公开(公告)号：US20170210928A1

公开(公告)日：2017-07-27

申请号：US15463389

申请日：2017-03-20

Applicant: FUJIFILM Corporation

Inventor： Yoshihiko FUJIE ,  Yusuke SAKAI ,  Keiichi TATEISHI ,  Hiromi KOBAYASHI

IPC: C09D11/38 ,  C09D11/328 ,  C09B11/28 ,  B41J2/21

CPC classification number: C09D11/38 ,  B41J2/21 ,  C09B11/24 ,  C09B11/28 ,  C09D11/328

Abstract: Provided are a coloring composition including a xanthene compound which is soluble in water and a compound represented by the following Formula (A); an ink jet recording ink; and an ink jet recording method. In Formula (A), Q represents a benzene ring or a naphthalene ring. P1 represents —CO2M or —SO3M. Ra1 represents a substituent, and Ra2, Ra3, and Ra4 each independently represent a hydrogen atom or a substituent. na represents an integer of 0 to 3. When na is 2 or more, a plurality of Ra1's may be the same as or different from each other. M represents a counter cation.

公开(公告)号：US20170101534A1

公开(公告)日：2017-04-13

申请号：US15388575

申请日：2016-12-22

Applicant: FUJIFILM Corporation

Inventor： Yoshihiko FUJIE ,  Hiromi KOBAYASHI ,  Keiichi TATEISHI

IPC: C09B11/24 ,  D06P1/46 ,  D06P1/52 ,  C09D11/037 ,  D06P5/20 ,  D06P5/30 ,  C09D11/328 ,  D06P1/00 ,  D06P5/00

CPC classification number: C09B11/24 ,  C09B67/0034 ,  C09D11/037 ,  C09D11/328 ,  D06P1/00 ,  D06P1/46 ,  D06P1/52 ,  D06P5/00 ,  D06P5/20 ,  D06P5/30

Abstract: Provided are a coloring composition for dyeing or textile printing including a compound having the following structure, an ink for ink jet textile printing including the above-described coloring composition for dyeing or textile printing, a method of printing on fabric, and a dyed or printed fabric. As a result, the color is excellent, the color optical density is high, the fixing properties are excellent, bleeding is reduced, and light fastness is excellent.

公开(公告)号：US20160370701A1

公开(公告)日：2016-12-22

申请号：US15252987

申请日：2016-08-31

Applicant: FUJIFILM Corporation

Inventor： Hiromi KOBAYASHI ,  Haruki INABE

IPC: G03F7/039 ,  G03F7/32 ,  H01L21/027 ,  G03F7/20

CPC classification number: G03F7/039 ,  C07C69/54 ,  C08F214/18 ,  C08F220/22 ,  C08F220/26 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0392 ,  G03F7/0395 ,  G03F7/0397 ,  G03F7/2041 ,  G03F7/322 ,  H01L21/0274 ,  Y10S430/106 ,  Y10S430/114 ,  Y10S430/146

Abstract: A method for producing a resist composition includes at least a step of filtering a solution obtained by dissolving (A) a resin having a monocyclic or polycyclic cycloaliphatic hydrocarbon structure, the resin increasing its solubility in an alkali developer by an action of acid, (B) a compound generating acid upon irradiation with one of an actinic ray and a radiation, and (C) an alkali soluble compound having an alkyl group of 5 or more carbon atoms into (D) a solvent, through a filter.

Abstract translation: 抗蚀剂组合物的制造方法至少具有以下步骤：将通过使（A）具有单环或多环脂环族烃结构的树脂（A）通过酸作用增加其在碱性显影剂中的溶解性而得到的溶液 ）在通过光化射线和辐射之一照射时产生酸的化合物，和（C）通过过滤器将具有5个或更多个碳原子的烷基的碱溶性化合物引入到（D）溶剂中。

