公开(公告)号：US20200265568A1

公开(公告)日：2020-08-20

申请号：US16639701

申请日：2017-09-14

Applicant: Hitachi High-Technologies Corporation

Inventor： Mitsutoshi KOBAYASHI ,  Maki TANAKA ,  Yoshinobu HOSHINO

IPC: G06T5/50 ,  G06T3/00 ,  G06T7/30 ,  G02B21/00

Abstract: Even if a generated wide-field image includes residual local misalignment, this charged particle microscope device can prompt for user input to correct such local misalignment, and can regenerate, on the basis of the user input, a wide-field image that includes little misalignment even in local areas of the overlap regions thereof. A charged particle microscope according to the present invention captures a plurality of images in such a way that each captured image has overlap regions that are to be overlapped with the overlap regions of captured images adjacent to that captured image, wherein an image processing unit: sets a pair of corresponding points in respective overlap regions of each two adjacent captured images; sets predetermined constraint conditions for each captured image; calculates the amounts of misalignment between the plurality of captured images on the basis of the set pairs of corresponding points and the set constraint conditions; connects the plurality of captured images to one another after correcting the misalignment between these captured images on the basis of the calculated amounts of misalignment, thereby generating a single wide-field image; calculates, for each of a plurality of local areas set in the overlap regions of each two adjacent captured images, a degree of reliability for the connection between these captured images; and notifies a user of either each found low reliability local area or the overlap region including that low reliability local area, as well as the set pairs of corresponding points and the set constraint conditions.

公开(公告)号：US20170301513A1

公开(公告)日：2017-10-19

申请号：US15445055

申请日：2017-02-28

Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION

Inventor： Mayuka OSAKI ,  Chie SHISHIDO ,  Maki TANAKA ,  Hitoshi NAMAI ,  Fumihiro SASAJIMA ,  Makoto SUZUKI ,  Yoshinori MOMONOI

IPC: H01J37/285 ,  H01J37/28 ,  H01J37/244

CPC classification number: H01J37/285 ,  H01J37/244 ,  H01J37/28 ,  H01J2237/221 ,  H01J2237/24578 ,  H01J2237/2814

Abstract: A scanning electron microscope capable of properly determining a step of a step pattern formed on a sample regardless of combination of material of a groove of the step pattern and material of a projection of the step pattern, the scanning electron microscope includes a beam source, a detection unit having a first detection unit that detects a secondary electron emitted from the sample at an angle between an optical axis direction of the primary electron beam which is equal to or less than a predetermined value, and a second detection unit that detects a secondary electron emitted from the sample at an angle between the optical axis direction of the primary electron beam which is greater than the predetermined value, and a processing unit to obtain information on the step pattern using the information on a ratio between signals outputted from the first and the second detection unit.

公开(公告)号：US20170169992A1

公开(公告)日：2017-06-15

申请号：US15312866

申请日：2015-05-27

Applicant: Hitachi High-Technologies Corporation

Inventor： Mitsutoshi KOBAYASHI ,  Kenji NAKAHIRA ,  Maki TANAKA

IPC: H01J37/26 ,  H01J37/244

CPC classification number: H01J37/265 ,  H01J37/244 ,  H01J37/263 ,  H01J37/28 ,  H01J2237/221 ,  H01J2237/24592 ,  H01J2237/2809 ,  H01J2237/2817

Abstract: In order to enable high-speed imaging of a wide-field image, the imaging method using the electron microscope comprises: irradiating and scanning a wide-field region of the sample with a low-dose amount of electron beam, and acquiring a wide-field image of the sample; setting, from this wide-field image, a narrow-field region; irradiating and scanning this narrow-field region with a high-dose amount of the electron beam, and acquiring a narrow-field image of the sample; determining the noise-removal parameters for the acquired wide-field image and narrow-field image; performing image quality improvement processing on the wide-field image and the narrow-field image; performing drift correction on the narrow-field image undergone the image quality improvement processing; and combining the narrow-field image undergone this drift correction and the wide-field image in such a manner that the visibility of each is at the same level throughout the entirety of the combined image.

公开(公告)号：US20160336145A1

公开(公告)日：2016-11-17

申请号：US15110284

申请日：2014-12-03

Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION

Inventor： Yusuke OMINAMI ,  Kenji NAKAHIRA ,  Maki TANAKA ,  Shinsuke KAWANISHI

IPC: H01J37/22 ,  H01J37/20 ,  H01J37/18 ,  H01J37/28

CPC classification number: H01J37/222 ,  H01J37/185 ,  H01J37/20 ,  H01J37/28 ,  H01J2237/164 ,  H01J2237/221 ,  H01J2237/2608 ,  H01J2237/2806

Abstract: A charged-particle-beam device is provided with a data processing unit that removes, from a detector signal, the effect that scattering of a primary charged-particle beam before the primary charged-particle beam reaches a specimen has on the spot shape of the primary charged-particle beam. For example, when using an electron microscope to observe a specimen in a non-vacuum atmosphere, the effect that scattering of a primary charged-particle beam due to a barrier film or a gas present in a non-vacuum space has on the spot shape of the primary charged-particle beam is removed from a signal acquired by a detector. This makes it easy to obtain high-quality images.

