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    Memory array structure and single instruction multiple data processor including the same and methods thereof
    3.
    发明授权
    Memory array structure and single instruction multiple data processor including the same and methods thereof 有权
    内存阵列结构和单指令多数据处理器包括相同的方法

    公开(公告)号：US07725641B2

    公开(公告)日：2010-05-25

    申请号：US11806593

    申请日：2007-06-01

    申请人： Gi-Ho Park ,  Shin-Dug Kim ,  Jung-Wook Park ,  Jun-Kyu Park ,  Sung-Bae Park

    发明人： Gi-Ho Park ,  Shin-Dug Kim ,  Jung-Wook Park ,  Jun-Kyu Park ,  Sung-Bae Park

    IPC分类号： G06F12/00

    CPC分类号： G06F15/8015

    摘要： A memory may be configured to rearrange and store data to enable a conflict free mode for a memory access pattern required by a coder-decoder(codec) and configured to output a plurality of data from a plurality of banks of the memory in parallel. In addition, a data interconnection unit is configured to shift the plurality of data output from the memory and provide the shifted data to a plurality of operation units as input data. The operation result from each of the plurality of operation units is stored in a region of the memory.

    摘要翻译： 存储器可以被配置为重新排列和存储数据，以便为编码器 - 解码器（编解码器）所需的存储器访问模式实现无冲突模式，并被配置为并行地从存储器的多个存储体中输出多个数据。 此外，数据互连单元被配置为移位从存储器输出的多个数据，并将移位的数据提供给多个操作单元作为输入数据。 来自多个操作单元中的每一个的操作结果被存储在存储器的区域中。

    Apparatus for measuring distortion power quality index and method of operating the apparatus
    4.
    发明授权
    Apparatus for measuring distortion power quality index and method of operating the apparatus 有权
    用于测量失真电能质量指标的装置和操作该装置的方法

    公开(公告)号：US08185358B2

    公开(公告)日：2012-05-22

    申请号：US11989228

    申请日：2007-11-08

    申请人： Jung-Wook Park ,  Soon Lee

    发明人： Jung-Wook Park ,  Soon Lee

    IPC分类号： G01R23/20 ,  G06F17/40

    CPC分类号： G01R19/2513

    摘要： A method of measuring a power quality index. A total current waveform of an ingress from a customer, and a current waveform and a voltage waveform of each of at least one load installed at the customer are measured. A load composition (LC) of the customer using the total current waveform of the ingress and the current waveform of each of the at least one load is computed. A total harmonic distortion (THD) of each of the at least one load using the current waveform and the voltage waveform of each of the at least one load is computed. Thereafter, a distortion power quality index (DPQI) of each of the at least one load using the LC and the THD is computed.

    摘要翻译： 一种测量电能质量指数的方法。 测量来自客户的入口的总电流波形，以及安装在客户处的至少一个负载中的每一个的电流波形和电压波形。 计算使用入口的总电流波形和至少一个负载中的每一个的电流波形的客户的负载组合（LC）。 使用电流波形的至少一个负载中的每个负载和至少一个负载中的每一个的电压波形的总谐波失真（THD）进行计算。 此后，计算使用LC和THD的至少一个负载中的每一个的失真功率质量指数（DPQI）。

    Power supply system and method including power generator and storage device
    5.
    发明授权
    Power supply system and method including power generator and storage device 有权
    电源系统及方法包括发电机和存储装置

    公开(公告)号：US08552583B2

    公开(公告)日：2013-10-08

    申请号：US13232360

    申请日：2011-09-14

    申请人： Jung-Wook Park ,  Byung-Kwan Kang ,  Hyun-Koo Lee ,  Seung-Tak Kim

    发明人： Jung-Wook Park ,  Byung-Kwan Kang ,  Hyun-Koo Lee ,  Seung-Tak Kim

    IPC分类号： B60L1/00 ,  H02M5/42

    CPC分类号： H02M3/1582 ,  H02M2003/1586

    摘要： The present invention relates to a power supply system and method including a power generator and a storage device. Specifically, the power supply method using a power supply system which includes a power generator, a storage device, a unidirectional converter, and a bidirectional interleaved converter, and in which the other side of the unidirectional converter is connected to the other side of the bidirectional interleaved converter and power is output from the other side of the unidirectional converter, the power supply method comprises measuring one or more of an amount of power generation of the power generator and an amount of power storage of the storage device; forming a power transfer path by analyzing one or more of the amount of power generation and the amount of power storage; and controlling activation of devices on the formed power transfer path.

    摘要翻译： 本发明涉及一种包括发电机和存储装置的电源系统和方法。 具体地，使用包括发电机，存储装置，单向转换器和双向交错转换器的电源系统的电源方法，其中单向转换器的另一侧连接到双向 交错转换器和功率从单向转换器的另一侧输出，电源方法包括测量发电机的发电量和存储装置的电力存储量中的一个或多个; 通过分析发电量和电力存储量中的一个或多个来形成电力传送路径; 以及控制所形成的电力传输路径上的设备的激活。

    Method and system for patterning a substrate
    6.
    发明授权
    Method and system for patterning a substrate 有权
    图案化基板的方法和系统

