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公开(公告)号：US20060170896A1
公开(公告)日：2006-08-03
申请号：US11341381
申请日：2006-01-30
IPC分类号： G03B27/54
CPC分类号： G03F7/70408
摘要： A lithographic projection apparatus includes an illumination system, an interchangeable upper optics module, and a lower optics module. The illumination system provides a beam of radiation. The interchangeable upper optics module receives the beam and includes, sequentially, a beam splitter that splits the beam into portions, an aperture plate, and a plurality of reflecting surfaces. The lower optics module receives portions of the beam from respective ones the reflecting surfaces and directs the portions of the beam onto a substrate. Interference fringes or contact hole patterns are formed on the substrate using the portions of the beam.
摘要翻译： 光刻投影设备包括照明系统，可互换的上部光学模块和下部光学模块。 照明系统提供辐射束。 可互换的上光学模块接收光束，并且依次包括将光束分成多个部分的光束分离器，孔板和多个反射表面。 下部光学模块从相应的反射表面接收光束的部分并将光束的部分引导到衬底上。 使用梁的部分在基板上形成干涉条纹或接触孔图案。
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2.发明申请公开(公告)号：US20080137044A1
公开(公告)日：2008-06-12
申请号：US11634924
申请日：2006-12-07
申请人： Harry Sewell , Louis Markoya , Diane McCafferty
发明人： Harry Sewell , Louis Markoya , Diane McCafferty
IPC分类号： G03B27/52
CPC分类号： G03B27/72 , G03F7/70258 , G03F7/70341 , G03F7/7085 , G03F7/70858
摘要： Immersion lithography aberration control systems and methods that compensate for a heating effect of exposure energy in an immersion fluid across an exposure zone are provided. An aberration control system includes actuators that adjust optical elements within the immersion lithography system and a fluid heating compensation module coupled to the actuators. The fluid heating adjustment module determines actuator commands to make aberration adjustments to optical elements within the immersion lithography system based on changes in one or more of a flow rate of the immersion liquid, an exposure dose and a reticle pattern image. In an embodiment, the aberration control system includes an interferometric sensor that pre-calibrates aberrations based on changes in operating characteristics related to the immersion fluid. Methods are provided that calibrate aberrations, determine actuator adjustments and implement actuator adjustments upon changes in operating characteristics to control aberration effects.
摘要翻译： 提供了浸没光刻像差控制系统和补偿曝光区域中浸没流体中曝光能量的加热效应的方法。 像差控制系统包括调节浸没式光刻系统内的光学元件的致动器和耦合到致动器的流体加热补偿模块。 流体加热调节模块基于浸入液体的流速，曝光剂量和掩模版图案图像中的一个或多个的变化来确定致动器命令以对浸没式光刻系统内的光学元件进行像差调整。 在一个实施例中，像差控制系统包括干涉测量传感器，其基于与浸没流体相关的操作特性的变化来预校准像差。 提供校准像差的方法，确定致动器调节并且在操作特性的变化中实施致动器调节以控制像差效应。
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公开(公告)号：US07492442B2
公开(公告)日：2009-02-17
申请号：US10927309
申请日：2004-08-27
CPC分类号： G03F7/70408 , G03F7/70341 , G03F7/7035 , G03F7/70383 , G03F7/70516
摘要： A lithographic system includes a laser outputting a laser beam; a beamsplitter dividing the laser beam into a plurality of beams; and a prism for forming interference fringes on a substrate using the plurality of beams. Resolution of the lithographic system is adjustable without replacing any optical components in an optical path of the lithographic system. The beamsplitter is movable along the optical path to adjust the resolution. The prism includes a plurality of sets of facets, each set of facets corresponding to a particular resolution. Each set of facets corresponds to a particular beamsplitter position along the optical path, and/or to a particular resolution. The beamsplitter includes a linear grating or a checkerboard grating. The beams are N-way symmetric. The resolution is adjustable. A numerical aperture of the system is adjustable by moving the beamsplitter along the optical path. A liquid can be between the substrate and the prism.
