公开(公告)号：US20020105648A1

公开(公告)日：2002-08-08

申请号：US10115079

申请日：2002-04-04

申请人： Hitachi, Ltd.

发明人： Yasuhiko Nara ,  Kazuhisa Machida ,  Mari Nozoe ,  Hiroshi Morioka ,  Yasutsugu Usami ,  Takashi Hiroi ,  Kohichi Hayakawa ,  Maki Ito

IPC分类号： G01N021/88

CPC分类号： G03F7/70616 ,  G03F1/84 ,  G03F7/7065 ,  G06T7/001 ,  G06T2207/30141 ,  H01J37/226 ,  H01J2237/082 ,  H01J2237/2817 ,  H01L22/12

摘要： Inspection method, apparatus, and system for a circuit pattern, in which when various conditions which are necessary in case of inspecting a fine circuit pattern by using an image formed by irradiating white light, a laser beam, or a charged particle beam are set, its operating efficiency can be improved. An inspection target region of an inspection-subject substrate is displayed, and a designated map picture plane and an image of an optical microscope or an electron beam microscope of a designated region are displayed in parallel, thereby enabling a defect distribution and a defect image to be simultaneously seen. Item names of inspecting conditions and a picture plane to display, input, or instruct the contents of the inspecting conditions are integrated, those contents are overlapped to the picture plane and layer-displayed, and all of the item names are displayed in parallel in a tab format in the upper portion of the picture plane of the contents. When a desired item name is clicked, the picture plane is switched and the contents corresponding to the clicked item name are displayed.

公开(公告)号：US20030058444A1

公开(公告)日：2003-03-27

申请号：US10287706

申请日：2002-11-05

申请人： HITACHI, LTD.

发明人： Yasuhiko Nara ,  Kazuhisa Machida ,  Mari Nozoe ,  Hiroshi Morioka ,  Yasutsugu Usami ,  Kohichi Hayakawa ,  Maki Ito

IPC分类号： G01B011/00

CPC分类号： G03F7/70616 ,  G03F1/84 ,  G03F7/7065 ,  G06T7/001 ,  G06T2207/30141 ,  H01J37/226 ,  H01J2237/082 ,  H01J2237/2817 ,  H01L22/12

摘要： Inspection method, apparatus, and system for a circuit pattern, in which when various conditions which are necessary in case of inspecting a fine circuit pattern by using an image formed by irradiating white light, a laser beam, or a charged particle beam are set, its operating efficiency can be improved. An inspection target region of an inspection-subject substrate is displayed, and a designated map picture plane and an image of an optical microscope or an electron beam microscope of a designated region are displayed in parallel, thereby enabling a defect distribution and a defect image to be simultaneously seen. Item names of inspecting conditions and a picture plane to display, input, or instruct the contents of the inspecting conditions are integrated, those contents are overlapped to the picture plane and layer-displayed, and all of the item names are displayed in parallel in a tab format in the upper portion of the picture plane of the contents. When a desired item name is clicked, the picture plane is switched and the contents corresponding to the clicked item name are displayed.

公开(公告)号：US20030206027A1

公开(公告)日：2003-11-06

申请号：US10430188

申请日：2003-05-07

申请人： Hitachi, Ltd.

发明人： Mari Nozoe ,  Hiroyuki Shinada ,  Kenji Watanabe ,  Keiichi Saiki ,  Aritoshi Sugimoto ,  Hiroshi Morioka ,  Maki Tanaka ,  Hiroshi Miyai

IPC分类号： G01R031/305

CPC分类号： H01J37/28 ,  G01R31/307 ,  G09G3/006 ,  H01J37/265 ,  H01J2237/221 ,  H01J2237/2817 ,  H01L22/12 ,  H01L2924/0002 ,  H01L2924/00

摘要： In order to obtain optimum irradiation conditions of an electron beam according to the material and structure of a circuit pattern to be inspected and the kind of a failure to be detected and inspect under the optimum conditions without delay of the inspection time, an inspection device for irradiating the electron beam 19 to the sample board 9 which is a sample, detecting generated secondary electrons by the detector 7, storing obtained signals sequentially in the storage, comparing the same pattern stored in the storage by the comparison calculation unit, and extracting a failure by comparing the predetermined threshold value with the comparison signal by the failure decision unit is provided, wherein the optimum value of the irradiation energy is stored in the data base inside the device beforehand according to the structure of a sample and a recommended value of the irradiation energy suited to inspection can be searched for by inputting or selecting the irradiation energy by a user or inputting information regarding the structure of an article to be inspected.