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    INTEGRATED CIRCUIT SELECTIVE SCALING
    1.
    发明申请
    INTEGRATED CIRCUIT SELECTIVE SCALING 有权
    集成电路选择性缩放

    公开(公告)号：US20060085768A1

    公开(公告)日：2006-04-20

    申请号：US10711959

    申请日：2004-10-15

    申请人： Fook-Luen Heng ,  Jason Hibbeler ,  Kevin McCullen ,  Rani Narayan ,  Stephen Runyon ,  Robert Walker

    发明人： Fook-Luen Heng ,  Jason Hibbeler ,  Kevin McCullen ,  Rani Narayan ,  Stephen Runyon ,  Robert Walker

    IPC分类号： G06F17/50

    CPC分类号： G06F17/5068

    摘要： Methods, systems and program products are disclosed for selectively scaling an integrated circuit (IC) design: by layer, by unit, or by ground rule, or a combination of these. The selective scaling technique can be applied in a feedback loop with the manufacturing system with process and yield feedback, during the life of a design, to increase yield in early processes in such a way that hierarchy is preserved. The invention removes the need to involve designers in improving yield where new technologies such as maskless fabrication are implemented.

    摘要翻译： 公开了用于选择性地缩放集成电路（IC）设计的方法，系统和程序产品：按层，单元或基本规则，或这些的组合。 在设计寿命期间，选择性缩放技术可以应用于具有过程和产量反馈的制造系统的反馈回路中，以便以保持层次结构的方式增加早期过程中的产量。 本发明消除了在实现诸如无掩模制造之类的新技术的情况下使设计人员改进产量的需要。

    Design rule correction system and method
    10.
    发明授权
    Design rule correction system and method 失效
    设计规则校正系统及方法

    公开(公告)号：US06189132B1

    公开(公告)日：2001-02-13

    申请号：US09057961

    申请日：1998-04-09

    申请人： Fook-Luen Heng ,  Zhan Chen ,  Gustavo E. Tellez ,  John Cohn ,  Rani Narayan

    发明人： Fook-Luen Heng ,  Zhan Chen ,  Gustavo E. Tellez ,  John Cohn ,  Rani Narayan

    IPC分类号： G06F1750

    CPC分类号： G06F17/5081

    摘要： A method of modifying a layout of a plurality of objects in accordance with a plurality of predetermined criteria is presented. An objective function is defined for measuring a location perturbation and a separation perturbation of the objects in the layout. A linear system is defined using linear constraints in terms of design rules and the objective function to describe separations between layout objects. The linear system is solved to simultaneously remove violations of the design rules, and shapes and positions of objects in the layout are modified in accordance with the solution of the linear system such that a total perturbation of the objects in the layout is reduced. A system for implementing the present invention is also presented.

    摘要翻译： 呈现了根据多个预定标准修改多个对象的布局的方法。 定义了一个目标函数，用于测量布局中对象的位置扰动和分离扰动。 使用线性约束在设计规则和用于描述布局对象之间的分离的目标函数方面定义线性系统。 解决线性系统以同时消除违反设计规则的情况，并且根据线性系统的解决方案来修改布局中对象的形状和位置，使得布局中的对象的总扰动减小。 还提出了用于实现本发明的系统。