Abstract:
A neuristor-based reservoir computing device includes support circuitry formed in a complimentary metal oxide semiconductor (CMOS) layer, input nodes connected to the support circuitry and output nodes connected to the support circuitry. Thin film neuristor nodes are disposed over the CMOS layer with a first portion of the neuristor nodes connected to the input nodes and a second portion of the neuristor nodes connected to the output nodes. Interconnections between the neuristor nodes form a reservoir accepting input signals from the input nodes and outputting signals on the output nodes. A method for forming a neuristor-based reservoir computing device is also provided.
Abstract:
A neuristor-based reservoir computing device includes support circuitry formed in a complimentary metal oxide semiconductor (CMOS) layer, input nodes connected to the support circuitry and output nodes connected to the support circuitry. Thin film neuristor nodes are disposed over the CMOS layer with a first portion of the neuristor nodes connected to the input nodes and a second portion of the neuristor nodes connected to the output nodes. Interconnections between the neuristor nodes form a reservoir accepting input signals from the input nodes and outputting signals on the output nodes. A method for forming a neuristor-based reservoir computing device is also provided.
Abstract:
A neuristor-based reservoir computing device includes support circuitry formed in a complimentary metal oxide semiconductor (CMOS) layer, input nodes connected to the support circuitry and output nodes connected to the support circuitry. Thin film neuristor nodes are disposed over the CMOS layer with a first portion of the neuristor nodes connected to the input nodes and a second portion of the neuristor nodes connected to the output nodes. Interconnections between the neuristor nodes form a reservoir accepting input signals from the input nodes and outputting signals on the output nodes. A method for forming a neuristor-based reservoir computing device is also provided.
Abstract:
A neuristor-based reservoir computing device includes support circuitry formed in a complimentary metal oxide semiconductor (CMOS) layer, input nodes connected to the support circuitry and output nodes connected to the support circuitry. Thin film neuristor nodes are disposed over the CMOS layer with a first portion of the neuristor nodes connected to the input nodes and a second portion of the neuristor nodes connected to the output nodes. Interconnections between the neuristor nodes form a reservoir accepting input signals from the input nodes and outputting signals on the output nodes. A method for forming a neuristor-based reservoir computing device is also provided.
Abstract:
Examples disclose a crossbar memory with a first crossbar to write data values corresponding to a word. The crossbar memory further comprises a second crossbar, substantially parallel to the first crossbar, to receive voltage for activation of data values across the second crossbar. Additionally, the examples of the crossbar memory provide an output line that interconnects with the crossbars at junctions, to read the data values at the junctions. Further, the examples of the crossbar memory provide a logic module to determine whether the second crossbar data values correspond to the word written in the first crossbar.
Abstract:
Memristor systems and method for fabricating memristor system are disclosed. In one aspect, a memristor includes a first electrode, a second electrode, and a junction disposed between the first electrode and the second electrode. The junction includes at least one layer such that each layer has a plurality of dopant sub-layers disposed between insulating sub-layers. The sub-layers are oriented substantially parallel to the first and second electrodes.
Abstract:
A memory cell includes a transistor with a first source/drain terminal spaced apart from a second source/drain terminal with a semiconductor material; a gate terminal located proximate the semiconductor material such that an increase in a gate terminal voltage increases a conductivity of the semiconductor material; and the first source/drain terminal being connected in series to a negative differential resistance material.