公开(公告)号：US20170102338A1

公开(公告)日：2017-04-13

申请号：US15299662

申请日：2016-10-21

Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION

Inventor： Yukihiro SHIBATA ,  Kei SHIMURA ,  Sachio UTO ,  Toshifumi HONDA

IPC: G01N21/88 ,  G01N21/95 ,  G01N21/958 ,  G01N21/956 ,  G01N21/94

CPC classification number: G01N21/8806 ,  G01N21/8851 ,  G01N21/94 ,  G01N21/9501 ,  G01N21/956 ,  G01N21/958 ,  G01N2021/8822 ,  G01N2021/8848 ,  G01N2201/06113 ,  G01N2201/068 ,  G01N2201/0697 ,  G01N2201/12 ,  G03F7/7065

Abstract: To increase the illumination efficiency by facilitating the change of the incident angle of illumination light with a narrow illumination width according to an inspection object and enabling an illumination region to be effectively irradiated with light, provided is a defect inspection method for obliquely irradiating a sample mounted on a table that is moving continuously in one direction with illumination light, collecting scattered light from the sample obliquely irradiated with the illumination light, detecting an image of the surface of the sample formed by the scattered light, processing a signal obtained by detecting the image formed by the scattered light, and extracting a defect candidate, wherein the oblique irradiation of the light is implemented by linearly collecting light emitted from a light source, and obliquely projecting the collected light onto the surface of the sample, thereby illuminating a linear region on the surface of the sample.

公开(公告)号：US20130269126A1

公开(公告)日：2013-10-17

申请号：US13915161

申请日：2013-06-11

Applicant: Hitachi High-Technologies Corporation

Inventor： Sachio UTO ,  Hidetoshi NISHIYAMA ,  Minori NOGUCHI

IPC: B08B6/00

CPC classification number: H01L21/02334 ,  B08B6/00 ,  G01B11/0625 ,  G01B11/303 ,  G01N3/04 ,  G01N21/15 ,  G01N21/94 ,  G01N21/9501 ,  G01N21/95623 ,  G01N2021/9563 ,  H01L21/02057 ,  H01L21/02082

Abstract: An aspect of the invention provides a defect inspection apparatus being able to accurately inspect a micro foreign matter or defect at a high speed for an inspection target substrate in which a repetitive pattern and a non-repetitive pattern are mixed.In a foreign matter anti-adhesive means 180, a transparent plate 187 is placed on a placement table 34 through a frame 185. In the foreign matter anti-adhesive means 180, a shaft 181 which is rotatably supported by two columnar supports 184 fixed onto a base 186 is coupled to a motor 182 by a coupling 183. The shaft 181 is inserted into a part of a frame 185 between the two columnar supports 184 such that the frame 185 and the transparent plate 187 are turnable about the shaft 181. Therefore, the whole of the frame 185 is opened and closed in a Z-direction about the shaft 181, and a wafer 1 on the placement table 34 can be covered with the frame 185 and the transparent plate 187.