公开(公告)号：US20170301513A1

公开(公告)日：2017-10-19

申请号：US15445055

申请日：2017-02-28

Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION

Inventor： Mayuka OSAKI ,  Chie SHISHIDO ,  Maki TANAKA ,  Hitoshi NAMAI ,  Fumihiro SASAJIMA ,  Makoto SUZUKI ,  Yoshinori MOMONOI

IPC: H01J37/285 ,  H01J37/28 ,  H01J37/244

CPC classification number: H01J37/285 ,  H01J37/244 ,  H01J37/28 ,  H01J2237/221 ,  H01J2237/24578 ,  H01J2237/2814

Abstract: A scanning electron microscope capable of properly determining a step of a step pattern formed on a sample regardless of combination of material of a groove of the step pattern and material of a projection of the step pattern, the scanning electron microscope includes a beam source, a detection unit having a first detection unit that detects a secondary electron emitted from the sample at an angle between an optical axis direction of the primary electron beam which is equal to or less than a predetermined value, and a second detection unit that detects a secondary electron emitted from the sample at an angle between the optical axis direction of the primary electron beam which is greater than the predetermined value, and a processing unit to obtain information on the step pattern using the information on a ratio between signals outputted from the first and the second detection unit.

公开(公告)号：US20200234916A1

公开(公告)日：2020-07-23

申请号：US16747761

申请日：2020-01-21

Applicant: Hitachi High-Technologies Corporation

Inventor： Kenji YASUI ,  Mayuka OSAKI ,  Makoto SUZUKI ,  Hirohiko KITSUKI ,  Toshiyuki YOKOSUKA ,  Daisuke BIZEN ,  Yusuke ABE

IPC: H01J37/28 ,  H01J37/244 ,  G01N23/2251 ,  H01J37/20

Abstract: To measure a depth of a three-dimensional structure, for example, a hole or a groove, formed in a sample without preparing information for each pattern or calibration in advance. The invention provides an electron microscope including a detection unit that detects, among emitted electrons generated from a sample by irradiating the sample with a primary electron beam, emitted electrons of which an emission angle is in a predetermined range, the emission angle being an angle formed between an axial direction of the primary electron beam and an emission direction of the emitted electrons from the sample, and outputs a detection signal corresponding to the number of the emitted electrons which are detected. In the electron microscope, an emission angle distribution of a detection signal is obtained based on a plurality of detection signals output by the detection unit, the detection signals being obtained by detecting the emitted electrons having emission angles in each of the plurality of set ranges of emission angles and generated by irradiating a bottom portion of the three-dimensional structure with the primary electron beam, and an opening angle is obtained based on a change point of the emission angle distribution, the opening angle being an angle formed between an optical axis direction of the primary electron beam and a straight line that passes through an upper end of a side wall of the three-dimensional structure from a position irradiated with the primary electron beam in the bottom portion of the three-dimensional structure.