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公开(公告)号：US09949354B2
公开(公告)日：2018-04-17
申请号：US14879754
申请日：2015-10-09
Applicant: Gigaphoton Inc.
Inventor： Takashi Saito , Fumio Iwamoto , Osamu Wakabayashi , Takayuki Yabu
IPC: H05G2/00
Abstract: An extreme ultraviolet light generation apparatus includes a target supplier configured to output a target into a chamber as a droplet, the target generating extreme ultraviolet light when being irradiated with a laser beam in the chamber; a droplet measurement unit configured to measure a parameter for a state of the droplet outputted into the chamber; a pressure regulator configured to regulate a pressure in the target supplier in which the target is accommodated; and a target generation controller configured to control the pressure regulator, based on the parameter measured by the droplet measurement unit.
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2.发明授权公开(公告)号：US09538629B2
公开(公告)日：2017-01-03
申请号：US14201327
申请日：2014-03-07
Applicant: GIGAPHOTON INC.
Inventor： Takashi Saito , Naoyoshi Imachi , Osamu Wakabayashi
Abstract: A chamber for an extreme ultraviolet light generation apparatus is a chamber into which droplets are sequentially outputted, and may include an image capturing unit configured to repeatedly capture images of the droplets during an image capturing time set so that images of two adjacent droplets that have been outputted do not overlap.
Abstract translation: 用于极紫外光发生装置的室是依次输出液滴的室，并且可以包括图像捕获单元，其被配置为在设置的图像捕获时间期间反复捕获液滴的图像，使得已经存在两个相邻液滴的图像 输出不重叠。
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公开(公告)号：US09942973B2
公开(公告)日：2018-04-10
申请号：US15480400
申请日：2017-04-06
Applicant: GIGAPHOTON INC.
Inventor： Tamotsu Abe , Yoshifumi Ueno , Hirokazu Hosoda , Takashi Saito
Abstract: An extreme ultraviolet light generation apparatus may be configured to generate extreme ultraviolet light by irradiating a target with a pulse laser beam outputted from a laser apparatus to generate plasma. The extreme ultraviolet light generation apparatus may include a chamber; a target supply device configured to supply a target to a plasma generation region inside the chamber; a target sensor located between the target supply device and the plasma generation region and configured to detect the target passing through a detection region; and a shield cover disposed between the detection region and the target supply device, having a through-hole that allows the target to pass through, and configured to reduce pressure waves that reach the target supply device from the plasma generation region.
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公开(公告)号：US09883574B2
公开(公告)日：2018-01-30
申请号：US15161628
申请日：2016-05-23
Applicant: GIGAPHOTON INC.
Inventor： Fumio Iwamoto , Takashi Saito , Tsukasa Hori , Osamu Wakabayashi
CPC classification number: H05G2/006 , G03F7/70033 , H05G2/005
Abstract: An aspect of the present disclosure may include a gas lock cover secured to a nozzle holder and provided downstream of a nozzle. The gas lock cover may cover a periphery of an exit of the nozzle and be structured to guide gas supplied from a gas supply unit. The gas lock cover may include a hollow cylindrical part provided downstream of the nozzle and having an exit opening for outputting droplets that are outputted from the nozzle and pass through an internal cavity of the cylindrical part. The gas lock cover may include a channel for transmitting the gas supplied from the gas supply unit, the channel being structured to orient a flow of the transmitted gas so as to flow to the exit opening of the cylindrical part through the internal cavity of the cylindrical part.
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公开(公告)号：US11042102B2
公开(公告)日：2021-06-22
申请号：US16894652
申请日：2020-06-05
Applicant: Gigaphoton Inc.
Inventor： Shinji Nagai , Takashi Saito
Abstract: An extreme ultraviolet light generation device configured to generate extreme ultraviolet light by irradiating a target containing tin with a pulse laser beam includes a chamber container, a hydrogen gas supply unit configured to supply hydrogen gas into the chamber container, a heat shield disposed between the chamber container and a predetermined region in which the target is irradiated with the pulse laser beam inside the chamber container, a first cooling medium flow path disposed in the chamber container, a second cooling medium flow path disposed in the heat shield, and a cooling device configured to supply a first cooling medium to the first cooling medium flow path and supply a second cooling medium to the second cooling medium flow path so that a temperature of the heat shield becomes lower than a temperature of the chamber container.
