公开(公告)号：US09541831B2

公开(公告)日：2017-01-10

申请号：US14638471

申请日：2015-03-04

Applicant: FUJIFILM Corporation

Inventor： Hiromi Kanda ,  Shinichi Kanna ,  Haruki Inabe

IPC: G03F7/039 ,  G03F7/20 ,  G03F7/30 ,  G03F7/004

CPC classification number: G03F7/039 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0392 ,  G03F7/0397 ,  G03F7/091 ,  G03F7/16 ,  G03F7/168 ,  G03F7/2041 ,  G03F7/30 ,  G03F7/322 ,  G03F7/38 ,  G03F7/40

Abstract: A positive resist composition comprising: (A) a resin which comes to have an enhanced solubility in an alkaline developing solution by an action of an acid; (B) a compound which generates an acid upon irradiation with actinic rays or a radiation; (C) a fluorine-containing compound containing at least one group selected from the groups (x) to (z); and (F) a solvent, and a method of pattern formation with the composition: (x) an alkali-soluble group; (y) a group which decomposes by an action of an alkaline developing solution to enhance a solubility in an alkaline developing solution; and (z) a group which decomposes by an action of an acid.

Abstract translation: 一种正型抗蚀剂组合物，其包含：（A）通过酸的作用在碱性显影液中具有增强的溶解度的树脂; （B）在用光化射线或辐射照射时产生酸的化合物; （C）含有选自（x）〜（z）中的至少一种基团的含氟化合物; 和（F）溶剂，以及组合物的图案形成方法：（x）碱溶性基团; （y）通过碱性显影液的作用分解以提高在碱性显影液中的溶解度的基团; 和（z）通过酸的作用分解的基团。

公开(公告)号：US09709891B2

公开(公告)日：2017-07-18

申请号：US14633729

申请日：2015-02-27

Applicant: FUJIFILM Corporation

Inventor： Hiromi Kanda ,  Shinichi Kanna

IPC: G03F7/039 ,  G03F7/004 ,  G03F7/075 ,  G03F7/20 ,  G03F7/30 ,  G03F7/32 ,  C07C69/653

CPC classification number: G03F7/0397 ,  C07C69/653 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/039 ,  G03F7/0392 ,  G03F7/0395 ,  G03F7/0757 ,  G03F7/0758 ,  G03F7/2041 ,  G03F7/30 ,  G03F7/322

Abstract: A positive resist composition comprises: (A) a resin of which solubility in an alkali developer increases under an action of an acid; (B) a compound capable of generating an acid upon irradiation with actinic rays or radiation; (C) a resin having at least one of a fluorine atom and a silicon atom; and (D) a solvent; and a pattern forming method using the positive resist composition.

公开(公告)号：US09081279B2

公开(公告)日：2015-07-14

申请号：US14158490

申请日：2014-01-17

Applicant: FUJIFILM Corporation

Inventor： Hiromi Kanda ,  Shinichi Kanna

IPC: G03F7/039 ,  G03F7/004 ,  G03F7/075 ,  G03F7/20 ,  G03F7/30 ,  C07C69/653

CPC classification number: G03F7/0397 ,  C07C69/653 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/039 ,  G03F7/0392 ,  G03F7/0395 ,  G03F7/0757 ,  G03F7/0758 ,  G03F7/2041 ,  G03F7/30 ,  G03F7/322

Abstract: A positive resist composition comprises: (A) a resin of which solubility in an alkali developer increases under an action of an acid; (B) a compound capable of generating an acid upon irradiation with actinic rays or radiation; (C) a resin having at least one of a fluorine atom and a silicon atom; and (D) a solvent; and a pattern forming method using the positive resist composition.

Abstract translation: 正型抗蚀剂组合物包括：（A）在酸的作用下在碱性显影剂中的溶解度增加的树脂; （B）能够在用光化射线或辐射照射时能够产生酸的化合物; （C）具有氟原子和硅原子中的至少一个的树脂; 和（D）溶剂; 以及使用正性抗蚀剂组合物的图案形成方法。