公开(公告)号：US09818623B2

公开(公告)日：2017-11-14

申请号：US15077480

申请日：2016-03-22

Applicant: GLOBALFOUNDRIES Inc.

Inventor： Jason Eugene Stephens ,  Guillaume Bouche ,  Byoung Youp Kim ,  Craig Michael Child, Jr.

IPC: H01L21/302 ,  H01L21/3213 ,  H01L21/32

CPC classification number: H01L21/32 ,  H01L21/0337 ,  H01L21/31144

Abstract: A method for forming a pattern for interconnection lines and associated continuity dielectric blocks in an integrated circuit includes providing a structure having a mandrel layer disposed over an etch mask layer, the etch mask layer being disposed over a pattern layer and the pattern layer being disposed over a dielectric stack. Patterning an array of mandrels in the mandrel layer. Selectively etching a beta trench entirely in a mandrel of the array, the beta trench overlaying a beta block mask portion of the pattern layer. Selectively etching a gamma trench entirely in the etch mask layer, the gamma trench overlaying a gamma block mask portion of the pattern layer. Selectively etching the structure to form a pattern in the pattern layer, the pattern including the gamma and beta block mask portions.

公开(公告)号：US09812396B1

公开(公告)日：2017-11-07

申请号：US15175495

申请日：2016-06-07

Applicant: GLOBALFOUNDRIES Inc.

Inventor： Jason Eugene Stephens ,  Guillaume Bouche ,  Shreesh Narasimha ,  Patrick Ryan Justison ,  Byoung Youp Kim ,  Craig Michael Child, Jr.

IPC: H01L21/768 ,  H01L23/528 ,  H01L23/522 ,  H01L21/311

CPC classification number: H01L23/5286 ,  H01L21/31144 ,  H01L21/76802 ,  H01L21/76807 ,  H01L21/76811 ,  H01L21/76816 ,  H01L21/7684 ,  H01L21/76883 ,  H01L23/5226 ,  H01L23/528 ,  H01L23/5283

Abstract: A method includes providing a starting interconnect structure for semiconductor device(s), the starting interconnect structure including a first metallization layer with a first power rail. The method further includes forming a second metallization layer over the first metallization layer with a second power rail, and directly electrically connecting the first power rail and the second power rail, the directly electrically connecting including forming metal-filled vias between the first power rail and the second power rail. The method further includes forming additional metallization layer(s) over the second metallization layer with additional power rail(s), and directly electrically connecting each of the additional power rail(s) to a power rail of a metallization layer directly below.

公开(公告)号：US10199265B2

公开(公告)日：2019-02-05

申请号：US15430039

申请日：2017-02-10

Applicant: GLOBALFOUNDRIES INC.

Inventor： Jiehui Shu ,  Byoung Youp Kim ,  Jinping Liu

IPC: H01L21/768 ,  H01L23/522 ,  H01L23/528 ,  H01L23/532

Abstract: The present disclosure relates to semiconductor structures and, more particularly, to variable space mandrel cut for self-aligned double patterning and methods of manufacture. The method includes: forming a plurality of mandrels on a substrate; forming spacers about the plurality of mandrels and exposed portions of the substrate; removing a portion of at least one of the plurality of mandrels to form an opening; and filling in the opening with material.

公开(公告)号：US09786545B1

公开(公告)日：2017-10-10

申请号：US15271519

申请日：2016-09-21

Applicant: GLOBALFOUNDRIES Inc.

Inventor： Guillaume Bouche ,  Jason Eugene Stephens ,  Byoung Youp Kim ,  Craig Michael Child, Jr. ,  Shreesh Narasimha

IPC: H01L21/762 ,  H01L21/311 ,  H01L21/3105 ,  H01L21/768

CPC classification number: H01L21/76224 ,  H01L21/0337 ,  H01L21/31051 ,  H01L21/31133 ,  H01L21/31144 ,  H01L21/76802 ,  H01L21/76816 ,  H01L21/76877 ,  H01L23/528 ,  H01L27/0251

Abstract: A method includes providing a structure having a first hardmask layer, interposer layer, second hardmask layer and mandrel layer disposed respectively over a dielectric stack. An array of mandrels is patterned into the mandrel layer with a mandrel mask. An ANA trench is patterned into the mandrel layer with a first cut mask. The ANA trench is patterned into the interposer layer with a second cut mask. An organic planarization layer (OPL) is disposed over the structure. The OPL is etched to dispose it only in the ANA trench such that a top surface of the OPL is lower than the second hardmask layer. The structure is etched to form a pattern in a dielectric layer of the dielectric stack to form an array of metal lines in the dielectric layer, a portion of the pattern formed by the ANA trench forms an ANA region within the dielectric layer.