Method of fabricating thermally stable MTJ cell and apparatus
    1.
    发明授权
    Method of fabricating thermally stable MTJ cell and apparatus 有权
    制造热稳定MTJ电池及其装置的方法

    公开(公告)号:US06544801B1

    公开(公告)日:2003-04-08

    申请号:US09642350

    申请日:2000-08-21

    IPC分类号: H01L2100

    CPC分类号: H01L43/12 B82Y10/00

    摘要: An MTJ cell including an insulator layer of material between magnetic material layers with the insulator layer of material having a greater attraction for a third material than the magnetic material layers. The third material is introduced to one or both so that when the cell is heated the third material is redistributed from the magnetic material layer to the insulator layer. Upon redistribution the insulator layer becomes an insulator layer material. Also, a first diffusion barrier layer is positioned between a first metal electrode and one of the magnetic material layers and/or a second diffusion barrier layer is positioned between a second metal electrode and the other magnetic material layer to prevent diffusion of the metal in the electrodes into the magnetic material layers.

    摘要翻译: MTJ单元包括在磁性材料层之间的材料的绝缘体层,材料的绝缘体层对于第三材料具有比磁性材料层更大的吸引力。 将第三材料引入一个或两个,使得当电池被加热时,第三材料从磁性材料层重新分布到绝缘体层。 在再分配时,绝缘体层变成绝缘体层材料。 此外,第一扩散阻挡层位于第一金属电极和一个磁性材料层之间,和/或第二扩散阻挡层位于第二金属电极和另一个磁性材料层之间,以防止金属在 电极进入磁性材料层。

    Method of making a low resistance MTJ
    2.
    发明授权
    Method of making a low resistance MTJ 有权
    制造低电阻MTJ的方法

    公开(公告)号:US06261646B1

    公开(公告)日:2001-07-17

    申请号:US09639746

    申请日:2000-08-14

    IPC分类号: C23C1414

    摘要: A low resistance magnetic tunnel junction with low resistance barrier layer and method of fabrication is disclosed. A first magnetic layer of material with a surface is provided and a continuous layer of material, e.g. aluminum, is formed on the surface of the first magnetic layer. The continuous layer of material is treated to produce a low resistance barrier layer of oxynitride material and a second magnetic layer is formed on the barrier layer of oxynitride material to complete the low resistance magnetic tunnel junction.

    摘要翻译: 公开了具有低电阻阻挡层的低电阻磁隧道结及其制造方法。 提供具有表面的第一磁性材料层和连续的材料层,例如, 铝,形成在第一磁性层的表面上。 处理连续的材料层以产生氮氧化物材料的低电阻阻挡层,并且在氧氮化物材料的阻挡层上形成第二磁性层以完成低电阻磁性隧道结。

    Low resistance MTJ
    3.
    发明授权
    Low resistance MTJ 失效
    低电阻MTJ

    公开(公告)号:US06183859B2

    公开(公告)日:2001-02-06

    申请号:US09119537

    申请日:1998-07-20

    IPC分类号: G11B566

    摘要: A low resistance magnetic tunnel junction with low resistance barrier layer and method of fabrication is disclosed. A first magnetic layer of material with a surface is provided and a continuous layer of material, e.g. aluminum, is formed on the surface of the first magnetic layer. The continuous layer of material is treated to produce a low resistance barrier layer of oxynitride material and a second magnetic layer is formed on the barrier layer of oxynitride material to complete the low resistance magnetic tunnel junction.

    摘要翻译: 公开了具有低电阻阻挡层的低电阻磁隧道结及其制造方法。 提供具有表面的第一磁性材料层和连续的材料层,例如, 铝,形成在第一磁性层的表面上。 处理连续的材料层以产生氮氧化物材料的低电阻阻挡层,并且在氧氮化物材料的阻挡层上形成第二磁性层以完成低电阻磁性隧道结。

    Two-axis magnetic field sensor having reduced compensation angle for zero offset
    7.
    发明授权
    Two-axis magnetic field sensor having reduced compensation angle for zero offset 有权
    两轴磁场传感器具有减小零偏移的补偿角

    公开(公告)号:US08508221B2

    公开(公告)日:2013-08-13

    申请号:US12870970

    申请日:2010-08-30

    IPC分类号: G01R33/02 H01R43/00

    摘要: A sensor and fabrication process are provided for forming reference layers with substantially orthogonal magnetization directions having zero offset with a small compensation angle. An exemplary embodiment includes a sensor layer stack of a magnetoresistive thin-film based magnetic field sensor, the sensor layer stack comprising a pinning layer; a pinned layer including a layer of amorphous material over the pinning layer, and a first layer of crystalline material over the layer of amorphous material; a nonmagnetic coupling layer over the pinned layer; a fixed layer over the nonmagnetic coupling layer; a tunnel barrier over the fixed layer; and a sense layer over the nonmagnetic intermediate layer. Another embodiment includes a sensor layer stack where a pinned layer including two crystalline layers separated by a amorphous layer.