摘要翻译： 光刻系统包括输出激光束的激光; 分束器将激光束分成多个光束; 以及用于使用所述多个光束在基板上形成干涉条纹的棱镜。 光刻系统的分辨率是可调节的，而不替代光刻系统的光路中的任何光学部件。 分束器可沿着光路移动以调节分辨率。 棱镜包括多组小平面，每组面对应于特定分辨率。 每组小平面对应于沿着光路的特定分束器位置和/或特定分辨率。 分束器包括线性光栅或棋盘格栅。 梁是N路对称的。 分辨率可调。 通过沿着光路移动分束器来调节系统的数值孔径。 液体可以在基板和棱镜之间。
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公开(公告)号：US07253879B2
公开(公告)日：2007-08-07
申请号：US11586639
申请日：2006-10-26
CPC分类号： G03F7/70341
摘要： A liquid immersion lithography system including a projection optical system for directing electromagnetic radiation onto a substrate, and a showerhead for delivering liquid flow between the projection optical system and the substrate. The showerhead includes an injection nozzle and a retrieval nozzle located at different heights. The liquid flow is tilted relative to the substrate. A direction from the injection nozzle to the retrieval nozzle is tilted at approximately 1 to 2 degrees relative to the substrate.
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5.发明申请Liquid immersion lithography system having a tilted showerhead relative to a substrate 有权液浸光刻系统相对于基底具有倾斜的喷头公开(公告)号：US20060238721A1
公开(公告)日：2006-10-26
申请号：US11403196
申请日：2006-04-13
IPC分类号： G03B21/18
CPC分类号： G03F7/70341
摘要： A liquid immersion lithography system includes projection optics and a showerhead. The projection optics are configured to expose a substrate with a patterned beam. The showerhead includes a first nozzle and a second nozzle that are configured to be at different distances from a surface of the substrate during an exposure operation.
摘要翻译： 液浸光刻系统包括投影光学元件和喷头。 投影光学器件被配置为用图案化的光束曝光衬底。 喷头包括第一喷嘴和第二喷嘴，其被配置为在曝光操作期间与基板的表面不同的距离。
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公开(公告)号：US07751030B2
公开(公告)日：2010-07-06
申请号：US11341381
申请日：2006-01-30
IPC分类号： G03B27/54
CPC分类号： G03F7/70408
摘要： A lithographic projection apparatus includes an illumination system, an interchangeable upper optics module, and a lower optics module. The illumination system provides a beam of radiation. The interchangeable upper optics module receives the beam and includes, sequentially, a beam splitter that splits the beam into portions, an aperture plate, and a plurality of reflecting surfaces. The lower optics module receives portions of the beam from respective ones the reflecting surfaces and directs the portions of the beam onto a substrate. Interference fringes or contact hole patterns are formed on the substrate using the portions of the beam.
摘要翻译： 光刻投影设备包括照明系统，可互换的上部光学模块和下部光学模块。 照明系统提供辐射束。 可互换的上光学模块接收光束，并且依次包括将光束分成多个部分的光束分离器，孔板和多个反射表面。 下部光学模块从相应的反射表面接收光束的部分并将光束的部分引导到衬底上。 使用梁的部分在基板上形成干涉条纹或接触孔图案。
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公开(公告)号：US20070070321A1
公开(公告)日：2007-03-29
申请号：US11561238
申请日：2006-11-17
IPC分类号： G03B27/54
CPC分类号： G03F7/70408 , G03F7/70341 , G03F7/7035 , G03F7/70383 , G03F7/70516
摘要： A lithographic system includes a source of a laser beam; a beamsplitter dividing the laser beam into a plurality of beams; and a plurality of reflecting surfaces that forms interference fringes on a substrate using the plurality of beams. Resolution of the lithographic system is adjustable by adjusting angular orientation of the reflecting surfaces. The beamsplitter is movable along the optical path to adjust the resolution. The reflecting surfaces may be facets of a prism. Each reflecting surface corresponds to a particular beamsplitter position along the optical path, and/or to a particular resolution. The beamsplitter includes a linear grating or a checkerboard grating. The beams are N-way symmetric. A numerical aperture of the system is adjustable by moving the beamsplitter along the optical path. A liquid can be between the substrate and the prism.
