-
公开(公告)号:US20190252268A1
公开(公告)日:2019-08-15
申请号:US15897204
申请日:2018-02-15
Applicant: GLOBALFOUNDRIES INC.
Inventor: Ruilong Xie , Chanro Park , Laertis Economikos , Andrew M. Greene , Siva Kanakasabapathy , John R. Sporre
IPC: H01L21/8238 , H01L21/28 , H01L29/66 , H01L27/092 , H01L29/06 , H01L29/49
CPC classification number: H01L21/823864 , H01L21/28088 , H01L21/28185 , H01L21/823821 , H01L21/823842 , H01L21/823878 , H01L27/0924 , H01L29/0649 , H01L29/4966 , H01L29/6653 , H01L29/66545
Abstract: Gate isolation methods and structures leverage the formation of a sidewall spacer layer within a recess formed in an organic planarization layer. The spacer layer enables precise alignment of the cut region of a sacrificial gate, which may be backfilled with an isolation layer. By forming the isolation layer after a reliability anneal of the gate dielectric and after formation of a first work function metal layer, both the desired critical dimension (CD) and alignment of the isolation layer can be achieved.
-
公开(公告)号:US20190295852A1
公开(公告)日:2019-09-26
申请号:US15925928
申请日:2018-03-20
Applicant: GLOBALFOUNDRIES INC.
Inventor: Qun GAO , Naved SIDDIQUI , Ankur ARYA , John R. Sporre
IPC: H01L21/311 , H01L29/66 , H01L21/768 , H01L21/3105 , H01L21/033 , H01L21/762
Abstract: The manufacture of a FinFET device includes the formation of a composite sacrificial gate. The composite sacrificial gate includes a sacrificial gate layer such as a layer of amorphous silicon, and an etch selective layer such as a layer of silicon germanium. The etch selective layer, which underlies the sacrificial gate layer, enables the formation of a gate cut opening having a controlled critical dimension that extends through the composite sacrificial gate.
-