    摘要翻译: 提供传感器和制造工艺,用于形成具有基本上正交的磁化方向的参考层,具有零偏移并具有小的补偿角。 示例性实施例包括基于磁阻薄膜的磁场传感器的传感器层堆叠,传感器层堆叠包括钉扎层; 包括在钉扎层上的无定形材料层的钉扎层和在非晶材料层上的第一层结晶材料; 在被钉扎层上的非磁性耦合层; 在非磁耦合层上的固定层; 固定层上的隧道势垒; 以及在非磁性中间层上的感测层。 另一个实施例包括传感器层堆叠,其中包括由非晶层隔开的两个结晶层的钉扎层。

    Magnetic random access memory and fabricating method thereof
    8.
    发明授权
    Magnetic random access memory and fabricating method thereof 有权
    磁性随机存取存储器及其制造方法

    公开(公告)号:US5940319A

    公开(公告)日:1999-08-17

    申请号:US144686

    申请日:1998-08-31

    摘要: An improved and novel MRAM device with magnetic memory elements and circuitry for controlling magnetic memory elements is provided. The circuitry, for example, transistor (12a) having a gate (17a), a drain (18) and a source (16a) is integrated on a substrate (11) and coupled to a magnetic memory element (43) on the circuitry through a plug conductor (19a) and a conductor line (45). The circuitry is fabricated first under the CMOS process and then magnetic memory elements (43, 44). Digit line (29) and bit line (48) are placed under and on top of magnetic memory element (43), respectively, and enabled to access magnetic memory element (43). These lines are enclosed by a high permeability layer (31, 56, 58) excluding a surface facing magnetic memory element (43), which shields and focuses a magnetic field toward magnetic memory element (43).

    摘要翻译: 提供了一种具有磁存储器元件和用于控制磁存储元件的电路的改进和新颖的MRAM器件。 电路,例如具有栅极(17a),漏极(18)和源极(16a)的晶体管(12a)集成在衬底(11)上并且耦合到电路上的磁存储元件(43),通过 插头导体(19a)和导线(45)。 首先在CMOS工艺之下制造电路,然后制造磁存储元件(43,44)。 数字线(29)和位线(48)分别放置在磁存储元件(43)的下面和顶部,并且能够访问磁存储元件(43)。 这些线被除了面向磁性存储元件(43)的高磁导率层(31,56,58)包围,磁性层屏蔽并将磁场聚焦到磁性存储元件(43)。

    Magnetic random access memory and fabricating method thereof
    9.
    发明授权
    Magnetic random access memory and fabricating method thereof 有权
    磁性随机存取存储器及其制造方法

    公开(公告)号:US06174737B1

    公开(公告)日:2001-01-16

    申请号:US09339460

    申请日:1999-06-24

    IPC分类号: H01L2100

    摘要: An improved and novel MRAM device with magnetic memory elements and circuitry for controlling magnetic memory elements is provided. The circuitry, for example, transistor (12a) having a gate (17a), a drain (18) and a source (16a) is integrated on a substrate (11) and coupled to a magnetic memory element (43) on the circuitry through a plug conductor (19a) and a conductor line (45). The circuitry is fabricated first under the CMOS process and then magnetic memory elements (43, 44). Digit line (29) and bit line (48) are placed under and on top of magnetic memory element (43), respectively, and enabled to access magnetic memory element (43). These lines are enclosed by a high permeability layer (31, 56, 58) excluding a surface facing magnetic memory element (43), which shields and focuses a magnetic field toward magnetic memory element (43).

    摘要翻译: 提供了一种具有磁存储器元件和用于控制磁存储元件的电路的改进和新颖的MRAM器件。 电路,例如具有栅极(17a),漏极(18)和源极(16a)的晶体管(12a)集成在衬底(11)上并且耦合到电路上的磁存储元件(43),通过 插头导体(19a)和导线(45)。 首先在CMOS工艺之下制造电路,然后制造磁存储元件(43,44)。 数字线(29)和位线(48)分别放置在磁存储元件(43)的下面和顶部,并且能够访问磁存储元件(43)。 这些线被除了面向磁性存储元件(43)的高磁导率层(31,56,58)包围,磁性层屏蔽并将磁场聚焦到磁性存储元件(43)。

    High density MRAM cell array
    10.
    发明授权
    High density MRAM cell array 失效
    高密度MRAM单元阵列

    公开(公告)号:US06365419B1

    公开(公告)日:2002-04-02

    申请号:US09649114

    申请日:2000-08-28

    IPC分类号: H01L2100

    摘要: A method of fabricating an MRAM cell includes providing an isolation transistor on a semiconductor substrate and forming an interconnect stack on the substrate in communication with one terminal of the transistor. A via is formed on the upper end of the stack so as to extend from a position below the digit line to a position above the digit line. The via also extends above the upper surface of a dielectric layer to provide an alignment key. A MTJ memory cell is positioned on the upper surface in contact with the via, and the ends of a free layer of magnetic material are spaced from the ends of a pinned edge of magnetic material by using sidewall spacers and selective etching.

    摘要翻译: 制造MRAM单元的方法包括在半导体衬底上提供隔离晶体管,并在衬底上形成与晶体管的一个端子连通的互连叠层。 通孔形成在堆叠的上端,以从数字线下方的位置延伸到数字线上方的位置。 通孔也延伸到电介质层的上表面之上,以提供对准键。 MTJ存储单元位于与通孔接触的上表面上,并且通过使用侧壁间隔件和选择性蚀刻,磁性材料的自由层的端部与磁性材料的被钉扎边缘的端部间隔开。