    公开(公告)号：US08912097B2

    公开(公告)日：2014-12-16

    申请号：US12859606

    申请日：2010-08-19

    申请人： Patrick M. Martin ,  Steven Carlson ,  Choong-Young Oh ,  Jung-Wook Park

    发明人： Patrick M. Martin ,  Steven Carlson ,  Choong-Young Oh ,  Jung-Wook Park

    IPC分类号： H01L21/302

    CPC分类号： H01L21/32139 ,  G03F7/40 ,  G03F7/405 ,  H01L21/0273 ,  H01L21/0337

    摘要： A method of patterning a substrate comprises providing an array of resist features defined by a first pitch and a first gap width between adjacent resist features. Particles are introduced into the array of resist features, wherein the array of resist features becomes hardened. The introduction of particles may cause a reduction in critical dimension of the resist features. Sidewalls are provided on side portions of hardened resist features. Subsequent to the formation of the sidewalls, the hardened resist features are removed, leaving an array of isolated sidewalls disposed on the substrate. The sidewall array provides a mask for double patterning of features in the substrate layers disposed below the sidewalls, wherein an array of features formed in the substrate has a second pitch equal to half that of the first pitch.

    摘要翻译： 图案化衬底的方法包括提供由相邻抗蚀剂特征之间的第一间距和第一间隙宽度限定的抗蚀剂特征阵列。 将粒子引入到抗蚀剂特征阵列中，其中抗蚀剂特征阵列变硬。 颗粒的引入可能导致抗蚀剂特征的临界尺寸的降低。 侧壁设置在硬化抗蚀剂特征的侧部。 在形成侧壁之后，去除硬化的抗蚀剂特征，留下设置在基底上的隔离侧壁阵列。 侧壁阵列提供用于在设置在侧壁下方的衬底层中的特征的双重图案化的掩模，其中形成在衬底中的特征阵列具有等于第一间距的一半的第二间距。

    Apparatus for Measuring Distortion Power Quality Index and Method of Operating the Apparatus
    7.
    发明申请
    Apparatus for Measuring Distortion Power Quality Index and Method of Operating the Apparatus 有权
    用于测量失真电能质量指标的装置和操作该装置的方法

    公开(公告)号：US20100131243A1

    公开(公告)日：2010-05-27

    申请号：US11989228

    申请日：2007-11-08

    申请人： Jung-Wook Park ,  Soon Lee

    发明人： Jung-Wook Park ,  Soon Lee

    IPC分类号： G06F19/00

    CPC分类号： G01R19/2513

    摘要： A method of measuring a power quality index, including: measuring a total current waveform of an ingress from a customer, and a current waveform and a voltage waveform of each of at least one load installed at the customer; computing a load composition (LC) of the customer using the total current waveform of the ingress and the current waveform of each of the at least one load; computing a total harmonic distortion (THD) of each of the at least one load using the current waveform and the voltage waveform of each of the at least one load; and computing a distortion power quality index (DPQI) of each of the at least one load using the LC and the THD.

    摘要翻译： 一种测量电能质量指数的方法，包括：测量来自客户的入口的总电流波形，以及安装在客户的至少一个负载中的每一个的电流波形和电压波形; 使用所述入口的总电流波形和所述至少一个负载中的每一个的电流波形来计算所述客户的负载组合（LC）; 使用所述电流波形和所述至少一个负载中的每一个的电压波形来计算所述至少一个负载中的每一个的总谐波失真（THD）; 以及使用所述LC和所述THD计算所述至少一个负载中的每个的失真功率质量指数（DPQI）。

    METHOD AND SYSTEM FOR PATTERNING A SUBSTRATE
    8.
    发明申请
    METHOD AND SYSTEM FOR PATTERNING A SUBSTRATE 有权
    用于绘制衬底的方法和系统

    公开(公告)号：US20110300711A1

    公开(公告)日：2011-12-08

    申请号：US12859606

    申请日：2010-08-19

    申请人： Patrick M. Martin ,  Steven Carlson ,  Choong-Young Oh ,  Jung-Wook Park

    发明人： Patrick M. Martin ,  Steven Carlson ,  Choong-Young Oh ,  Jung-Wook Park

    IPC分类号： H01L21/311 ,  G21K5/00 ,  H01L21/263

    CPC分类号： H01L21/32139 ,  G03F7/40 ,  G03F7/405 ,  H01L21/0273 ,  H01L21/0337

    摘要： A method of patterning a substrate comprises providing an array of resist features defined by a first pitch and a first gap width between adjacent resist features. Particles are introduced into the array of resist features, wherein the array of resist features becomes hardened. The introduction of particles may cause a reduction in critical dimension of the resist features. Sidewalls are provided on side portions of hardened resist features. Subsequent to the formation of the sidewalls, the hardened resist features are removed, leaving an array of isolated sidewalls disposed on the substrate. The sidewall array provides a mask for double patterning of features in the substrate layers disposed below the sidewalls, wherein an array of features formed in the substrate has a second pitch equal to half that of the first pitch.

    摘要翻译： 图案化衬底的方法包括提供由相邻抗蚀剂特征之间的第一间距和第一间隙宽度限定的抗蚀剂特征阵列。 将粒子引入到抗蚀剂特征阵列中，其中抗蚀剂特征阵列变硬。 颗粒的引入可能导致抗蚀剂特征的临界尺寸的降低。 侧壁设置在硬化抗蚀剂特征的侧部。 在形成侧壁之后，去除硬化的抗蚀剂特征，留下设置在基底上的隔离侧壁阵列。 侧壁阵列提供用于在设置在侧壁下方的衬底层中的特征的双重图案化的掩模，其中形成在衬底中的特征阵列具有等于第一间距的一半的第二间距。