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公开(公告)号：US09976815B1
公开(公告)日：2018-05-22
申请号：US14185665
申请日：2014-02-20
Applicant: HRL LABORATORIES, LLC
Inventor： Christopher S. Roper , David Page , Randall C. Schubert , Christopher J. Ro , Arun Muley , Charles Kusuda
Abstract: A method of manufacturing a heat exchanger including a heat exchanger core of a first material, the method including additive manufacturing a sacrificial scaffold of a second material, the sacrificial scaffold corresponding in shape to that of the heat exchanger core, coating the sacrificial scaffold with a layer of the first material, and removing the sacrificial scaffold to leave behind the heat exchanger core with an integrated self-aligned passage.
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公开(公告)号：US20180238638A1
公开(公告)日：2018-08-23
申请号：US15956476
申请日：2018-04-18
Applicant: HRL LABORATORIES, LLC , The Boeing Company
Inventor： Christopher S. Roper , David Page , Randall C. Schubert , Christopher J. Ro , Arun Muley , Charles Kusuda
CPC classification number: B23P15/26 , B22F3/1055 , B22F3/1121 , B22F7/004 , B22F2003/1058 , B22F2005/004 , B22F2998/10 , B22F2999/00 , B29C64/40 , B29D28/00 , B33Y10/00 , B33Y80/00 , F28D7/08 , F28F2210/02 , B22F7/002 , B22F3/10
Abstract: A method of manufacturing a heat exchanger including a heat exchanger core of a first material, the method including additive manufacturing a sacrificial scaffold of a second material, the sacrificial scaffold corresponding in shape to that of the heat exchanger core, coating the sacrificial scaffold with a layer of the first material, and removing the sacrificial scaffold to leave behind the heat exchanger core with an integrated self-aligned passage.
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Patent Agency Ranking
公开(公告)号：US20160047980A1
公开(公告)日：2016-02-18
申请号：US14461841
申请日：2014-08-18
Applicant: HRL LABORATORIES, LLC
Inventor： David Page , Sophia S. Yang , Alan J. Jacobsen , Zak C. Eckel , Christopher S. Roper , William Carter
CPC classification number: G02B6/1225 , B29C64/129 , B29C64/286 , B29K2096/00 , B33Y10/00 , B33Y30/00 , B33Y80/00 , G02B1/002 , G02B6/138 , G02B2006/12173 , G03F7/0037 , G03F7/2012 , G03F7/70416
Abstract: A system and method for forming microlattice structures of large thickness. In one embodiment, a photomonomer resin is secured in a mold having a transparent bottom, the interior surface of which is coated with a mold-release agent. A substrate is placed in contact with the top surface of the photomonomer resin. The photomonomer resin is illuminated from below by one or more sources of collimated light, through a photomask, causing polymer waveguides to form, extending up to the substrate, forming a microlattice structure connected with the substrate. After a layer of microlattice structure has formed, the substrate is raised using a translation-rotation system, additional photomonomer resin is added to the mold, and the photomonomer resin is again illuminated through the photomask, to form an additional layer of microlattice structure. The process is repeated multiple times to form a stacked microlattice structure.
