公开(公告)号：US20220137512A1

公开(公告)日：2022-05-05

申请号：US17578473

申请日：2022-01-19

Applicant: FUJIFILM Corporation

Inventor： Naoya HATAKEYAMA ,  Yasunori YONEKUTA ,  Takamitsu TOMIGA ,  Kohei HIGASHI ,  Fumihiro YOSHINO

IPC: G03F7/039 ,  G03F7/20 ,  G03F7/038 ,  G03F7/32 ,  G03F7/16 ,  G03F7/004 ,  G03F7/38 ,  G03F7/40

Abstract: The present invention provides an actinic ray-sensitive or radiation-sensitive resin composition containing (A) a resin having a polarity that increases by an action of an acid, (B) a photoacid generator, and an anion (P) which is one or more anions selected from the group consisting of NO3−, SO42−, Cl−, and Br−, in which a content of the anion (P) is from 0.01 ppb to 100 ppm with respect to a total mass of the actinic ray-sensitive or radiation-sensitive resin composition, an actinic ray-sensitive or radiation-sensitive film formed from the actinic ray-sensitive or radiation-sensitive resin composition, a pattern forming method, and a method for manufacturing an electronic device.

公开(公告)号：US20180292751A1

公开(公告)日：2018-10-11

申请号：US16007421

申请日：2018-06-13

Applicant: FUJIFILM Corporation

Inventor： Daisuke ASAKAWA ,  Akiyoshi GOTO ,  Yasunori YONEKUTA ,  Naoya HATAKEYAMA ,  Michihiro SHIRAKAWA ,  Keiyu OU

IPC: G03F7/038 ,  G03F7/16 ,  G03F7/20 ,  G03F7/38 ,  G03F7/32 ,  C08F220/16 ,  C08F220/28 ,  C08F220/36 ,  C08F220/38 ,  C08F220/34 ,  C08F230/08 ,  G03F7/039

Abstract: The present invention has an object to provide an actinic ray-sensitive or radiation-sensitive resin composition having excellent collapse performance, an actinic ray-sensitive or radiation-sensitive film formed using the composition, a pattern forming method using the composition, and a method for manufacturing an electronic device, including the pattern forming method. The actinic ray-sensitive or radiation-sensitive resin composition of the present invention is an actinic ray-sensitive or radiation-sensitive resin composition containing a resin whose solubility with respect to a developer changes by the action of an acid, in which the resin includes a repeating unit derived from a monomer having at least one of a lactone structure or an amide structure, and the dissolution parameter of the monomer is 24.0 or more.

公开(公告)号：US20140356760A1

公开(公告)日：2014-12-04

申请号：US14463291

申请日：2014-08-19

Applicant: FUJIFILM Corporation

Inventor： Jun TANABE ,  Naoya HATAKEYAMA ,  Michio ONO

IPC: C01B21/082 ,  H01M4/96 ,  B01J27/24

CPC classification number: C01B21/082 ,  B01J27/24 ,  C01B21/0828 ,  C01P2006/12 ,  H01M4/9041 ,  H01M4/96 ,  H01M2008/1095

Abstract: A problem to be solved by the invention is to provide a production method of a nitrogen-containing carbon alloy that has sufficiently high redox activity or has a large number of reaction electrons of redox reaction. A method for producing a nitrogen-containing carbon alloy comprising baking a precursor containing a nitrogen-containing organic compound and an inorganic metal salt containing one or more kinds of Fe, Co, Ni, Mn and Cr, wherein: the precursor satisfies one of the requirements (a) and (b) below, and, the nitrogen-containing organic compound is one of a compound represented by the formula (1) below, a tautomer of the compound, and a salt and hydrate thereof: (a) the precursor contains the inorganic metal salt in an amount exceeding 45% by mass based on the total amount of the nitrogen-containing organic compound and the inorganic metal salt of the precursor, in which the total amount includes the mass of hydrated water in the nitrogen-containing organic compound and the inorganic metal salt, and the amount of the inorganic metal salt includes the mass of hydrated water in the inorganic metal, (b) the precursor further contains a β-diketone metal complex:

