公开(公告)号：US20190204247A1

公开(公告)日：2019-07-04

申请号：US16330003

申请日：2016-09-01

Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION

Inventor： Atsuko YAMAGUCHI ,  Kazuhisa HASUMI ,  Hitoshi NAMAI

IPC: G01N23/2251 ,  H01J37/28 ,  H01J37/317 ,  H01L27/088

Abstract: To provide an image analysis apparatus capable of easily extracting an edge of an upper layer pattern formed intersecting with a lower layer pattern so as not to be affected by the lower layer pattern, the image analysis apparatus includes a calculation unit that calculates an analysis range including a region where the lower layer pattern intersects with the upper layer pattern and a region where the lower pattern is not formed, a calculation unit that averages a plurality of signal profiles, a calculation unit that calculates a maximum value and a minimum value of a signal intensity, a calculation unit that calculates a threshold level difference using the maximum value and the minimum value, and a calculation unit that calculates the edge of the upper layer pattern on the signal profile.

公开(公告)号：US20170301513A1

公开(公告)日：2017-10-19

申请号：US15445055

申请日：2017-02-28

Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION

Inventor： Mayuka OSAKI ,  Chie SHISHIDO ,  Maki TANAKA ,  Hitoshi NAMAI ,  Fumihiro SASAJIMA ,  Makoto SUZUKI ,  Yoshinori MOMONOI

IPC: H01J37/285 ,  H01J37/28 ,  H01J37/244

CPC classification number: H01J37/285 ,  H01J37/244 ,  H01J37/28 ,  H01J2237/221 ,  H01J2237/24578 ,  H01J2237/2814

Abstract: A scanning electron microscope capable of properly determining a step of a step pattern formed on a sample regardless of combination of material of a groove of the step pattern and material of a projection of the step pattern, the scanning electron microscope includes a beam source, a detection unit having a first detection unit that detects a secondary electron emitted from the sample at an angle between an optical axis direction of the primary electron beam which is equal to or less than a predetermined value, and a second detection unit that detects a secondary electron emitted from the sample at an angle between the optical axis direction of the primary electron beam which is greater than the predetermined value, and a processing unit to obtain information on the step pattern using the information on a ratio between signals outputted from the first and the second detection unit.

公开(公告)号：US20160307730A1

公开(公告)日：2016-10-20

申请号：US15100518

申请日：2014-12-01

Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION

Inventor： Hitoshi NAMAI ,  Tomoaki YAMAZAKI

IPC: H01J37/28

CPC classification number: H01J37/28 ,  G01B15/00 ,  H01J2237/24578 ,  H01J2237/2817

Abstract: The present invention is: a pattern measurement device that, regardless of increased fineness, deviation, or the like of a pattern, accurately and stably performs measurement on the basis of edge identification or pattern or edge judgment; and a computer program. The pattern measurement device classifies pattern sites (G1, G2, G3, G4), which are repeatedly arrayed at a specific interval, in accordance with the position of the pattern sites, and executes a pattern edge type identification, a pattern type identification, or a measurement of the dimensions between predetermined pattern sites on the basis of an association between the classified pattern sites and information pertaining to the pattern edge type or information pertaining to the pattern type. The computer program causes a computer to execute the abovementioned process.

Abstract translation: 本发明是一种图案测量装置，其不管图案的细度，偏差等是否增加，都可以基于边缘识别或图案或边缘判断准确稳定地进行测量; 和计算机程序。 图案测量装置根据图案位置的位置对以特定间隔重复排列的图案位置（G1，G2，G3，G4）进行分类，并且执行图案边缘类型识别，图案类型识别或 基于分类图案位置之间的关联和与图案边缘类型有关的信息或与图案类型有关的信息，在预定图案位置之间的尺寸的测量。 计算机程序使计算机执行上述处理。