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    Vapor deposition apparatus for continuous deposition of multiple thin film layers on a substrate
    1.
    发明授权
    Vapor deposition apparatus for continuous deposition of multiple thin film layers on a substrate 有权
    用于在基板上连续沉积多个薄膜层的蒸镀装置

    公开(公告)号：US09093599B2

    公开(公告)日：2015-07-28

    申请号：US13951783

    申请日：2013-07-26

    Applicant: First Solar, Inc.

    Inventor： Mark Jeffrey Pavol

    IPC: H01L31/18 ,  H01L21/02

    CPC classification number: H01L31/1828 ,  C23C14/0629 ,  C23C14/24 ,  C23C14/566 ,  C23C14/5806 ,  H01L21/02551 ,  H01L21/67109 ,  H01L21/67173 ,  H01L21/6776 ,  H01L31/1876 ,  Y02E10/543 ,  Y02P70/521

    Abstract: Vapor deposition apparatus for forming stacked thin films on discrete photovoltaic module substrates conveyed in a continuous non-stop manner through the apparatus are provided. The apparatus includes a first sublimation compartment positioned over a first deposition area of said apparatus, a second sublimation compartment positioned over a second deposition area of said apparatus, and an internal divider positioned therebetween and defining a middle seal member. An actuator is attached to the internal divider and is configured to move the internal divider to control intermixing of first source material vapors and second source material vapors within the first deposition area and the second deposition area. Methods are also generally provided for depositing stacked thin films on a substrate.

    Abstract translation: 提供了在连续不间断地通过设备输送的离散光伏模块基板上形成堆叠薄膜的蒸镀装置。 该装置包括位于所述装置的第一沉积区域上方的第一升华室，位于所述装置的第二沉积区域上的第二升华室和位于其间并限定中间密封构件的内部分隔件。 致动器附接到内部分配器并且构造成移动内部分隔器以控制第一源材料蒸气和第二源材料蒸气在第一沉积区域和第二沉积区域内的混合。 通常还提供了用于在衬底上沉积叠层薄膜的方法。

    Process for continuous deposition of a sublimated source material to form a thin film layer on a substrate
    4.
    发明授权
    Process for continuous deposition of a sublimated source material to form a thin film layer on a substrate 有权
    用于连续沉积升华的源材料以在衬底上形成薄膜层的工艺

    公开(公告)号：US09331231B2

    公开(公告)日：2016-05-03

    申请号：US13751852

    申请日：2013-01-28

    Applicant: First Solar, Inc.

    Inventor： Max William Reed ,  Stacy Ann Black ,  Scott Daniel Feldman-Peabody ,  Mark Jeffrey Pavol

    IPC: B05D5/12 ,  H01L31/18 ,  C23C14/06 ,  C23C14/24 ,  C23C14/56

    CPC classification number: H01L31/1876 ,  C23C14/0629 ,  C23C14/24 ,  C23C14/562 ,  H01L31/1828 ,  Y02E10/543 ,  Y02P70/521

    Abstract: A method for vapor deposition of a sublimated source material, such as CdTe, onto substrates in a continuous, non-stop manner through the apparatus is provided. The sublimated source material moves through a distribution plate and deposits onto the upper surface of the substrates as they are conveyed through the deposition area. The substrates move into and out of the deposition area through entry and exit slots that are defined by transversely extending entrance and exit seals. The seals are disposed at a gap distance above the upper surface of the substrates that is less than the distance or spacing between the upper surface of the substrates and the distribution plate. The seals have a ratio of longitudinal length (in the direction of conveyance of the substrates) to gap distance of from about 10:1 to about 100:1.

    Abstract translation: 提供了通过该装置以连续，不间断的方式将升华的源材料（例如CdTe）气相沉积到基板上的方法。 升华的源材料通过分布板移动，并且当它们被输送通过沉积区域时，沉积到基板的上表面上。 基板通过由横向延伸的入口和出口密封限定的入口和出口槽进入和离开沉积区域。 密封件设置在基板的上表面之上的间隙距离处，该距离小于基板的上表面与分布板之间的距离或间隔。 密封件具有纵向长度（基板的输送方向）与间隙距离的比例为约10:1至约100:1。

    Vapor Deposition Apparatus for Continuous Deposition of Multiple Thin Film Layers on a Substrate
    5.
    发明申请
    Vapor Deposition Apparatus for Continuous Deposition of Multiple Thin Film Layers on a Substrate 有权
    用于在基板上连续沉积多个薄膜层的气相沉积装置

    公开(公告)号：US20150031164A1

    公开(公告)日：2015-01-29

    申请号：US13951783

    申请日：2013-07-26

    Applicant: First Solar, Inc.

    Inventor： Mark Jeffrey Pavol

    IPC: H01L31/18

    CPC classification number: H01L31/1828 ,  C23C14/0629 ,  C23C14/24 ,  C23C14/566 ,  C23C14/5806 ,  H01L21/02551 ,  H01L21/67109 ,  H01L21/67173 ,  H01L21/6776 ,  H01L31/1876 ,  Y02E10/543 ,  Y02P70/521

    Abstract: Vapor deposition apparatus for forming stacked thin films on discrete photovoltaic module substrates conveyed in a continuous non-stop manner through the apparatus are provided. The apparatus includes a first sublimation compartment positioned over a first deposition area of said apparatus, a second sublimation compartment positioned over a second deposition area of said apparatus, and an internal divider positioned therebetween and defining a middle seal member. An actuator is attached to the internal divider and is configured to move the internal divider to control intermixing of first source material vapors and second source material vapors within the first deposition area and the second deposition area. Methods are also generally provided for depositing stacked thin films on a substrate.

    Abstract translation: 提供了在连续不间断地通过设备输送的离散光伏模块基板上形成堆叠薄膜的蒸镀装置。 该装置包括位于所述装置的第一沉积区域上方的第一升华室，位于所述装置的第二沉积区域上的第二升华室和位于其间并限定中间密封构件的内部分隔器。 致动器附接到内部分配器并且构造成移动内部分隔器以控制第一源材料蒸气和第二源材料蒸气在第一沉积区域和第二沉积区域内的混合。 通常还提供了用于在衬底上沉积叠层薄膜的方法。

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