Abstract translation: 本发明要解决的问题是提供具有足够高的氧化还原活性或具有大量氧化还原反应的反应电子的含氮碳合金的制造方法。 一种含氮碳合金的制造方法，其特征在于，包括焙烧含有有机化合物的前体和含有Fe，Co，Ni，Mn和Cr中的一种或多种的无机金属盐，其中：前体满足 （a）和（b）的要求，含氮有机化合物是下式（1）表示的化合物，化合物的互变异构体及其盐和水合物之一：（a）前体 含有相对于含氮有机化合物和前体的无机金属盐的总量超过45质量％的无机金属盐，其总量包括含氮有机化合物和无机金属盐中的水合水的质量 有机化合物和无机金属盐，并且无机金属盐的量包括无机金属中的水合水的量，（b）前体还含有二 - 二酮金属络合物：

公开(公告)号：US20240004293A1

公开(公告)日：2024-01-04

申请号：US18468245

申请日：2023-09-15

Applicant: FUJIFILM Corporation

Inventor： Naoya HATAKEYAMA ,  Akiyoshi GOTO ,  Hideyuki ISHIHARA ,  Michihiro SHIRAKAWA ,  Yosuke BEKKI

IPC: G03F7/039 ,  G03F7/004 ,  G03F7/038 ,  C08F220/18 ,  C08F220/38 ,  C08F220/28 ,  C08F220/36 ,  C08F212/14

CPC classification number: G03F7/039 ,  C08F220/282 ,  G03F7/038 ,  C08F220/1809 ,  C08F220/382 ,  C08F220/281 ,  C08F220/1808 ,  C08F220/283 ,  C08F220/365 ,  C08F220/1807 ,  C08F220/1806 ,  C08F220/1811 ,  C08F212/22 ,  C08F220/1818 ,  G03F7/0045

Abstract: An actinic ray-sensitive or radiation-sensitive resin composition including: (A) a resin which is decomposed by action of acid to increase polarity; and (B) a compound which generates an acid by irradiation with an actinic ray or a radiation, in which the resin (A) and the acid generated from the compound (B) form a bond by the actinic ray or the radiation or by the action of acid.

公开(公告)号：US20230400769A1

公开(公告)日：2023-12-14

申请号：US18457908

申请日：2023-08-29

Applicant: FUJIFILM Corporation

Inventor： Naoya HATAKEYAMA ,  Hideyuki ISHIHARA ,  Akiyoshi GOTO ,  Michihiro SHIRAKAWA

IPC: G03F7/039

CPC classification number: G03F7/039

Abstract: An actinic ray-sensitive or radiation-sensitive resin composition containing, (A) a resin which is decomposed by action of acid to increase polarity; and an ionic compound, in which the ionic compound contains (B) an ionic compound which generates an acid by irradiation with an actinic ray or a radiation and (C) an ionic compound which is decomposed by irradiation with an actinic ray or a radiation to reduce acid-trapping property, or contains (D) an ionic compound which generates an acid by irradiation with an actinic ray or a radiation and is decomposed by irradiation with an actinic ray or a radiation to reduce acid-trapping property, and the resin (A) has a repeating unit represented by the Formula (1).

公开(公告)号：US20190157720A1

公开(公告)日：2019-05-23

申请号：US16251089

申请日：2019-01-18

Applicant: FUJIFILM Corporation

Inventor： Shohei KATAOKA ,  Naoya HATAKEYAMA

IPC: H01M10/0568 ,  H01M10/0569 ,  H01M10/0567

Abstract: Provided is an electrolytic solution for a non-aqueous secondary battery containing an electrolyte, an organic solvent, and a compound represented by any of General Formulae (I) to (III) and a non-aqueous secondary battery in which the electrolytic solution for a non-aqueous secondary battery is used. In the formulae, M represents a transition metal. R1, R2, and R3 represent a specific substituent. a represents an integer of 0 to 5. b represents an integer of 0 or more. c represents an integer of 0 to 5. Ar1 represents an aromatic ring. In General Formula (II), a plurality of Ar1's may be linked together. Ar2 represents a nitrogen-containing aromatic hetero ring.

公开(公告)号：US20170322490A1

公开(公告)日：2017-11-09

申请号：US15657295

申请日：2017-07-24

Applicant: FUJIFILM Corporation

Inventor： Naoya HATAKEYAMA ,  Akiyoshi GOTO ,  Michihiro SHIRAKAWA ,  Keita KATO ,  Keiyu OU

IPC: G03F7/075 ,  G03F7/004 ,  G03F7/32 ,  G03F7/20 ,  G03F7/38 ,  G03F7/16

CPC classification number: G03F7/0758 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0397 ,  G03F7/162 ,  G03F7/168 ,  G03F7/2006 ,  G03F7/2041 ,  G03F7/322 ,  G03F7/325 ,  G03F7/38

Abstract: A method for producing an electronic device includes the pattern forming method, and an actinic ray-sensitive or radiation-sensitive resin composition for organic solvent development. Specifically, provided is a pattern forming method, including a film forming step of forming a film by an actinic ray-sensitive or radiation-sensitive resin composition, an exposure step of irradiating the film, and a development step of developing the film using a developer containing an organic solvent, in which the composition contains a resin containing a repeating unit having an Si atom and a repeating unit having an acid-decomposable group and a compound capable of generating an acid upon irradiation with actinic rays or radiation, the content of Si atoms in the resin is 1.0 to 30 mass %, and the content of the resin in the total solid content of the composition is 20 mass % or more.

