MEMORY DEVICE AND A METHOD FOR FORMING THE MEMORY DEVICE

    公开(公告)号:US20210043637A1

    公开(公告)日:2021-02-11

    申请号:US16532522

    申请日:2019-08-06

    Abstract: A memory device may include a first conductivity region, and second and third conductivity regions arranged at least partially within the first conductivity region. The first and second conductivity regions may have a different conductivity type from at least a part of the third conductivity region. The memory device may include first and second gates arranged over the third conductivity region. The second conductivity region may be coupled to a source line, and the gates may be coupled to respective word lines. When a predetermined write voltage difference is applied between the source line and a word line, an oxide layer of the gate coupled to the word line may break down to form a conductive link between the gate electrode of the gate and the third conductivity region. The memory device may have a smaller cell area, and may be capable of operating at both higher and lower voltages.

    Integrated circuits with magnetic random access memory (MRAM) devices and methods for fabricating such devices

    公开(公告)号:US10797223B2

    公开(公告)日:2020-10-06

    申请号:US15882362

    申请日:2018-01-29

    Abstract: Integrated circuits with magnetic random access memory (MRAM) devices and methods for fabricating such devices are provided. In an exemplary embodiment, a method for fabricating MRAM bitcells includes determining a desired inter-cell spacing between a first bitcell and a second bitcell and double patterning a semiconductor substrate to form semiconductor fin structures, wherein the semiconductor fin structures are formed in groups with an intra-group pitch between grouped semiconductor fin structures and with the inter-cell spacing between adjacent groups of semiconductor fin structures different from the intra-group pitch. The method further includes forming a first MRAM memory structure over the semiconductor fin structures in the first bitcell and forming a second MRAM memory structure over the semiconductor fin structures in the second bitcell. Also, the method includes forming a first source line for the first bitcell between the first MRAM memory structure and the second MRAM memory structure.

    Sensor device and a method for forming the sensor device

    公开(公告)号:US10724983B2

    公开(公告)日:2020-07-28

    申请号:US16215688

    申请日:2018-12-11

    Abstract: A sensor device may include a substrate, first and second source regions, first and second drain regions, first and second channel regions, and first and second gate structures disposed over the first and second channel regions, respectively. The source regions and drain regions may be at least partially disposed within the substrate. The first and second source regions may have first and second source resistances, respectively, and the second source resistance may be higher than the first source resistance. The first gate structure may receive a solution, and a change in pH in the solution may cause a change in a first current flow through the first channel region. In turn, the second current flow through the second channel region may change to compensate for the change in the first current flow to maintain a constant current flow through the sensor device.

    MAGNETIC TUNNEL JUNCTION RING OSCILLATOR WITH TUNABLE FREQUENCY AND METHODS FOR OPERATING THE SAME

    公开(公告)号:US20200220530A1

    公开(公告)日:2020-07-09

    申请号:US16243433

    申请日:2019-01-09

    Abstract: Provided are integrated circuits that include one or more magnetic tunnel junction ring oscillator(s) with tunable frequency and methods for operating the same. Accordingly, an integrated circuit is provided that includes a ring oscillator. The ring oscillator includes an input voltage terminal, an output voltage terminal, and an odd number of at least three inverters disposed electrically in series with one another between the input voltage terminal and the output voltage terminal. Each of the at least three inverters includes an NMOS transistor and one or more magnetic tunnel junctions (MTJs) disposed electrically in series with the NMOS transistor. The NMOS transistor of each of the at least three inverters is selectively tunable with regard to either or both of its threshold voltage and its effective channel width.

    NON-VOLATILE MEMORY ELEMENTS WITH FILAMENT CONFINEMENT

    公开(公告)号:US20210013406A1

    公开(公告)日:2021-01-14

    申请号:US17038748

    申请日:2020-09-30

    Abstract: Structures for a non-volatile memory and methods of forming and using such structures. A resistive memory element includes a first electrode, a second electrode, and a switching layer arranged between the first electrode and the second electrode. A transistor includes a drain coupled with the second electrode. The switching layer has a top surface, and the first electrode is arranged on a first portion of the top surface of the switching layer. A hardmask, which is composed of a dielectric material, is arranged on a second portion of the top surface of the switching layer.

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