摘要:
The present invention relates to a power supply system and method including a power generator and a storage device. Specifically, the power supply method using a power supply system which includes a power generator, a storage device, a unidirectional converter, and a bidirectional interleaved converter, and in which the other side of the unidirectional converter is connected to the other side of the bidirectional interleaved converter and power is output from the other side of the unidirectional converter, the power supply method comprises measuring one or more of an amount of power generation of the power generator and an amount of power storage of the storage device; forming a power transfer path by analyzing one or more of the amount of power generation and the amount of power storage; and controlling activation of devices on the formed power transfer path.
摘要:
A method of measuring a power quality index. A total current waveform of an ingress from a customer, and a current waveform and a voltage waveform of each of at least one load installed at the customer are measured. A load composition (LC) of the customer using the total current waveform of the ingress and the current waveform of each of the at least one load is computed. A total harmonic distortion (THD) of each of the at least one load using the current waveform and the voltage waveform of each of the at least one load is computed. Thereafter, a distortion power quality index (DPQI) of each of the at least one load using the LC and the THD is computed.
摘要:
A method of patterning a substrate comprises providing an array of resist features defined by a first pitch and a first gap width between adjacent resist features. Particles are introduced into the array of resist features, wherein the array of resist features becomes hardened. The introduction of particles may cause a reduction in critical dimension of the resist features. Sidewalls are provided on side portions of hardened resist features. Subsequent to the formation of the sidewalls, the hardened resist features are removed, leaving an array of isolated sidewalls disposed on the substrate. The sidewall array provides a mask for double patterning of features in the substrate layers disposed below the sidewalls, wherein an array of features formed in the substrate has a second pitch equal to half that of the first pitch.
摘要:
A method of measuring a power quality index, including: measuring a total current waveform of an ingress from a customer, and a current waveform and a voltage waveform of each of at least one load installed at the customer; computing a load composition (LC) of the customer using the total current waveform of the ingress and the current waveform of each of the at least one load; computing a total harmonic distortion (THD) of each of the at least one load using the current waveform and the voltage waveform of each of the at least one load; and computing a distortion power quality index (DPQI) of each of the at least one load using the LC and the THD.
摘要:
A memory may be configured to rearrange and store data to enable a conflict free mode for a memory access pattern required by a coder-decoder (codec).
摘要:
A systolic data processing apparatus includes a processing element (PE) array and control unit. The PE array comprises a plurality of PEs, each PE executing a thread with respect to different data according to an input instruction and pipelining the instruction at each cycle for executing a program. The control unit inputs a new instruction to a first PE of the PE array at each cycle.
摘要:
A method of patterning a substrate comprises providing an array of resist features defined by a first pitch and a first gap width between adjacent resist features. Particles are introduced into the array of resist features, wherein the array of resist features becomes hardened. The introduction of particles may cause a reduction in critical dimension of the resist features. Sidewalls are provided on side portions of hardened resist features. Subsequent to the formation of the sidewalls, the hardened resist features are removed, leaving an array of isolated sidewalls disposed on the substrate. The sidewall array provides a mask for double patterning of features in the substrate layers disposed below the sidewalls, wherein an array of features formed in the substrate has a second pitch equal to half that of the first pitch.
摘要:
A memory may be configured to rearrange and store data to enable a conflict free mode for a memory access pattern required by a coder-decoder(codec) and configured to output a plurality of data from a plurality of banks of the memory in parallel. In addition, a data interconnection unit is configured to shift the plurality of data output from the memory and provide the shifted data to a plurality of operation units as input data. The operation result from each of the plurality of operation units is stored in a region of the memory.