公开(公告)号：US20200088561A1

公开(公告)日：2020-03-19

申请号：US16471768

申请日：2017-12-22

Applicant: FUJIKIN INCORPORATED

Inventor： Atsushi HIDAKA ,  Takatoshi NAKATANI ,  Satoru YAMASHITA ,  Katsuyuki SUGITA ,  Kaoru HIRATA ,  Masaaki NAGASE ,  Kouji NISHINO ,  Nobukazu IKEDA

IPC: G01F23/22 ,  B01J4/02 ,  C23C16/448 ,  H01L21/67 ,  G05D9/12

Abstract: The liquid level meter according to the present invention includes a resistive temperature detector, a temperature measuring body located above it, a temperature detecting unit detecting temperatures of the resistive temperature detector and the temperature measuring body, a current controlling unit determining a current value to be flowed through the resistive temperature detector so that the resistive temperature detector and the temperature measuring body become a predetermined temperature difference, a power supply unit supplying the current of the determined current value to the resistive temperature detector, and a liquid level detecting unit detecting a position of a liquid level. The liquid level detecting unit detects the change in the relative position of the liquid level relative to the resistive temperature detector by determining whether a change width of the current value flowing through the resistive temperature detector during a predetermined period of time is positive or negative, and whether the change width is not less than a predetermined value. As a result, the position of the liquid level can be accurately detected without being affected by the variation in the characteristics of the resistive temperature detector.

公开(公告)号：US20210310844A1

公开(公告)日：2021-10-07

申请号：US17264173

申请日：2019-07-16

Applicant: FUJIKIN INCORPORATED

Inventor： Masaaki NAGASE ,  Satoru YAMASHITA ,  Masayoshi KAWASHIMA ,  Masahiko TAKIMOTO ,  Kouji NISHINO ,  Nobukazu IKEDA

IPC: G01F1/88

Abstract: A control unit 3 of a flow rate control system 1 comprises: a recording unit 31 for recording measured values of a pressure sensor P and a temperature sensor T, a storage unit 32 for storing volume data between a first valve V1 and a second valve V2 corresponding to the measured value of the pressure sensor P, and an arithmetic unit 33 for calculating a flow rate based on a first pressure value P1 and a first temperature value T1 measured after opening the first valve V1 and the second valve V2 to flow a gas and then closing the first valve V1 and the second valve V2 simultaneously in a state where the gas is flowing; a second pressure value P2 and a second temperature value T2 measured after opening the first valve V1 and the second valve V2 to flow a gas, closing the second valve V2 in a state where the gas is flowing, and then closing the first valve V1 after a predetermined time Δt has elapsed; and a volume value V between the first valve V1 and the second valve V2 which corresponds to the second pressure value P2.

公开(公告)号：US20200159257A1

公开(公告)日：2020-05-21

申请号：US16634603

申请日：2018-07-24

Applicant: FUJIKIN INCORPORATED

Inventor： Satoru YAMASHITA ,  Yohei SAWADA ,  Masaaki NAGASE ,  Kouji NISHINO ,  Nobukazu IKEDA

IPC: G05D7/06

Abstract: A fluid control system (1) comprises: a first valve (21) provided downstream of a flow rate controller (10), a flow rate measuring device (30) provided downstream of the first valve (21) and having a second valve (22), an open/close detector (26) provided to the second valve (22), and a controller (25) for controlling an open/close operation of the first valve (21) and the second valve (22), and the controller (25) controls the open/close operation of the first valve (21) in response to a signal output from the open/close detector (26).

公开(公告)号：US20180071702A1

公开(公告)日：2018-03-15

申请号：US15565696

申请日：2016-04-11

Applicant: FUJIKIN INCORPORATED

Inventor： Atsushi HIDAKA ,  Masaaki NAGASE ,  Kaoru HIRATA ,  Katsuyuki SUGITA ,  Takatoshi NAKATANI ,  Satoru YAMASHITA ,  Kouji NISHINO ,  Nobukazu IKEDA ,  Keiji HIRAO

IPC: B01J4/00 ,  B01J7/02 ,  C23C16/448 ,  H01L21/3213 ,  H01L21/67

CPC classification number: B01J4/008 ,  B01J7/02 ,  C23C16/448 ,  C23C16/4485 ,  C23C16/52 ,  H01L21/205 ,  H01L21/31 ,  H01L21/32135 ,  H01L21/6708

Abstract: A vaporization supply apparatus comprises a vaporizer which heats and vaporize a liquid, a flow-rate control device which controls a flow rate of a gas sent out from the vaporizer, a first control valve interposed in a supply channel of a liquid to the vaporizer, a pressure detector for detecting a pressure of a gas vaporized by the vaporizer, a liquid detection part for measuring parameters of a liquid in an amount higher than a predetermined amount in the vaporizer, and a control device which controls the first control valve to supply a predetermined amount of a liquid to the vaporizer based on the pressure value detected by the pressure detector, and to close the first control valve when the liquid detection part detect a liquid in an amount higher than the predetermined amount.