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    LITHOGRAPHIC APPARATUS AND PATTERNING DEVICE
    6.
    发明申请
    LITHOGRAPHIC APPARATUS AND PATTERNING DEVICE 有权
    平面设备和图案设备

    公开(公告)号：US20110096311A1

    公开(公告)日：2011-04-28

    申请号：US12913539

    申请日：2010-10-27

    申请人： Hans BUTLER ,  Erik Roelof Loopstra

    发明人： Hans BUTLER ,  Erik Roelof Loopstra

    IPC分类号： G03B27/42

    CPC分类号： G03F7/7085 ,  G03F7/70358 ,  G03F7/70516

    摘要： A lithographic apparatus includes a support to support a patterning device, the patterning device being capable of imparting a radiation beam with a pattern in its cross-section to form a patterned radiation beam, a substrate table constructed to hold a substrate, and a projection system configured to project the patterned radiation beam onto a target portion of the substrate. The lithographic apparatus includes a projection transfer measurement system to measure an optical projection transfer information of the projection system. The projection transfer measurement arrangement includes: an optical device to direct a measurement beam into the projection system during a scanning movement, a detector to detect the measurement beam having passed through the projection system during the scanning movement, and a measurement processor to determine the optical projection transfer information from the detected measurement beam. The optical device and the detector are arranged at an upstream end of the projection system.

    摘要翻译： 光刻设备包括支撑件以支撑图案形成装置，图案形成装置能够在其横截面中赋予具有图案的辐射束以形成图案化的辐射束，构造成保持衬底的衬底台和投影系统 被配置为将所述图案化的辐射束投影到所述基板的目标部分上。 光刻设备包括用于测量投影系统的光学投影传递信息的投影传递测量系统。 投影传送测量装置包括：在扫描运动期间将测量光束引导到投影系统中的光学装置，用于检测在扫描运动期间通过投影系统的测量光束的检测器，以及用于确定光学器件的测量处理器 来自检测的测量光束的投影传送信息。 光学装置和检测器布置在投影系统的上游端。

    LITHOGRAPHIC APPARATUS HAVING AN ACTIVE DAMPING SUBASSEMBLY
    10.
    发明申请
    LITHOGRAPHIC APPARATUS HAVING AN ACTIVE DAMPING SUBASSEMBLY 失效
    具有主动阻尼分层的平面设备

    公开(公告)号：US20090122284A1

    公开(公告)日：2009-05-14

    申请号：US12249399

    申请日：2008-10-10

    申请人： Hans Butler ,  Erik Roelof Loopstra ,  Marc Wilhelmus Maria Van Der Wijst ,  Joost De Pee ,  Cornelius Adrianus Lambertus De Hoon ,  Stijn Boschker

    发明人： Hans Butler ,  Erik Roelof Loopstra ,  Marc Wilhelmus Maria Van Der Wijst ,  Joost De Pee ,  Cornelius Adrianus Lambertus De Hoon ,  Stijn Boschker

    IPC分类号： G03B27/42 ,  F16F7/10

    CPC分类号： G03F7/709 ,  G03F7/70883

    摘要： A lithographic apparatus includes a projection system to project a patterned radiation beam onto a substrate, and a damping system to dampen a vibration of at least part of the projection system, the damping system including an interface damping mass and an active damping subsystem to dampen a vibration of at least part of the interface damping mass, the interface damping mass connected to the projection system, and the active damping subsystem connected to the interface damping mass, the active damping subsystem including a sensor to measure a position quantity of the interface damping mass and an actuator to exert a force on the interface damping mass based on a signal provided by the sensor. The damping system further includes an interface damping device connected to the interface damping mass and configured to damp a movement of the interface damping mass at an eigenfrequency of the interface damping mass.

    摘要翻译： 光刻设备包括将图案化的辐射束投影到衬底上的投影系统和用于抑制至少部分投影系统的振动的阻尼系统，所述阻尼系统包括界面阻尼块和主动阻尼子系统，以阻尼 界面阻尼块的至少一部分的振动，连接到投影系统的界面阻尼质量以及连接到界面阻尼块的主动阻尼子系统，主动阻尼子系统包括测量接口阻尼块的位置量的传感器 以及致动器，其基于由传感器提供的信号对接口阻尼质量施加力。 阻尼系统还包括连接到界面阻尼块的接口阻尼装置，并且被配置为在接口阻尼块的本征频率处阻尼接口阻尼块的运动。