Photovoltaic Device Including A Back Contact And Method Of Manufacturing
    2.
    发明申请
    Photovoltaic Device Including A Back Contact And Method Of Manufacturing 有权
    包括背面接触的光伏设备和制造方法

    公开(公告)号:US20140284750A1

    公开(公告)日:2014-09-25

    申请号:US14221245

    申请日:2014-03-20

    Abstract: A photovoltaic device includes a substrate, a transparent conductive oxide, an n-type window layer, a p-type absorber layer and an electron reflector layer. The electron reflector layer may include zinc telluride doped with copper telluride, zinc telluride alloyed with copper telluride, or a bilayer of multiple layers containing zinc, copper, cadmium and tellurium in various compositions. A process for manufacturing a photovoltaic device includes forming a layer over a substrate by at least one of sputtering, evaporation deposition, CVD, chemical bath deposition process, and vapor transport deposition process. The process includes forming an electron reflector layer over a p-type absorber layer.

    Abstract translation: 光电器件包括衬底,透明导电氧化物,n型窗口层,p型吸收层和电子反射层。 电子反射层可以包括掺杂有碲化铜的碲化锌,与碲化碲合金的碲化镉,或者是各种组成中含有锌,铜,镉和碲的多层双层。 制造光伏器件的方法包括通过溅射,蒸发沉积,CVD,化学浴沉积工艺和蒸气迁移沉积工艺中的至少一种在衬底上形成层。 该方法包括在p型吸收层上形成电子反射层。

    Photovoltaic Device Including a Back Contact and Method of Manufacturing
    3.
    发明申请
    Photovoltaic Device Including a Back Contact and Method of Manufacturing 有权
    包括背面接触的光伏设备和制造方法

    公开(公告)号:US20160126397A1

    公开(公告)日:2016-05-05

    申请号:US14992304

    申请日:2016-01-11

    Abstract: A photovoltaic device includes a substrate, a transparent conductive oxide, an n-type window layer, a p-type absorber layer and an electron reflector layer. The electron reflector layer may include zinc telluride doped with copper telluride, zinc telluride alloyed with copper telluride, or a bilayer of multiple layers containing zinc, copper, cadmium and tellurium in various compositions. A process for manufacturing a photovoltaic device includes forming a layer over a substrate by at least one of sputtering, evaporation deposition, CVD, chemical bath deposition process, and vapor transport deposition process. The process includes forming an electron reflector layer over a p-type absorber layer.

    Abstract translation: 光电器件包括衬底,透明导电氧化物,n型窗口层,p型吸收层和电子反射层。 电子反射层可以包括掺杂有碲化铜的碲化锌,与碲化碲合金的碲化镉,或者是各种组成中含有锌,铜,镉和碲的多层双层。 制造光伏器件的方法包括通过溅射,蒸发沉积,CVD,化学浴沉积工艺和蒸气迁移沉积工艺中的至少一种在衬底上形成层。 该方法包括在p型吸收层上形成电子反射层。

    Photovoltaic device including a back contact and method of manufacturing
    6.
    发明授权
    Photovoltaic device including a back contact and method of manufacturing 有权
    包括背面接触和制造方法的光伏器件

    公开(公告)号:US09269849B2

    公开(公告)日:2016-02-23

    申请号:US14221245

    申请日:2014-03-20

    Abstract: A photovoltaic device includes a substrate, a transparent conductive oxide, an n-type window layer, a p-type absorber layer and an electron reflector layer. The electron reflector layer may include zinc telluride doped with copper telluride, zinc telluride alloyed with copper telluride, or a bilayer of multiple layers containing zinc, copper, cadmium and tellurium in various compositions. A process for manufacturing a photovoltaic device includes forming a layer over a substrate by at least one of sputtering, evaporation deposition, CVD, chemical bath deposition process, and vapor transport deposition process. The process includes forming an electron reflector layer over a p-type absorber layer.

    Abstract translation: 光电器件包括衬底,透明导电氧化物,n型窗口层,p型吸收层和电子反射层。 电子反射层可以包括掺杂有碲化铜的碲化锌,与碲化碲合金的碲化镉,或者是各种组成中含有锌,铜,镉和碲的多层双层。 制造光伏器件的方法包括通过溅射,蒸发沉积,CVD,化学浴沉积工艺和蒸气迁移沉积工艺中的至少一种在衬底上形成层。 该方法包括在p型吸收层上形成电子反射层。

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