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1.发明授权公开(公告)号：US11947221B2
公开(公告)日：2024-04-02
申请号：US18067017
申请日：2022-12-16
申请人： FUJIFILM CORPORATION
发明人： Hiroki Takahashi
IPC分类号： G02F1/13363 , G02F1/1337 , G03B21/00
CPC分类号： G02F1/133632 , G02F1/133634 , G02F1/133734 , G03B21/006 , G02F2413/01 , G02F2413/12
摘要： The phase difference compensation element that is used in combination with a liquid crystal cell provided with a liquid crystal layer in which an optical axis of liquid crystal molecules is inclined and that compensates for a phase difference of light generated in the liquid crystal layer, the phase difference compensation element includes a substrate and a phase difference film having at least one oblique vapor deposition layer on at least one substrate surface of the substrate, and the phase difference compensation element is disposed in an aspect in which an intersecting angle between a slow-axis direction of the phase difference film and a fast-axis direction of the liquid crystal layer, which is a direction perpendicular to a direction in which the inclined optical axis of the liquid crystal molecules is projected onto the substrate surface, is −25° to +25°.
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公开(公告)号：US11703614B2
公开(公告)日：2023-07-18
申请号：US16591447
申请日：2019-10-02
申请人： FUJIFILM Corporation
发明人： Hiroki Takahashi
摘要： An antireflection film 3 provided on an optical substrate 2 of an optical member 1 has a reflectivity adjusting film 4 including a first layer 10, a second layer 11 having a refractive index higher than a refractive index of the first layer 10, a third layer 12 having a refractive index lower than a refractive index of the second layer 11, and a photocatalyst film 5 including one or more photocatalytically active layers 14 containing titanium dioxide, in which a thickness of the reflectivity adjusting film measured from a surface 4a is equal to or greater than 20 nm and less than 150 nm, the photocatalyst film 5 is provided between the reflectivity adjusting film 4 and the optical substrate 2, an interface 5a between the photocatalyst film 5 and the reflectivity adjusting film is disposed at position spaced apart from the surface 4a by a distance equal to or shorter than 150 nm, and a total thickness of the photocatalytically active layers 14 is equal to or greater than 350 nm and equal to or smaller than 1,000 nm.
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公开(公告)号：US10209408B2
公开(公告)日：2019-02-19
申请号：US15244299
申请日：2016-08-23
申请人： FUJIFILM Corporation
发明人： Hiroki Takahashi , Mototaka Kanaya
摘要： The invention provides an optical component, an infrared camera including the optical component, and a method for manufacturing the optical component. Antireflection materials 3A are formed on a chalcogenide glass 2 of which a compositional ratio of germanium and selenium is 60 percent or greater. With respect to the antireflection materials 3A, an extinction coefficient to light of 10.5 μm is 0.01 or less, and a refractive index to light having a wavelength of 10.5 μm are greater than 1 and 2.6 or less. The antireflection materials 3A are formed on a surface of a chalcogenide glass 2 at an interval of 0.5 μm to 2.0 μm, so as to form an antireflection film 3. Adhesiveness of the antireflection film 3 is higher than that In a case where the surface of the chalcogenide glass 2 is evenly coated with the antireflection materials 3A.
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公开(公告)号：US11899315B2
公开(公告)日：2024-02-13
申请号：US18145816
申请日：2022-12-22
申请人： FUJIFILM CORPORATION
发明人： Hiroki Takahashi
IPC分类号： G02F1/13363
CPC分类号： G02F1/133634 , G02F1/133632
摘要： Provided is a phase difference plate including a substrate and a phase difference film which is an oblique film, in which, in a case where three principal refractive indices in a biaxial refractive index ellipsoid exhibiting the refractivity anisotropy are defined as nx, ny, and nz, Conditional Expression (1) is satisfied, and in a case where an incidence angle in a direction inclined to the X-axis side with respect to the normal line is regarded as positive, a phase difference ratio Re(30) ratio, which is a ratio of Re(+30) of a phase difference of the incidence light with an incidence angle of +30° to Re(−30) of a phase difference of the incidence light with an incidence angle of −30°, satisfies Conditional Expression (2).
ny>nx>nz (1)
Re(30) ratio=Re(30)/Re(−30)=1.1 to 4.0 (2)-
公开(公告)号：US09651714B2
公开(公告)日：2017-05-16
申请号：US14689752
申请日：2015-04-17
申请人： FUJIFILM Corporation
发明人： Hiroki Takahashi , Mototaka Kanaya
CPC分类号： G02B1/115 , C23C14/226 , G02B1/18
摘要： An antireflection multilayer film is formed by alternately laminating high refractive index layers and low refractive index layers having indexes of refraction different from each other. The high refractive index layer is an oblique deposition layer formed by depositing an inorganic material such as tantalum pentoxide onto the surface of an optical element from a diagonal direction, and has minute internal structures composed of slant columnar structures growing along to the deposition direction. The low refractive index layer is an isotropic and dense layer.
