摘要:
A semiconductor element with under bump metallurgy (UBM) structures and a fabrication method thereof are proposed. When UBM structures are formed on signal pads and ground pads on a surface of the semiconductor element that is completely fabricated with a circuit layout, a metallic layer for defining the UBM structures is retained, wherein the UBM structures on the ground pads are electrically connected to the metallic layer, and the UBM structures on the signal pads are electrically insulated from the metallic layer. This allows the metallic layer for defining the UBM structures to directly serve as a grounding layer for the semiconductor element.