摘要:
Optical amplifiers and other optical network equipment is provided for use in fiber-optic communications networks. The equipment may include dynamic spectral filters and optical channel monitors. Temperature controllers may be used to control the temperatures of the dynamic spectral filters, optical channel monitors, and other components such as erbium-doped fiber coils in optical gain stages. Control units in the equipment may provide alarms based on status information and data from the dynamic spectral filters, optical channel monitors, temperature sensors, and other components.
摘要:
Provided are a wireless network adapter and a configuration method of same. A wireless network adapter comprises: a self-configuration portion, used to configure the wireless network adapter as an access point adapter, and generate access information of a wireless network access point; a cable connection portion, connected to a second wireless network adapter, and used to transmit the access information to the second wireless network adapter and receive an acknowledgment message from the second wireless network adapter; and a wireless transceiver, connected to the second wireless network adapter. Another wireless network adapter comprises: a cable connection portion, used to receive access information from an access point adapter; a parameter storage portion, used to store the access information as a setting parameter; a self-configuration portion, used to configure the wireless network adapter as a client mode and generate an acknowledgment message; and a wireless transceiver, connected to a wireless network access point. Configuration of multiple wireless network adapters connected to each other may be implemented without any input parameter and without the need of access a configuration webpage by using a computer.
摘要:
Techniques are described to configure a cache line structure based on attributes of a draw call and access direction of a texture. Attributes of textures (e.g., texture format and filter type), samplers, and shaders used by the draw call can be considered to determine the line size of a cache. Access direction can be considered to reduce the number of lines that are used to store texels required by a sample request.
摘要:
In one example, a system includes an oscillator adapted to provide an oscillator signal, a frequency divider adapted to divide the oscillator signal to provide a divided oscillator signal, and a phase-frequency detector adapted to provide phase-frequency detection signals in response to a reference clock signal and the divided oscillator signal. The system also includes a charge pump adapted to provide first output signals in response to the phase-frequency detection signals, a phase detector adapted provide second output signals in response to an incoming data signal and the oscillator signal, and one or more switches adapted to pass the first output signals during a frequency acquisition mode and pass the second output signals during a phase lock mode. The system also includes an active filter adapted to filter the passed first or second output signals. The oscillator is adapted to adjust a frequency of the oscillator signal in response to the filtered first or second output signals.
摘要:
Embodiments of the present invention provide methods for optimizing a lithographic projection apparatus including optimizing projection optics therein, and preferably including optimizing a source, a mask, and the projection optics. The projection optics is sometimes broadly referred to as “lens”, and therefore the joint optimization process may be termed source mask lens optimization (SMLO). SMLO is desirable over existing source mask optimization process (SMO), partially because including the projection optics in the optimization can lead to a larger process window by introducing a plurality of adjustable characteristics of the projection optics. The projection optics can be used to shape wavefront in the lithographic projection apparatus, enabling aberration control of the overall imaging process. According to the embodiments herein, the optimization can be accelerated by iteratively using linear fitting algorithm or using Taylor series expansion using partial derivatives of transmission cross coefficients (TCCs).
摘要:
Various techniques are provided to generate a plurality of reference clock signals using a single reference clock signal generator. In one example, a clock signal generation system includes a reference clock signal generator adapted to provide a reference clock signal. The system also includes a plurality of dividers adapted to divide the reference clock signal using different ratios to provide a plurality of communication port clock signals. The system also includes a plurality of different communication ports adapted to receive the communication port clock signals and adapted to operate in accordance with different communication protocols using the communication port clock signals.
摘要:
The present invention relates to a front turn light on rear view mirror of motorcycle, which includes a rear view mirror housing and a front turn light mounted at the front part of the rear view mirror housing The front turn light has a LED light source(s) and a condenser lens(es) which is mounted in front of the LED light source(s) The front turn light further includes a front turn light face-plate and a front turn light housing which is mounted on the front turn light face-plate to form an internal cavity between the front turn light housing and the front turn light face-plate, where the LED light source(s) is mounted in the internal cavity and the condenser lens(es) is mounted in the front turn light face-plate, the front turn light is mounted inside the rear view mirror housing.
摘要:
SOI devices for plasma display panel driver chip, include a substrate, a buried oxide layer and an n-type SOI layer in a bottom-up order, where the SOI layer is integrated with an HV-NMOS device, an HV-PMOS device, a Field-PMOS device, an LIGBT device, a CMOS device, an NPN device, a PNP device and an HV-PNP device; the SOI layer includes an n+ doped region within the SOI layer at an interface between the n-type SOI layer and the buried oxide layer; and the n+ doped region has a higher doping concentration than the n-type SOI layer.
摘要:
A three-dimensional mask model of the invention provides a more realistic approximation of the three-dimensional effects of a photolithography mask with sub-wavelength features than a thin-mask model. In one embodiment, the three-dimensional mask model includes a set of filtering kernels in the spatial domain that are configured to be convolved with thin-mask transmission functions to produce a near-field image. In another embodiment, the three-dimensional mask model includes a set of correction factors in the frequency domain that are configured to be multiplied by the Fourier transform of thin-mask transmission functions to produce a near-field image.
摘要:
The present invention relates to a method for tuning lithography systems so as to allow different lithography systems to image different patterns utilizing a known process that does not require a trial and error process to be performed to optimize the process and lithography system settings for each individual lithography system. According to some aspects, the present invention relates to a method for a generic model-based matching and tuning which works for any pattern. Thus it eliminates the requirements for CD measurements or gauge selection. According to further aspects, the invention is also versatile in that it can be combined with certain conventional techniques to deliver excellent performance for certain important patterns while achieving universal pattern coverage at the same time.