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公开(公告)号：US10732325B2
公开(公告)日：2020-08-04
申请号：US15938081
申请日：2018-03-28
申请人： FUJIFILM Corporation
发明人： Hiroki Takahashi
摘要： A hydrophilic multilayer film is provided on a substrate, the hydrophilic multilayer film having a multilayer film layer in which at least two kinds of layers having different refractive indices are laminated in order from the substrate side such that at least one or more of each kind of layer are laminated; and a hydrophilic thin film layer provided on the surface of the multilayer film layer. The multilayer film layer has one or more photocatalyst layers, and one layer of the photocatalyst layers is provided adjacently to the hydrophilic thin film layer. The hydrophilic thin film layer has a columnar structure having gaps extending between the top surface of the hydrophilic multilayer film and the face adjacent to the photocatalyst layer, and one or more of the photocatalyst layers included in the multilayer film layer has an oblique columnar structure including gaps oblique to the thickness direction.
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公开(公告)号：US10101516B2
公开(公告)日：2018-10-16
申请号：US14663477
申请日：2015-03-20
申请人： FUJIFILM CORPORATION
发明人： Hiroki Takahashi
IPC分类号： G02B5/30 , G02B1/11 , G02B1/18 , G02F1/13363 , G02F1/1335 , G02B1/118
摘要： An optical compensation plate comprises a substrate, a phase difference compensation layer, and an antireflection layer. The substrate is for example a glass substrate. The phase difference compensation layer is formed by oblique vapor deposition of an inorganic material on a surface of the substrate, and has a microstructure where columnar structures stand with inclination in relation to the surface of the substrate. The antireflection layer is provided on the upper side of the phase difference compensation layer, and has an uneven structure equally formed on one surface.
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公开(公告)号：US09766375B2
公开(公告)日：2017-09-19
申请号：US15440992
申请日：2017-02-23
申请人： FUJIFILM Corporation
发明人： Hiroki Takahashi , Takeshi Iida
CPC分类号： G02B1/115 , C03C3/321 , C03C17/3405 , C03C17/3452 , C03C2217/734 , G02B1/111
摘要： In the antireflection film, a hydrogenated carbon film as a first layer is formed on a surface of an optical substrate. A MgF2 film as a second layer having a lower refractive index than the first layer is formed on the first layer and functions as a low refractive index layer. The hydrogenated carbon film and the MgF2 film are formed using a RF magnetron sputtering equipment. During the formation of the hydrogenated carbon film, a mixed gas of argon and hydrogen is supplied to a vacuum chamber such that some of C—C bonds in the film are replaced with C—H bonds. Some of C—C bonds are cut by hydrogenation, and strains (stress) accumulating due to C—C bonds can be relaxed. As a result, the antireflection film which has excellent adhesiveness and is not broken is obtained.
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公开(公告)号：US10520648B2
公开(公告)日：2019-12-31
申请号：US15700382
申请日：2017-09-11
申请人： FUJIFILM Corporation
发明人： Hiroki Takahashi
摘要： An antireflection film substrate that is provided on a surface of a substrate includes a surface layer having an alumina hydrate as a main component. The surface layer has an uneven structure in which a volume proportion of the alumina hydrate per unit volume decreases in a direction from the substrate side to a surface side, and a period of apexes distributed on the uneven structure on the surface side is configured to be equal to or less than a wavelength of light of which reflection is to be suppressed.
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公开(公告)号：US10228492B2
公开(公告)日：2019-03-12
申请号：US15440195
申请日：2017-02-23
申请人： FUJIFILM Corporation
IPC分类号： G02B1/118 , B32B7/02 , B32B9/00 , B32B3/30 , G02B1/115 , C23C14/06 , C23C14/08 , C23C14/34 , G02B27/00 , C03C17/34 , C23C14/00 , C23C14/58
摘要： The antireflection film is provided on a surface of a light-transmitting substrate and includes a thin multi-layer film and a fine unevenness layer that are laminated in this order from the substrate side. The thin multi-layer film includes multiple layers. The fine unevenness layer has a structure in which an uneven structure having a shorter average pitch than a wavelength of used light is provided and in which a refractive index to the used light changes continuously depending on a continuous change in a space occupation of the uneven structure in a thickness direction of the thin multi-layer film. The multiple layers include: an oxide film having a relatively high refractive index that is formed of at least two metal elements or is formed of silicon and at least one metal element; and an oxynitride film having a relatively low refractive index.
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