Abstract translation: 一种用于形成大厚度的微晶格结构的系统和方法。 在一个实施方案中，将光单体树脂固定在具有透明底部的模具中，其内表面涂覆有脱模剂。 将基底放置成与光单体树脂的顶表面接触。 通过一个或多个准直光源通过光掩模从下面照射光单体树脂，导致聚合物波导形成，延伸到衬底，形成与衬底连接的微晶格结构。 在形成一层微晶格结构之后，使用平移 - 旋转系统升高基板，向模具中加入额外的光单体树脂，并且通过光掩模再次照射光单体树脂，以形成附加的微格子结构层。 该过程重复多次以形成堆叠的微格子结构。
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公开(公告)号：US11806956B1
公开(公告)日：2023-11-07
申请号：US17372186
申请日：2021-07-09
Applicant: HRL LABORATORIES, LLC
Inventor： Jacob M. Hundley , Eric C. Clough , Zak C. Eckel , David Page , Sophia S. Yang
CPC classification number: B29C73/10 , B23P6/00 , B29C73/02 , B29C73/06 , B64F5/40 , B29L2007/002 , B32B3/12 , B32B2605/18 , B64C2001/0072 , F05D2230/80
Abstract: A method of repairing a sandwich structure includes: removing a damaged portion of a core and a damaged portion of a first facesheet to form an open volume; filling the open volume with an ultraviolet-curable photomonomer; partially curing the ultraviolet-curable photomonomer to form a plurality of photopolymer waveguides by utilizing ultraviolet light; and arranging a replacement facesheet on the damaged portion of the first facesheet and over the photopolymer waveguides.
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公开(公告)号：US11148375B1
公开(公告)日：2021-10-19
申请号：US16654840
申请日：2019-10-16
Applicant: HRL LABORATORIES, LLC
Inventor： Jacob M. Hundley , Eric C. Clough , Zak C. Eckel , David Page , Sophia S. Yang
Abstract: A method of repairing a sandwich structure includes: removing a damaged portion of a core and a damaged portion of a first facesheet to form an open volume; filling the open volume with an ultraviolet-curable photomonomer; partially curing the ultraviolet-curable photomonomer to form a plurality of photopolymer waveguides by utilizing ultraviolet light; and arranging a replacement facesheet on the damaged portion of the first facesheet and over the photopolymer waveguides.
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公开(公告)号：US10946600B1
公开(公告)日：2021-03-16
申请号：US15690229
申请日：2017-08-29
Applicant: HRL Laboratories, LLC
Inventor： Jacob M. Hundley , Eric C. Clough , Zak C. Eckel , David Page , Sophia S. Yang
IPC: B29C73/02 , B29C73/10 , B29C73/24 , B29K105/04 , B29L31/60
Abstract: A method for repairing a composite structure. A damaged portion of a first facesheet of the structure is removed, forming a hole in the first facesheet. A damaged portion of the underlying core is removed to form a cavity in the sandwich. If the second facesheet is damaged, the damaged section is removed, and covered and sealed with a facesheet repair section. If the core material is an open-cell material, a dam is formed around the perimeter of the cavity, to act as a barrier between the cavity and the core material. The cavity is at least partially filled with a photomonomer resin, which then is illuminated through a mask with collimated light to form a truss structure in the cavity. Residual photomonomer resin is removed, and a facesheet repair section is bonded over the hole in the first facesheet.
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公开(公告)号：US09733429B2
公开(公告)日：2017-08-15
申请号：US14461841
申请日：2014-08-18
Applicant: HRL LABORATORIES, LLC
Inventor： David Page , Sophia S. Yang , Alan J. Jacobsen , Zak C. Eckel , Christopher S. Roper , William Carter
CPC classification number: G02B6/1225 , B29C64/129 , B29C64/286 , B29K2096/00 , B33Y10/00 , B33Y30/00 , B33Y80/00 , G02B1/002 , G02B6/138 , G02B2006/12173 , G03F7/0037 , G03F7/2012 , G03F7/70416
Abstract: A system and method for forming microlattice structures of large thickness. In one embodiment, a photomonomer resin is secured in a mold having a transparent bottom, the interior surface of which is coated with a mold-release agent. A substrate is placed in contact with the top surface of the photomonomer resin. The photomonomer resin is illuminated from below by one or more sources of collimated light, through a photomask, causing polymer waveguides to form, extending up to the substrate, forming a microlattice structure connected with the substrate. After a layer of microlattice structure has formed, the substrate is raised using a translation-rotation system, additional photomonomer resin is added to the mold, and the photomonomer resin is again illuminated through the photomask, to form an additional layer of microlattice structure. The process is repeated multiple times to form a stacked microlattice structure.
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