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公开(公告)号:US11972923B2
公开(公告)日:2024-04-30
申请号:US17566904
申请日:2021-12-31
申请人: FEI Company
IPC分类号: H01J37/305 , H01J37/20 , H01J37/244 , H01J37/28
CPC分类号: H01J37/3056 , H01J37/20 , H01J37/244 , H01J37/28 , H01J2237/2007 , H01J2237/208 , H01J2237/31745 , H01J2237/31749
摘要: Methods and systems for creating attachments between a sample manipulator and a sample within a charged particle systems are disclosed herein. Methods include translating a sample manipulator so that it is proximate to a sample, and milling portions of the sample manipulator such that portions are removed. The portion of the sample manipulator proximate to the sample is composed of a high sputter yield material, and the high sputter yield material may be the material milled with the charged particle beam such that it is removed from the sample manipulator. According to the present disclosure, the portions of the sample manipulator are milled such that at least some of the removed high sputter yield material redeposits to form an attachment between the sample manipulator and the sample.