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Patent Agency Ranking
6.发明授权公开(公告)号：US09661730B2
公开(公告)日：2017-05-23
申请号：US15151025
申请日：2016-05-10
Applicant: Gigaphoton Inc.
Inventor： Atsushi Ueda , Takayuki Yabu , Osamu Wakabayashi , Georg Soumagne , Takashi Saito
IPC: H05G2/00
Abstract: An extreme ultraviolet light generation apparatus may include: a chamber; a target supply unit configured to output a target toward a predetermined region inside the chamber; a first gas supply unit configured to blow out gas in a first direction toward a trajectory of the target between the target supply unit and the predetermined region; and a focusing optical system configured to concentrate a pulse laser beam to the predetermined region.
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公开(公告)号：US11211239B2
公开(公告)日：2021-12-28
申请号：US16786542
申请日：2020-02-10
Applicant: Gigaphoton Inc.
Inventor： Atsushi Ueda , Takashi Saito
Abstract: An EUV light generation apparatus includes: a chamber; an EUV light condensing mirror positioned inside the chamber and having a reflective surface that determines a first focal point and a second focal point, the reflective surface and the second focal point being positioned on respective sides of a first surface; at least one magnet configured to generate a magnetic field at and around the first focal point; a first gas supply unit configured to supply first gas to the reflective surface in the chamber and opened near an outer peripheral part of the reflective surface; a second gas supply unit configured to supply second gas into the chamber and opened at a position between the first surface and the second focal point; and a discharge device configured to discharge gas inside the chamber and opened at a position between the first focal point and the at least one magnet.
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公开(公告)号：US10455679B2
公开(公告)日：2019-10-22
申请号：US15836877
申请日：2017-12-10
Applicant: Gigaphoton Inc.
Inventor： Takashi Saito , Yoshifumi Ueno , Georg Soumagne
Abstract: The extreme ultraviolet light generation device includes a chamber having a first through-hole that allows a pulse laser beam to enter the chamber, a target supply unit held by the chamber and configured to output a target toward a predetermined region in the chamber, a shield member surrounding the predetermined region in the chamber and having a target path that allows the target outputted from the target supply unit to pass toward the predetermined region, and a tubular member surrounding at least a part of an upstream portion of the trajectory of the target outputted from the target supply unit toward the predetermined region, the upstream portion being upstream from the target path of the shield member.
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公开(公告)号：US10268119B2
公开(公告)日：2019-04-23
申请号：US15945672
申请日：2018-04-04
Applicant: GIGAPHOTON INC.
Inventor： Shinji Nagai , Atsushi Ueda , Takashi Saito
Abstract: An extreme ultraviolet light generating device may include a chamber, an EUV light focusing mirror provided therein, including a reflection surface having a concave curved shape and an outer peripheral portion around an outer edge of the reflection surface, and configured to focus EUV light radiated from plasma generated when a target is irradiated with laser light, a gas supplying device including peripheral heads provided on or along the outer peripheral portion; and a discharge device including a discharge path forming a discharge port near the outer peripheral portion, and configured to discharge an ion or a particle from the discharge port. The peripheral heads each may blow out a gas flow from the outer peripheral portion or a vicinity thereof along the reflection surface, and allow gas flows to join on the reflection surface to thereby form a gas flow along the reflection surface toward the discharge port.
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10.发明授权公开(公告)号：US10028365B2
公开(公告)日：2018-07-17
申请号：US15697954
申请日：2017-09-07
Applicant: Gigaphoton Inc.
Inventor： Takanobu Ishihara , Tsukasa Hori , Takashi Saito , Yutaka Shiraishi
Abstract: A chamber device may include a chamber, and a target generation device assembled into the chamber and configured to supply a target material into the chamber, the target generation device including a tank configured to store the target material, a temperature variable device configured to vary temperature of the target material in the tank, and a nozzle section in which a nozzle hole configured to output the target material in a liquid form is formed, and the chamber device may further include a gas nozzle having an inlet port facing the nozzle section and configured to introduce gas into the chamber, a gas supply source configured to supply gas containing hydrogen to the gas nozzle to supply the gas containing the hydrogen to at least periphery of the nozzle section, and a moisture remover configured to remove moisture at least in the periphery of the nozzle section in the chamber.
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