公开(公告)号：US20240053679A1

公开(公告)日：2024-02-15

申请号：US18362376

申请日：2023-07-31

Applicant: FUJIFILM Corporation

Inventor： Takamitsu TOMIGA ,  Sou KAMIMURA ,  Yoichi NISHIDA ,  Hideaki TSUBAKI

IPC: G03F7/039 ,  G03F7/004 ,  G03F7/20

CPC classification number: G03F7/039 ,  G03F7/0045 ,  G03F7/0048 ,  G03F7/2006

Abstract: An actinic ray-sensitive or radiation-sensitive resin composition including a resin (A) undergoing an increase in alkali solubility due to action of acid; a compound (C) generating acid upon irradiation with an actinic ray or radiation; and a solvent (S) including a solvent SA having a boiling point of 130° C. to 150° C. and a solvent SB having a boiling point of 155° C. to 250° C., in which a content of the solvent SA is higher than a content of the solvent SB, the content of the solvent SB relative to the whole solvent is 1% to 30% by mass, and a concentration of solid contents is 10% by mass or more.

公开(公告)号：US20140001366A1

公开(公告)日：2014-01-02

申请号：US13911140

申请日：2013-06-06

Applicant: FUJIFILM Corporation

Inventor： Yoichi NISHIDA ,  Yukinori NAKAMURA ,  Akihiro ANZAI

IPC: G01T1/20

CPC classification number: G01T1/2006 ,  C09K11/628 ,  G01T1/202 ,  G21K4/00 ,  G21K2004/04

Abstract: There is provided a radiological image detection apparatus having excellent sensitivity. A scintillator has a plurality of columnar crystals formed of thallium-activated cesium iodide, and converts X-rays into visible light and emits the visible light from the distal end of the columnar crystal. A photoelectric conversion panel generates electric charges by detecting the visible light emitted from the scintillator. The molar ratio of thallium to cesium iodide in the scintillator is in a range of 0.1 mol % to 0.55 mol %. The half width of the rocking curve of the (200) plane of the columnar crystal is equal to or less than 3°.

Abstract translation: 提供了具有优异灵敏度的放射图像检测装置。 闪烁体具有由铊激活的碘化铯形成的多个柱状晶体，并将X射线转换成可见光，并从柱状晶体的远端发射可见光。 光电转换面板通过检测从闪烁体发出的可见光来产生电荷。 闪烁体中铊与碘化铯的摩尔比为0.1摩尔％〜0.55摩尔％。 柱状晶体的（200）面的摆动曲线的半个宽度等于或小于3°。

公开(公告)号：US20210055653A1

公开(公告)日：2021-02-25

申请号：US16807496

申请日：2020-03-03

Applicant: FUJIFILM Corporation

Inventor： Tsutomu YOSHIMURA ,  Yasunori YONEKUTA ,  Naoya HATAKEYAMA ,  Kohei HIGASHI ,  Yoichi NISHIDA

IPC: G03F7/039 ,  G03F7/004 ,  G03F7/038 ,  C08F212/14 ,  C08F220/18 ,  C08F212/08

Abstract: Provided are an actinic ray-sensitive or radiation-sensitive resin composition containing a resin (A), in which the resin (A) includes a repeating unit having an acidic group and a repeating unit having an acid-decomposable group, a content of the repeating unit having an acidic group is 15% by mole or more with respect to all the repeating units in the resin (A), a content of the repeating unit having an acid-decomposable group is more than 20% by mole with respect to all the repeating units in the resin (A), a glass transition temperature of the resin (A) is 145° C. or lower, and the actinic ray-sensitive or radiation-sensitive resin composition is used for formation of a film having a film thickness of 2 μm or more; and a resist film, a pattern forming method, and a method for manufacturing an electronic device, each using the actinic ray-sensitive or radiation-sensitive resin composition.

公开(公告)号：US20200019058A1

公开(公告)日：2020-01-16

申请号：US16579014

申请日：2019-09-23

Applicant: FUJIFILM Corporation

Inventor： Naoya HATAKEYAMA ,  Yasunori YONEKUTA ,  Tsutomu YOSHIMURA ,  Kohei HIGASHI ,  Yoichi NISHIDA

IPC: G03F7/039 ,  G03F7/038 ,  G03F7/004 ,  C08F212/14 ,  C08F220/68 ,  C08F212/32

Abstract: An actinic ray-sensitive or radiation-sensitive resin composition includes: a resin, in which the actinic ray-sensitive or radiation-sensitive resin composition has a concentration of a solid content of 10% by mass or more, and in which the resin includes: a repeating unit A which is a repeating unit derived from a monomer allowing a homopolymer formed therefrom to have a glass transition temperature of 50° C. or lower, and a repeating unit B which is a repeating unit having an acid-decomposable group, a content of the repeating unit B is 20% by mole or less with respect to all the repeating units in the resin, and at least one of the repeating unit contained in the resin is a repeating unit having an aromatic ring.

公开(公告)号：US20230194983A1

公开(公告)日：2023-06-22

申请号：US18109399

申请日：2023-02-14

Applicant: FUJIFILM Corporation

Inventor： Tsutomu YOSHIMURA ,  Yasunori YONEKUTA ,  Naoya HATAKEYAMA ,  Kohei HIGASHI ,  Yoichi NISHIDA

IPC: G03F7/039 ,  C08F220/18 ,  C08F212/14 ,  C08F212/08 ,  G03F7/004 ,  G03F7/038 ,  C07C381/12

CPC classification number: G03F7/039 ,  C07C381/12 ,  C08F212/08 ,  C08F212/24 ,  C08F212/30 ,  C08F220/1804 ,  C08F220/1809 ,  G03F7/038 ,  G03F7/0045

Abstract: Provided are an actinic ray-sensitive or radiation-sensitive resin composition containing a resin (A),

in which the resin (A) includes a repeating unit having an acidic group and a repeating unit having an acid-decomposable group,
a content of the repeating unit having an acidic group is 15% by mole or more with respect to all the repeating units in the resin (A),
a content of the repeating unit having an acid-decomposable group is more than 20% by mole with respect to all the repeating units in the resin (A),
a glass transition temperature of the resin (A) is 145° C. or lower, and
the actinic ray-sensitive or radiation-sensitive resin composition is used for formation of a film having a film thickness of 2 µm or more; and a resist film, a pattern forming method, and a method for manufacturing an electronic device, each using the actinic ray-sensitive or radiation-sensitive resin composition.