maria Swinkels ,  Vadim Yevgenyevich Banine ,  Erik Roelof Loopstra ,  Johannes Hubertus Josephina Moors

IPC分类号： G03B27/42 ,  H01J19/12

CPC分类号： G03F7/70916 ,  G03F7/70033 ,  G03F7/70858 ,  G03F7/70983 ,  H05G2/003 ,  H05G2/005 ,  H05G2/006 ,  H05G2/008

摘要： A radiation source is configured to generate extreme ultraviolet radiation. The radiation source includes a droplet generator constructed and arranged to generate fuel droplets, a heater constructed and arranged to heat the fuel droplets following generation of the fuel droplets by the droplet generator, and reduce the mass of fuel present in the fuel droplets and/or reduce the density of the fuel droplets, and a radiation emitter constructed and arranged to direct radiation onto the fuel droplets that have been heated by the heater to generate the extreme ultraviolet radiation.

摘要翻译： 辐射源被配置成产生极紫外辐射。 辐射源包括构造和布置成产生燃料液滴的液滴发生器，被构造和布置成在液滴发生器产生燃料液滴之后加热燃料液滴的加热器，并且减少燃料液滴中存在的燃料质量和/或 降低燃料液滴的密度，以及被构造和布置成将辐射引导到已被加热器加热以产生极紫外辐射的燃料液滴上的辐射发射器。

公开(公告)号：US20090090877A1

公开(公告)日：2009-04-09

申请号：US12197693

申请日：2008-08-25

申请人： Tjarko Adriaan Rudolf Van Empel ,  Vadim Yevgenyevich Banine ,  Vladimir Vitalevich Ivanov ,  Erik Roelof Loopstra ,  Johannes Hubertus Josephina Moors ,  Jan Bernard Plechelmus Van Schoot ,  Yuri Johannes Gabriel Van De Vijver ,  Gerardus Hubertus Petrus Maria Swinkels ,  Hendrikus Gijsbertus Schimmel ,  Dzmitry Labetski

发明人： Tjarko Adriaan Rudolf Van Empel ,  Vadim Yevgenyevich Banine ,  Vladimir Vitalevich Ivanov ,  Erik Roelof Loopstra ,  Johannes Hubertus Josephina Moors ,  Jan Bernard Plechelmus Van Schoot ,  Yuri Johannes Gabriel Van De Vijver ,  Gerardus Hubertus Petrus Maria Swinkels ,  Hendrikus Gijsbertus Schimmel ,  Dzmitry Labetski

IPC分类号： G01J3/10 ,  G03B27/54

CPC分类号： H05G2/008 ,  G03F7/70175 ,  G03F7/70891 ,  G03F7/70916 ,  G03F7/70983 ,  H05G2/003 ,  H05G2/006 ,  H05K7/2039

摘要： A module for producing extreme ultraviolet radiation includes a supply configured to supply droplets of an ignition material to a predetermined target ignition position and a laser arranged to be focused on the predetermined target ignition position and to produce a plasma by hitting such a droplet which is located at the predetermined target ignition position in order to change the droplet into an extreme ultraviolet producing plasma. Also, the module includes a collector mirror having a mirror surface constructed and arranged to reflect the radiation in order to focus the radiation on a focal point. A fluid supply is constructed and arranged to form a gas flow flowing away from the mirror surface in a direction transverse with respect to the mirror surface in order to mitigate particle debris produced by the plasma.

摘要翻译： 用于产生极紫外线辐射的模块包括被配置为将点火材料的液滴供应到预定的目标点火位置的电源和布置成聚焦在预定的目标点火位置上的激光器，并且通过击打位于 在预定的目标点火位置，以便将液滴变成极紫外线产生等离子体。 此外，模块包括收集器反射镜，其具有构造和布置成反射辐射的镜面，以便将辐射聚焦在焦点上。 流体供应器被构造和布置成在相对于镜面横向的方向上形成从镜面流出的气流，以便减轻由等离子体产生的颗粒碎片。