Abstract translation: 带电粒子束装置设置有数据处理单元，该数据处理单元从检测器信号中去除在初级带电粒子束到达样本之前的初级带电粒子束的散射具有的斑点形状 初级带电粒子束。 例如，当使用电子显微镜在非真空气氛中观察样品时，由于阻挡膜或存在于非真空空间中的气体引起的初级带电粒子束的散射的影响具有点形状 的初级带电粒子束从由检测器获取的信号中去除。 这使得获得高质量图像变得容易。

公开(公告)号：US20160379798A1

公开(公告)日：2016-12-29

申请号：US15039527

申请日：2014-11-19

Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION

Inventor： Chie SHISHIDO ,  Takuma YAMAMOTO ,  Shinya YAMADA ,  Maki TANAKA

IPC: H01J37/29 ,  H01J37/244 ,  G01B15/00

CPC classification number: H01J37/29 ,  G01B15/00 ,  G01B15/04 ,  G01B2210/56 ,  H01J37/244 ,  H01J37/28 ,  H01J2237/24475 ,  H01J2237/2448 ,  H01J2237/24495 ,  H01J2237/2806 ,  H01J2237/281 ,  H01J2237/2815 ,  H01L22/12

Abstract: In order to allow detecting backscattered electrons (BSEs) generated from the bottom of a hole for determining whether a hole with a super high aspect ratio is opened or for inspecting and measuring the ratio of the top diameter to the bottom diameter of a hole, which are typified in 3D-NAND processes of opening a hole, a primary electron beam accelerated at a high accelerating voltage is applied to a sample. Backscattered electrons (BSEs) at a low angle (e.g. a zenith angle of five degrees or more) are detected. Thus, the bottom of a hole is observed using “penetrating BSEs” having been emitted from the bottom of the hole and penetrated the side wall. Using the characteristics in which a penetrating distance is relatively prolonged through a deep hole and the amount of penetrating BSEs is decreased to cause a dark image, a calibration curve expressing the relationship between a hole depth and the brightness is given to measure the hole depth.

Abstract translation: 为了允许检测从孔的底部产生的背散射电子（BSE），用于确定是否打开具有超高纵横比的孔，或者用于检查和测量孔的顶部直径与底部直径的比， 以3D-NAND打开孔的方式为代表，以高加速电压加速的一次电子束被施加到样品。 检测到低角度（例如五度以上的天顶角）的背散射电子（BSE）。 因此，使用从孔的底部排出并穿透侧壁的“穿透BSE”来观察孔的底部。 利用穿透深度相对延长穿过深孔的特性，并减少穿透性BSE的量使黑暗的图像表现出孔深与亮度之间的关系的校准曲线来测量孔深度。

公开(公告)号：US20160343540A1

公开(公告)日：2016-11-24

申请号：US15115073

申请日：2014-12-03

Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION

Inventor： Kenji NAKAHIRA ,  Maki TANAKA

IPC: H01J37/22 ,  H01J37/28

CPC classification number: H01J37/222 ,  H01J37/22 ,  H01J37/28 ,  H01J2237/221 ,  H01J2237/2809

Abstract: A scanning charged particle microscope apparatus includes image quality improvement unit which performs an image quality improvement process on image data which is obtained by detecting particles generated from a sample, the image quality improvement unit divides a region in which the image data is acquired into two or more regions on the basis of a distance from a region in which the image data within a visual field of a charged particle optical unit is not acquired, determines an image quality improvement processing method and a processing parameter for image quality improvement for the image data in each of the separate regions according to the separate regions; and performs an image quality improvement process on the image data in each of the separate regions by using the determined processing method and processing parameter corresponding to the separate region.

Abstract translation: 扫描带电粒子显微镜装置包括图像质量改善单元，其对通过检测从样本产生的粒子获得的图像数据进行图像质量改善处理，图像质量改善单元将获取图像数据的区域划分为两个或 基于距离未获取带电粒子光学单元的视野内的图像数据的区域的距离的更多区域确定图像质量改进处理方法和用于图像数据的图像质量改进的处理参数 每个独立区域根据分开的区域; 并且通过使用所确定的处理方法和对应于该分离区域的处理参数，对每个分离区域中的图像数据执行图像质量改进处理。