摘要翻译： 光刻系统包括激光束源; 分束器将激光束分成多个光束; 以及多个反射表面，其使用所述多个光束在基板上形成干涉条纹。 光刻系统的分辨率可通过调整反射表面的角度方向来调节。 分束器可沿着光路移动以调节分辨率。 反射面可以是棱镜的面。 每个反射表面对应于沿着光路的特定分束器位置和/或特定分辨率。 分束器包括线性光栅或棋盘格栅。 梁是N路对称的。 通过沿着光路移动分束器来调节系统的数值孔径。 液体可以在基板和棱镜之间。
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公开(公告)号：US06967713B2
公开(公告)日：2005-11-22
申请号：US10939328
申请日：2004-09-14
CPC分类号： G03F7/70516 , G03F7/70283 , G03F7/70358 , G03F7/70466 , G03F7/70733
摘要： A reticle stage having a range of motion sufficient to scan at least two distinct reticles. In a photolithographic process, a reticle stage having an extended range of motion and containing at least two reticles, preferably a phase shift reticle and a trim reticle, is used. The reticle stage scans the two reticles across an illumination field. The image of each reticle is projected by projection optics onto a photosensitive substrate on a wafer stage. The field on the photosensitive substrate is exposed with the image of the first reticle and subsequently exposed with the image of the second reticle. The projection of an image of a first and second reticle onto the same field in a scanning operation greatly facilitates throughput of the photolithographic tool or device. Reticle changes are eliminated when at least two reticles are needed to expose a single field. The use of multiple reticles to expose a single field is necessary when a phase shift mask and related trim mask are used. In another embodiment, the reticle stage has a range of motion permitting scanning of an additional calibration reticle. This permits rapid real time system calibration.
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公开(公告)号：US20050030514A1
公开(公告)日：2005-02-10
申请号：US10939328
申请日：2004-09-14
IPC分类号： G03F7/22 , G03F7/20 , H01L21/027 , G03B27/32
CPC分类号： G03F7/70516 , G03F7/70283 , G03F7/70358 , G03F7/70466 , G03F7/70733
摘要： A reticle stage having a range of motion sufficient to scan at least two distinct reticles. In a photolithographic process, a reticle stage having an extended range of motion and containing at least two reticles, preferably a phase shift reticle and a trim reticle, is used. The reticle stage scans the two reticles across an illumination field. The image of each reticle is projected by projection optics onto a photosensitive substrate on a wafer stage. The field on the photosensitive substrate is exposed with the image of the first reticle and subsequently exposed with the image of the second reticle. The projection of an image of a first and second reticle onto the same field in a scanning operation greatly facilitates throughput of the photolithographic tool or device. Reticle changes are eliminated when at least two reticles are needed to expose a single field. The use of multiple reticles to expose a single field is necessary when a phase shift mask and related trim mask are used. In another embodiment, the reticle stage has a range of motion permitting scanning of an additional calibration reticle. This permits rapid real time system calibration.
摘要翻译： 具有足以扫描至少两个不同掩模版的运动范围的光罩台。 在光刻工艺中，使用具有延伸的运动范围并且包含至少两个掩模版，优选相移掩模版和修剪掩模版的掩模版平台。 标线台通过照明场扫描两个标线。 每个掩模版的图像通过投影光学器件投射到晶片台上的感光基片上。 感光基板上的场用第一掩模版的图像曝光，随后用第二掩模版的图像曝光。 在扫描操作中将第一和第二掩模版的图像投射到相同的场上极大地促进了光刻工具或装置的生产量。 当需要至少两个掩模版以暴露单个场时，掩模版改变被消除。 当使用相移掩模和相关的修剪掩模时，需要使用多个掩模版来暴露单个场。 在另一个实施例中，标线片台具有允许扫描附加校准掩模版的运动范围。 这允许快速的实时系统校准。
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公开(公告)号：US06628372B2
公开(公告)日：2003-09-30
申请号：US09785777
申请日：2001-02-16
IPC分类号： G03B2762
CPC分类号： G03F7/70516 , G03F7/70283 , G03F7/70358 , G03F7/70466 , G03F7/70733
摘要： A reticle stage having a range of motion sufficient to scan at least two distinct reticles. In a photolithographic process, a reticle stage having an extended range of motion and containing at least two reticles, preferably a phase shift reticle and a trim reticle, is used. The reticle stage scans the two reticles across an illumination field. The image of each reticle is projected by projection optics onto a photosensitive substrate on a wafer stage. The field on the photosensitive substrate is exposed with the image of the first reticle and subsequently exposed with the image of the second reticle. The projection of an image of a first and second reticle onto the same field in a scanning operation greatly facilitates throughput of the photolithographic tool or device. Reticle changes are eliminated when at least two reticles are needed to expose a single field. The use of multiple reticles to expose a single field is necessary when a phase shift mask and related trim mask are used. In another embodiment, the reticle stage has a range of motion permitting scanning of an additional calibration reticle. This permits rapid real time system calibration.
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