公开(公告)号：US10043708B2

公开(公告)日：2018-08-07

申请号：US15347119

申请日：2016-11-09

Applicant: GLOBALFOUNDRIES INC.

Inventor： Viraj Sardesai ,  Suraj K. Patil ,  Scott Beasor ,  Vimal Kumar Kamineni

IPC: H01L29/40 ,  H01L21/768 ,  H01L23/522 ,  H01L23/532

Abstract: A process for forming a conductive structure includes the formation of a self-aligned silicide cap over a cobalt-based contact. The silicide cap is formed in situ by the deposition of a thin silicon layer over exposed portions of a cobalt contact, followed by heat treatment to react the deposited silicon with the cobalt and form cobalt silicide, which is an effective barrier to cobalt migration and oxidation.

公开(公告)号：US10580875B2

公开(公告)日：2020-03-03

申请号：US15873565

申请日：2018-01-17

Applicant: GLOBALFOUNDRIES INC.

Inventor： Hui Zang ,  Guowei Xu ,  Keith Tabakman ,  Viraj Sardesai

IPC: H01L29/417 ,  H01L29/66 ,  H01L21/28 ,  H01L21/311 ,  H01L21/768 ,  H01L27/088 ,  H01L21/8234

Abstract: The present disclosure generally relates to semiconductor structures and, more particularly, to middle of line structures and methods of manufacture. The structure includes: a plurality of gate structures comprising source and/or drain metallization features; spacers on sidewalls of the gate structures and composed of a first material and a second material; and contacts in electrical contact with the source and/or drain metallization features, and separated from the gate structures by the spacers.

公开(公告)号：US20180130702A1

公开(公告)日：2018-05-10

申请号：US15345858

申请日：2016-11-08

Applicant: GLOBALFOUNDRIES Inc.

Inventor： Suraj K. Patil ,  Viraj Sardesai

IPC: H01L21/768 ,  H01L23/522 ,  H01L23/532

CPC classification number: H01L21/76849 ,  H01L21/76883 ,  H01L23/53209

Abstract: Structures that include cobalt metallization and methods of forming such structures. A feature is located inside an opening in a dielectric layer and a cap layer located on a top surface of the feature. The feature is composed of cobalt, and the cap layer is composed of ruthenium or a cobalt-containing alloy.