公开(公告)号：US20190304740A1

公开(公告)日：2019-10-03

申请号：US16427698

申请日：2019-05-31

Applicant: Hitachi High-Technologies Corporation

Inventor： Muneyuki FUKUDA ,  Yoshinori MOMONOI ,  Akihiro MIURA ,  Fumihiro SASAJIMA ,  Hiroaki MITO

IPC: H01J37/22 ,  H01J37/21 ,  H01J37/28

Abstract: A charged particle beam device is provided that performs proper beam adjustment while suppressing a decrease in MAM time, with a simple configuration without adding a lens, a sensor, or the like. The charged particle beam device includes: an optical element which adjusts a charged particle beam emitted from a charged particle source; an adjustment element which adjusts an incidence condition of the charged particle beam with respect to the optical element; and a control device which controls the adjustment element, wherein the control device determines a difference between a first feature amount indicating a state of the optical element based on the condition setting of the optical element, and a second feature amount indicating a state where the optical element reaches based on the condition setting and executes adjustment by the adjustment element when the difference is greater than or equal to a predetermined value.

公开(公告)号：US20170301513A1

公开(公告)日：2017-10-19

申请号：US15445055

申请日：2017-02-28

Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION

Inventor： Mayuka OSAKI ,  Chie SHISHIDO ,  Maki TANAKA ,  Hitoshi NAMAI ,  Fumihiro SASAJIMA ,  Makoto SUZUKI ,  Yoshinori MOMONOI

IPC: H01J37/285 ,  H01J37/28 ,  H01J37/244

CPC classification number: H01J37/285 ,  H01J37/244 ,  H01J37/28 ,  H01J2237/221 ,  H01J2237/24578 ,  H01J2237/2814

Abstract: A scanning electron microscope capable of properly determining a step of a step pattern formed on a sample regardless of combination of material of a groove of the step pattern and material of a projection of the step pattern, the scanning electron microscope includes a beam source, a detection unit having a first detection unit that detects a secondary electron emitted from the sample at an angle between an optical axis direction of the primary electron beam which is equal to or less than a predetermined value, and a second detection unit that detects a secondary electron emitted from the sample at an angle between the optical axis direction of the primary electron beam which is greater than the predetermined value, and a processing unit to obtain information on the step pattern using the information on a ratio between signals outputted from the first and the second detection unit.

公开(公告)号：US20170110285A1

公开(公告)日：2017-04-20

申请号：US15292832

申请日：2016-10-13

Applicant: Hitachi High-Technologies Corporation

Inventor： Muneyuki FUKUDA ,  Yoshinori MOMONOI ,  Akihiro MIURA ,  Fumihiro SASAJIMA ,  Hiroaki MITO

IPC: H01J37/22 ,  H01J37/28

CPC classification number: H01J37/22 ,  H01J37/21 ,  H01J37/28 ,  H01J2237/024 ,  H01J2237/216 ,  H01J2237/2817

Abstract: The invention has an object to provide a charged particle beam device in which it is possible to perform proper beam adjustment while suppressing a decrease in MAM time, with a simple configuration without adding a lens, a sensor, or the like. In order to achieve the above object, according to the invention, there is provided a charged particle beam device including: an optical element which adjusts a charged particle beam emitted from a charged particle source; an adjustment element which adjusts an incidence condition of the charged particle beam with respect to the optical element; and a control device which controls the adjustment element, wherein the control device determines a difference between a first feature amount indicating a state of the optical element based on the condition setting of the optical element, and a second feature amount indicating a state where the optical element reaches based on the condition setting and executes adjustment by the adjustment element when the difference is greater than or equal to a predetermined value.

公开(公告)号：US20180138010A1

公开(公告)日：2018-05-17

申请号：US15869460

申请日：2018-01-12

Applicant: Hitachi High-Technologies Corporation

Inventor： Muneyuki FUKUDA ,  Yoshinori MOMONOI ,  Akihiro MIURA ,  Fumihiro SASAJIMA ,  Hiroaki MITO

IPC: H01J37/22 ,  H01J37/28

CPC classification number: H01J37/22 ,  H01J37/21 ,  H01J37/28 ,  H01J2237/024 ,  H01J2237/216 ,  H01J2237/2817

Abstract: A charged particle beam device is provided that performs proper beam adjustment while suppressing a decrease in MAM time, with a simple configuration without adding a lens, a sensor, or the like. The charged particle beam device includes: an optical element which adjusts a charged particle beam emitted from a charged particle source; an adjustment element which adjusts an incidence condition of the charged particle beam with respect to the optical element; and a control device which controls the adjustment element, wherein the control device determines a difference between a first feature amount indicating a state of the optical element based on the condition setting of the optical element, and a second feature amount indicating a state where the optical element reaches based on the condition setting and executes adjustment by the adjustment element when the difference is greater than or equal to a predetermined value.