公开(公告)号：US20160187780A1

公开(公告)日：2016-06-30

申请号：US15059507

申请日：2016-03-03

Applicant: FUJIFILM Corporation

Inventor： Hiromi KOBAYASHI ,  Haruki INABE

IPC: G03F7/20 ,  G03F7/039

CPC classification number: G03F7/039 ,  C07C69/54 ,  C08F214/18 ,  C08F220/22 ,  C08F220/26 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0392 ,  G03F7/0395 ,  G03F7/0397 ,  G03F7/2041 ,  G03F7/322 ,  H01L21/0274 ,  Y10S430/106 ,  Y10S430/114 ,  Y10S430/146

Abstract: A positive type resist composition for use in liquid immersion exposure comprises: (A) a resin having a monocyclic or polycyclic cycloaliphatic hydrocarbon structure, the resin increasing its solubility in an alkali developer by an action of acid; (B) a compound generating acid upon irradiation with one of an actinic ray and a radiation; (C) an alkali soluble compound having an alkyl group of 5 or more carbon atoms; and (D) a solvent.

公开(公告)号：US20170101533A1

公开(公告)日：2017-04-13

申请号：US15384497

申请日：2016-12-20

Applicant: FUJIFILM Corporation

Inventor： Kazunari YAGI ,  Hiromi KOBAYASHI ,  Takashi IIZUMI ,  Yoshiaki NAGATA ,  Keiichi TATEISHI ,  Kazushi FURUKAWA

IPC: C09B11/12 ,  D06P1/00 ,  D06P5/00 ,  C09D11/037 ,  D06P5/30 ,  D06P1/46 ,  C09D11/328 ,  C09B11/04 ,  D06P5/20

CPC classification number: C09B11/12 ,  C09B11/04 ,  C09B11/10 ,  C09D11/037 ,  C09D11/328 ,  D06P1/00 ,  D06P1/40 ,  D06P1/46 ,  D06P5/00 ,  D06P5/20 ,  D06P5/2077 ,  D06P5/30

Abstract: Provided are a compound represented by any one of Formulae (1) to (3) (for example, the following compound), a coloring composition for dyeing or textile printing including the compound, an ink jet ink including the coloring composition for dyeing or textile printing, a method of printing on fabric, and a dyed or printed fabric, in which the color is excellent, the color optical density is high, and light fastness, water fastness, and chlorine fastness are excellent.

公开(公告)号：US20150205205A1

公开(公告)日：2015-07-23

申请号：US14449415

申请日：2014-08-01

Applicant: FUJIFILM Corporation

Inventor： Hiromi KOBAYASHI ,  Haruki INABE

IPC: G03F7/039 ,  G03F7/20

CPC classification number: G03F7/039 ,  C07C69/54 ,  C08F214/18 ,  C08F220/22 ,  C08F220/26 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0392 ,  G03F7/0395 ,  G03F7/0397 ,  G03F7/2041 ,  G03F7/322 ,  H01L21/0274 ,  Y10S430/106 ,  Y10S430/114 ,  Y10S430/146

Abstract: A positive type resist composition for use in liquid immersion exposure comprises: (A) a resin having a monocyclic or polycyclic cycloaliphatic hydrocarbon structure, the resin increasing its solubility in an alkali developer by an action of acid; (B) a compound generating acid upon irradiation with one of an actinic ray and a radiation; (C) an alkali soluble compound having an alkyl group of 5 or more carbon atoms; and (D) a solvent.

公开(公告)号：US20140366285A1

公开(公告)日：2014-12-18

申请号：US14472372

申请日：2014-08-29

Applicant: FUJIFILM CORPORATION

Inventor： Hiromi KOBAYASHI ,  Yoshiaki KONDOU ,  Yoshiharu YABUKI ,  Kazunari YAGI

IPC: D06P5/30 ,  C09B47/04 ,  D06P1/30

CPC classification number: D06P5/30 ,  C09B47/04 ,  C09B47/0675 ,  C09B47/18 ,  C09D11/328 ,  D06P1/14 ,  D06P1/30 ,  D06P3/241

Abstract: A coloring composition for textile printing including a dye represented by Formula (X) and water are provided [in Formula (X), each of X21 to X24 independently represents an oxygen atom or a sulfur atom; each of R21 to R24 represents an alkyl group, an aryl group, or a heteroaryl group; M represents a hydrogen atom, a metal element, a metal oxide, a metal hydroxide, or a metal halide; each of P1 to P4 independently represents an aromatic ring, and the aromatic ring may have a particular substituent; each of n21 to n24 independently represents from 0 to 4, and the sum of n21 to n24 is at least 1; provided that, the structure of Formula (X) contains at least two ionic hydrophilic groups].