公开(公告)号：US20150376218A1

公开(公告)日：2015-12-31

申请号：US14845650

申请日：2015-09-04

Applicant: FUJIFILM Corporation

Inventor： Jun TANABE ,  Naoya HATAKEYAMA ,  Michio ONO

IPC: C07F15/02 ,  H01M4/90 ,  C07F15/06

CPC classification number: C07F15/025 ,  C01B21/0828 ,  C01P2006/12 ,  C07F15/065 ,  H01M4/90 ,  H01M4/9008 ,  H01M8/10 ,  H01M2008/1095

Abstract: Provided is a method for manufacturing a nitrogen-containing carbon alloy having a sufficiently high oxygen reduction reaction activity, a nitrogen-containing carbon alloy, and a fuel cell catalyst. The method for manufacturing a nitrogen-containing carbon alloy comprises sintering a precursor which contains a nitrogen-containing compound and an inorganic metal salt, the nitrogen-containing compound having at least one heteroaromatic ring and a conjugated heterocycle, and the conjugated heterocycle having 12 or larger number of ring-forming atoms.

Abstract translation: 提供了具有足够高的氧还原反应活性的含氮碳合金的制造方法，含氮碳合金和燃料电池催化剂。 制造含氮碳合金的方法包括烧结含有含氮化合物和无机金属盐的前体，含有至少一个杂芳环和共轭杂环的含氮化合物和共轭杂环具有12或 更大数量的成环原子。

公开(公告)号：US20210055653A1

公开(公告)日：2021-02-25

申请号：US16807496

申请日：2020-03-03

Applicant: FUJIFILM Corporation

Inventor： Tsutomu YOSHIMURA ,  Yasunori YONEKUTA ,  Naoya HATAKEYAMA ,  Kohei HIGASHI ,  Yoichi NISHIDA

IPC: G03F7/039 ,  G03F7/004 ,  G03F7/038 ,  C08F212/14 ,  C08F220/18 ,  C08F212/08

Abstract: Provided are an actinic ray-sensitive or radiation-sensitive resin composition containing a resin (A), in which the resin (A) includes a repeating unit having an acidic group and a repeating unit having an acid-decomposable group, a content of the repeating unit having an acidic group is 15% by mole or more with respect to all the repeating units in the resin (A), a content of the repeating unit having an acid-decomposable group is more than 20% by mole with respect to all the repeating units in the resin (A), a glass transition temperature of the resin (A) is 145° C. or lower, and the actinic ray-sensitive or radiation-sensitive resin composition is used for formation of a film having a film thickness of 2 μm or more; and a resist film, a pattern forming method, and a method for manufacturing an electronic device, each using the actinic ray-sensitive or radiation-sensitive resin composition.

公开(公告)号：US20200019058A1

公开(公告)日：2020-01-16

申请号：US16579014

申请日：2019-09-23

Applicant: FUJIFILM Corporation

Inventor： Naoya HATAKEYAMA ,  Yasunori YONEKUTA ,  Tsutomu YOSHIMURA ,  Kohei HIGASHI ,  Yoichi NISHIDA

IPC: G03F7/039 ,  G03F7/038 ,  G03F7/004 ,  C08F212/14 ,  C08F220/68 ,  C08F212/32

Abstract: An actinic ray-sensitive or radiation-sensitive resin composition includes: a resin, in which the actinic ray-sensitive or radiation-sensitive resin composition has a concentration of a solid content of 10% by mass or more, and in which the resin includes: a repeating unit A which is a repeating unit derived from a monomer allowing a homopolymer formed therefrom to have a glass transition temperature of 50° C. or lower, and a repeating unit B which is a repeating unit having an acid-decomposable group, a content of the repeating unit B is 20% by mole or less with respect to all the repeating units in the resin, and at least one of the repeating unit contained in the resin is a repeating unit having an aromatic ring.