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1.发明申请公开(公告)号：US20170250054A1
公开(公告)日：2017-08-31
申请号：US15440327
申请日：2017-02-23
CPC分类号： H01J37/20 , H01J37/16 , H01J37/261 , H01J2237/0216
摘要： There is proposed a column supporting structure that includes a viscoelastic sheet, a supporting plate which holds the viscoelastic sheet, and a fixation portion which connects the supporting plate to each lens barrel. The viscoelastic sheet is disposed to extend in a plane perpendicular to one lens barrel or the other lens barrel.
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公开(公告)号：US20130167665A1
公开(公告)日：2013-07-04
申请号：US13730568
申请日：2012-12-28
IPC分类号： G01N1/28
CPC分类号： G01N1/286 , H01J2237/206 , H01J2237/2817 , H01J2237/31745 , H01L22/12 , H01L23/544 , H01L2223/5442 , H01L2223/54426 , H01L2223/54453 , H01L2924/0002 , H01L2924/00
摘要： Test pieces necessary to conduct a failure analysis of defects discovered with a defect review apparatus are produced with high quality, with excellent reproducibility, in a short period of time, and at low costs. An impression marking apparatus which can be driven in a direction perpendicular to a surface of a semiconductor wafer and is equipped with an impression needle fixed on the leading end of the mechanism is attached to a wafer defect review apparatus. A position to which impression marking is applied is determined on the basis of coordinate information on a defect previously acquired with the wafer defect review apparatus. In addition, the feed rate of the impression marking mechanism in the vertical direction thereof is determined on the basis of height information acquired with a height detection sensor for detecting the height of a wafer surface provided in the wafer defect review apparatus.
摘要翻译： 以缺陷检查装置发现的缺陷进行故障分析所必需的试件在短时间内以低成本生产，质量好，重复性好。 可以在垂直于半导体晶片的表面的方向上驱动并且安装有固定在机构的前端上的印模针的印模标记装置安装在晶片缺陷检查装置上。 基于用晶片缺陷检查装置预先获取的缺陷的坐标信息来确定施加印象标记的位置。 此外，压印标记机构在其垂直方向上的进给速度是基于通过用于检测设置在晶片缺陷检查装置中的晶片表面的高度的高度检测传感器获取的高度信息来确定的。
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