Abstract translation: [式（X）中，[X 21〜X 24]各自独立地表示氧原子或硫原子，作为纺丝印刷用着色组合物，包括由式（X）表示的染料和水。 R21〜R24各自表示烷基，芳基或杂芳基; M表示氢原子，金属元素，金属氧化物，金属氢氧化物或金属卤化物; P1〜P4各自独立地表示芳香环，芳环可以具有特定的取代基; n21〜n24各自独立地表示0〜4，n21〜n24的和为1以上。 条件是式（X）的结构含有至少两个离子亲水基团]。

公开(公告)号：US20180327619A1

公开(公告)日：2018-11-15

申请号：US16046968

申请日：2018-07-26

Applicant: FUJIFILM Corporation

Inventor： Yoshihiko FUJIE ,  Yoshiaki NAGATA ,  Yukio TANI ,  Minako HARA ,  Keiichi TATEISHI ,  Hiromi KOBAYASHI

IPC: C09D11/328 ,  B41J11/00 ,  B41M5/00 ,  C09B69/10 ,  D06P5/30 ,  D06P3/60

CPC classification number: C09D11/328 ,  B41J2/01 ,  B41J11/002 ,  B41M5/00 ,  B41M5/0023 ,  C08F220/34 ,  C08G18/08 ,  C08G18/38 ,  C09B69/10 ,  C09B69/103 ,  D06P1/00 ,  D06P3/54 ,  D06P3/60 ,  D06P5/00 ,  D06P5/20 ,  D06P5/30

Abstract: Provided are an inkjet printing method including at least a step of directly printing an inkjet ink containing an aqueous dispersion of a dye polymer having a repeating unit containing a structure derived from a dye on a fabric by an inkjet method; an inkjet ink containing the aqueous dispersion of a dye polymer; an ink cartridge filled with the inkjet ink; and a colored fabric.

公开(公告)号：US20170255098A1

公开(公告)日：2017-09-07

申请号：US15597906

申请日：2017-05-17

Applicant: FUJIFILM Corporation

Inventor： Hiromi KOBAYASHI ,  Haruki INABE

IPC: G03F7/004 ,  G03F7/20 ,  G03F7/039 ,  G03F7/32 ,  C07C69/54 ,  H01L21/027 ,  C08L23/28

CPC classification number: G03F7/039 ,  C07C69/54 ,  C08F214/18 ,  C08F220/22 ,  C08F220/26 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0392 ,  G03F7/0395 ,  G03F7/0397 ,  G03F7/2041 ,  G03F7/322 ,  H01L21/0274 ,  Y10S430/106 ,  Y10S430/114 ,  Y10S430/146

Abstract: A resist composition contains (A) a resin having a monocyclic or polycyclic cycloaliphatic hydrocarbon structure, the resin increasing its solubility in an alkali developer by an action of acid, (B) a compound generating acid upon irradiation with one of an actinic ray and a radiation, (C) particular an alkali soluble compound, and (D) a solvent.

公开(公告)号：US20170190928A1

公开(公告)日：2017-07-06

申请号：US15464821

申请日：2017-03-21

Applicant: FUJIFILM Corporation

Inventor： Yoshihiko FUJIE ,  Yusuke SAKAI ,  Takashi SAITOU ,  Keiichi TATEISHI ,  Hiromi KOBAYASHI

IPC: C09D11/328 ,  C09B11/28 ,  B41J2/01

CPC classification number: C09D11/328 ,  B41J2/01 ,  C09B11/24 ,  C09B11/28 ,  C09B69/103 ,  C09D11/38

Abstract: Provided are a coloring composition, an ink jet recording ink, and an ink jet recording method, the coloring composition including a betaine compound and at least one xanthene compound of a compound represented by Formula (1), a compound represented by Formula (2), a compound having a repeating unit represented by Formula (3), or a compound represented by Formula (4).