Batch-type deposition apparatus having gland portion
    2.
    发明申请
    Batch-type deposition apparatus having gland portion 审中-公开
    具有压盖部分的分批式沉积设备

    公开(公告)号:US20050183664A1

    公开(公告)日:2005-08-25

    申请号:US11025005

    申请日:2004-12-28

    摘要: Batch-type deposition apparatus having a gland portion are provided. The apparatus include a reaction furnace, a gas nozzle located in the reaction furnace, a gas supply conduit located outside the reaction furnace and a gland portion for connecting the gas nozzle to the gas supply conduit. The gland portion includes a gas nozzle end extended from the gas nozzle toward an outside region of the reaction furnace and a gas supply conduit end extended from the gas supply conduit. The gas nozzle end is connected to the gas supply conduit end through a buffer member. The buffer member has an inclined inner wall for connecting an inner wall of the gas nozzle end to that of the gas supply conduit end.

    摘要翻译: 提供具有压盖部分的分批式沉积设备。 该装置包括反应炉,位于反应炉中的气体喷嘴,位于反应炉外部的气体供应管道和用于将气体喷嘴连接到气体供应管道的压盖部分。 压盖部分包括从气体喷嘴朝向反应炉的外部区域延伸的气体喷嘴端和从气体供应管道延伸的气体供应管道端部。 气体喷嘴端部通过缓冲部件与气体供给导管端部连接。 缓冲构件具有用于将气体喷嘴端的内壁与气体供给导管端的内壁连接的倾斜内壁。