公开(公告)号：US20110183257A1

公开(公告)日：2011-07-28

申请号：US13083327

申请日：2011-04-08

申请人： Hans JANSEN ,  Sebastiaan Maria Johannes CORNELISSEN ,  Sjoerd Nicolaas Lambertus DONDERS ,  Roelof Frederik DE GRAAF ,  Christiaan Alexander HOOGENDAM ,  Hernes JACOBS ,  Martinus Hendrikus Antonius LEENDERS ,  Jeroen Johannes Sophia Maria MERTENS ,  Bob STREEFKERK ,  Jan-Gerard Cornelis VAN DER TOORN ,  Peter SMITS ,  Franciscus Johannes Joseph JANSSEN ,  Michel RIEPEN

发明人： Hans JANSEN ,  Sebastiaan Maria Johannes CORNELISSEN ,  Sjoerd Nicolaas Lambertus DONDERS ,  Roelof Frederik DE GRAAF ,  Christiaan Alexander HOOGENDAM ,  Hernes JACOBS ,  Martinus Hendrikus Antonius LEENDERS ,  Jeroen Johannes Sophia Maria MERTENS ,  Bob STREEFKERK ,  Jan-Gerard Cornelis VAN DER TOORN ,  Peter SMITS ,  Franciscus Johannes Joseph JANSSEN ,  Michel RIEPEN

IPC分类号： G03F7/20

CPC分类号： G03F7/70341 ,  G03F7/707

摘要： In an immersion lithographic apparatus, bubble formation in immersion liquid is reduced or prevented by reducing a gap size or area on a substrate table and/or covering the gap.

摘要翻译： 在浸没式光刻设备中，通过减小衬底台上的间隙尺寸或面积和/或覆盖间隙来降低或防止浸没液中的气泡形成。

公开(公告)号：US20130070219A1

公开(公告)日：2013-03-21

申请号：US13589841

申请日：2012-08-20

申请人： Bob STREEFKERK ,  Sjoerd Nicolaas Lambertus DONDERS ,  Roelof Frederik DE GRAAF ,  Christiaan Alexander HOOGENDAM ,  Hans JANSEN ,  Martinus Hendrikus Antonius LEENDERS ,  Paulus Martinus Maria LIEBREGTS ,  Jeroen Johannes Sophia Maria MERTENS ,  Jan-Gerard Cornelis VAN DER TOORN ,  Michel RIEPEN

发明人： Bob STREEFKERK ,  Sjoerd Nicolaas Lambertus DONDERS ,  Roelof Frederik DE GRAAF ,  Christiaan Alexander HOOGENDAM ,  Hans JANSEN ,  Martinus Hendrikus Antonius LEENDERS ,  Paulus Martinus Maria LIEBREGTS ,  Jeroen Johannes Sophia Maria MERTENS ,  Jan-Gerard Cornelis VAN DER TOORN ,  Michel RIEPEN

IPC分类号： G03B27/52 ,  G03B27/58

CPC分类号： G03F7/2041 ,  G03F7/3085 ,  G03F7/70058 ,  G03F7/70341 ,  G03F7/70825 ,  G03F7/70875 ,  G03F7/70916 ,  G03F2007/2067 ,  H01L21/0274 ,  H01L21/67098

摘要： An immersion lithographic apparatus is provided with a liquid confinement structure which defines at least in part a space configured to contain liquid between the projection system and the substrate. In order to reduce the crossing of the edge of the substrate which is being imaged (which can lead to inclusion of bubbles in the immersion liquid), the cross-sectional area of the space in a plane parallel to the substrate is made as small as possible. The smallest theoretical size is the size of the target portion which is imaged by the projection system. In an embodiment, the shape of a final element of the projection system is also changed to have a similar size and/or shape in a cross-section parallel to the substrate to that of the target portion.

摘要翻译： 浸没式光刻设备设置有液体限制结构，其限定至少部分地被配置为在投影系统和衬底之间容纳液体的空间。 为了减少正在成像的衬底的边缘（其可能导致在浸没液体中包含气泡）的交叉，使得平行于衬底的平面中的空间的横截面积小至 可能。 最小的理论尺寸是由投影系统成像的目标部分的尺寸。 在一个实施例中，投影系统的最终元件的形状也被改变为在平行于基底的截面与目标部分的横截面上具有相似的尺寸和/或形状。

公开(公告)号：US20120242271A1

公开(公告)日：2012-09-27

申请号：US13403706

申请日：2012-02-23

申请人： Jan-Gerard Cornelis VAN DER TOORN ,  Marcel Koenraad Marie BAGGEN ,  Stefan Geerte KRUIJSWIJK ,  Jeroen Pieter STARREVELD ,  Michael Johannes Vervoordeldonk ,  Mark Constant Johannes BAGGEN

发明人： Jan-Gerard Cornelis VAN DER TOORN ,  Marcel Koenraad Marie BAGGEN ,  Stefan Geerte KRUIJSWIJK ,  Jeroen Pieter STARREVELD ,  Michael Johannes Vervoordeldonk ,  Mark Constant Johannes BAGGEN

IPC分类号： G05B13/02 ,  H02K41/02

CPC分类号： G03F7/70716 ,  G03F7/709

摘要： A stage system includes an object table constructed to hold an object, a short stroke actuator element constructed to displace the object table over a first range of movement, and a long stroke actuator element constructed to displace the short stroke actuator element over a second range of movement which is larger than the first range of movement. The stage system further includes a pneumatic compensation device including: a sensor arranged to measure a quantity representative of a pneumatic disturbance force on the short stroke actuator element, an actuator arranged to provide a compensating force to at least partly compensate the pneumatic disturbance, and a controller. The sensor is connected to a controller input of the controller, the actuator is connected to a controller output of the controller, the controller being arranged to drive the actuator in response to a signal received from the sensor.

摘要翻译： 舞台系统包括构造成保持物体的物体表，构造成在第一运动范围上移动物体台的短行程致动器元件，以及长行程致动器元件，构造成在短行程致动器元件的第二范围 大于第一运动范围的运动。 舞台系统还包括气动补偿装置，其包括：传感器，布置成测量代表短行程致动器元件上的气动扰动力的量;致动器，被布置成提供补偿力以至少部分地补偿气动扰动;以及 控制器。 传感器连接到控制器的控制器输入端，致动器连接到控制器的控制器输出端，该控制器被布置成响应于从传感器接收到的信号来驱动致动器。