公开(公告)号：US09343354B2

公开(公告)日：2016-05-17

申请号：US13970124

申请日：2013-08-19

Applicant: GLOBALFOUNDRIES INC.

Inventor： Qinghuang Lin ,  Ying Zhang

IPC: H01L21/4763 ,  H01L21/44 ,  H01L21/768 ,  H01L21/027 ,  H01L21/3105 ,  H01L21/311 ,  H01L21/283

CPC classification number: H01L21/76808 ,  H01L21/0272 ,  H01L21/0276 ,  H01L21/283 ,  H01L21/31058 ,  H01L21/311 ,  H01L21/76802 ,  H01L21/76805 ,  H01L21/76814 ,  H01L21/76816 ,  H01L21/76825 ,  H01L21/76826 ,  H01L21/76828 ,  H01L21/76829 ,  H01L21/76832 ,  H01L21/76877 ,  H01L21/76879 ,  H01L21/76895 ,  H01L21/76897 ,  H01L2924/0002 ,  H01L2924/00

Abstract: A contact structure includes a permanent antireflection coating formed on a substrate having contact pads. A patterned dielectric layer is formed on the antireflective coating. The patterned dielectric layer and the permanent antireflective coating form openings. The openings correspond with locations of the contact pads. Contact structures are formed in the openings to make electrical contact with the contacts pads such that the patterned dielectric layer and the permanent antireflective coating each have a conductively filled region forming the contact structures.

Abstract translation: 接触结构包括在具有接触垫的基板上形成的永久性抗反射涂层。 在抗反射涂层上形成图案化的介电层。 图案化电介质层和永久性抗反射涂层形成开口。 开口对应于接触垫的位置。 在开口中形成接触结构以与接触垫电接触，使得图案化电介质层和永久性抗反射涂层各自具有形成接触结构的导电填充区域。

公开(公告)号：US09245791B2

公开(公告)日：2016-01-26

申请号：US14754190

申请日：2015-06-29

Applicant: GLOBALFOUNDRIES INC.

Inventor： Qinghuang Lin ,  Ying Zhang

IPC: H01L21/283 ,  H01L21/4763 ,  H01L21/768 ,  H01L21/027

CPC classification number: H01L21/76808 ,  H01L21/0272 ,  H01L21/0276 ,  H01L21/283 ,  H01L21/31058 ,  H01L21/311 ,  H01L21/76802 ,  H01L21/76805 ,  H01L21/76814 ,  H01L21/76816 ,  H01L21/76825 ,  H01L21/76826 ,  H01L21/76828 ,  H01L21/76829 ,  H01L21/76832 ,  H01L21/76877 ,  H01L21/76879 ,  H01L21/76895 ,  H01L21/76897 ,  H01L2924/0002 ,  H01L2924/00

Abstract: A contact structure includes a permanent antireflection coating formed on a substrate having contact pads. A patterned dielectric layer is formed on the antireflective coating. The patterned dielectric layer and the permanent antireflective coating form openings. The openings correspond with locations of the contact pads. Contact structures are formed in the openings to make electrical contact with the contacts pads such that the patterned dielectric layer and the permanent antireflective coating each have a conductively filled region forming the contact structures.

Abstract translation: 接触结构包括在具有接触垫的基板上形成的永久性抗反射涂层。 在抗反射涂层上形成图案化的介电层。 图案化电介质层和永久性抗反射涂层形成开口。 开口对应于接触垫的位置。 在开口中形成接触结构以与接触垫电接触，使得图案化电介质层和永久性抗反射涂层各自具有形成接触结构的导电填充区域。