公开(公告)号：US20080285224A1

公开(公告)日：2008-11-20

申请号：US12115826

申请日：2008-05-06

申请人： Satoshi Odanaka ,  Hayato Watanabe

发明人： Satoshi Odanaka ,  Hayato Watanabe

IPC分类号： H05K7/20 ,  H05K7/02 ,  A47B81/00

CPC分类号： G06F1/20

摘要： An information processing apparatus having improved cooling efficiency is disclosed. The information processing apparatus includes a first chassis and a second chassis separated from each other at a prescribed distance, the first chassis accommodating a substrate on which high heat generating parts such as a CPU and a chipset are mounted, and the second chassis accommodating low heat generating and low heat resistance parts. Because of this structure, the first chassis and the second chassis are thermally isolated, and the surface area of the apparatus is increased, thereby improving the cooling efficiency of the apparatus.

摘要翻译： 公开了一种具有改善的冷却效率的信息处理设备。 信息处理装置包括以规定距离彼此分离的第一机架和第二机架，第一机架容纳基板，其上安装有诸如CPU和芯片组的高发热部件，并且第二机架容纳低热量 产生和低耐热部件。 由于这种结构，第一机箱和第二机架是热隔离的，并且设备的表面积增加，从而提高了设备​​的冷却效率。

公开(公告)号：US07961471B2

公开(公告)日：2011-06-14

申请号：US12115826

申请日：2008-05-06

申请人： Satoshi Odanaka ,  Hayato Watanabe

发明人： Satoshi Odanaka ,  Hayato Watanabe

IPC分类号： H05K7/20 ,  F28F7/00 ,  H01L23/34

CPC分类号： G06F1/20

摘要： An information processing apparatus having improved cooling efficiency is disclosed. The information processing apparatus includes a first chassis and a second chassis separated from each other at a prescribed distance, the first chassis accommodating a substrate on which high heat generating parts such as a CPU and a chipset are mounted, and the second chassis accommodating low heat generating and low heat resistance parts. Because of this structure, the first chassis and the second chassis are thermally isolated, and the surface area of the apparatus is increased, thereby improving the cooling efficiency of the apparatus.

摘要翻译： 公开了一种具有改善的冷却效率的信息处理设备。 信息处理装置包括以规定距离彼此分离的第一机架和第二机架，第一机架容纳基板，其上安装有诸如CPU和芯片组的高发热部件，并且第二机架容纳低热量 产生和低耐热部件。 由于这种结构，第一机箱和第二机架是热隔离的，并且设备的表面积增加，从而提高了设备​​的冷却效率。

公开(公告)号：US20080285229A1

公开(公告)日：2008-11-20

申请号：US12108103

申请日：2008-04-23

申请人： Hayato Watanabe ,  Satoshi Odanaka

发明人： Hayato Watanabe ,  Satoshi Odanaka

IPC分类号： H05K7/20

CPC分类号： G06F1/20 ,  H01L23/3672 ,  H01L23/4093 ,  H01L2924/0002 ,  H01L2924/00

摘要： A heat dissipating member, a heat dissipating mechanism, and an information processing apparatus capable of improving the cooling efficiency without increasing the size of the apparatus are disclosed. In the information processing apparatus, it becomes possible to effectively transfer heat from a unit such as a memory disposed in an inner space of the apparatus to the outside regardless of the layout position of the unit by using the heat dissipating mechanism fixed to a unit and a heat dissipation surface so that the heat is transferred from the unit to the heat dissipation surface.

摘要翻译： 公开了一种散热构件，散热机构和能够在不增加设备尺寸的情况下提高冷却效率的信息处理装置。 在信息处理装置中，通过使用固定在一个单元上的散热机构，无论该单元的布局位置如何，都可以有效地将热量从设置在设备的内部空间中的存储器的单元传送到外部， 散热表面，使得热量从单元转移到散热表面。

公开(公告)号：US07660114B2

公开(公告)日：2010-02-09

申请号：US12108103

申请日：2008-04-23

申请人： Hayato Watanabe ,  Satoshi Odanaka

发明人： Hayato Watanabe ,  Satoshi Odanaka

IPC分类号： H05K7/20 ,  H01L23/34

CPC分类号： G06F1/20 ,  H01L23/3672 ,  H01L23/4093 ,  H01L2924/0002 ,  H01L2924/00

摘要： A heat dissipating member, a heat dissipating mechanism, and an information processing apparatus capable of improving the cooling efficiency without increasing the size of the apparatus are disclosed. In the information processing apparatus, it becomes possible to effectively transfer heat from a unit such as a memory disposed in an inner space of the apparatus to the outside regardless of the layout position of the unit by using the heat dissipating mechanism fixed to a unit and a heat dissipation surface so that the heat is transferred from the unit to the heat dissipation surface.

摘要翻译： 公开了一种散热构件，散热机构和能够在不增加设备尺寸的情况下提高冷却效率的信息处理装置。 在信息处理装置中，通过使用固定在一个单元上的散热机构，无论该单元的布局位置如何，都可以有效地将热量从设置在设备的内部空间中的存储器的单元传送到外部， 散热表面，使得热量从单元转移到散热表面。

公开(公告)号：USD1023666S1

公开(公告)日：2024-04-23

申请号：US29813192

申请日：2021-10-27

申请人： Hayato Watanabe

设计人： Hayato Watanabe

摘要： FIG. 1 is a front view of the container with ultrafine bubble generation part, the rear being a mirror image of the front;
FIG. 2 is a left side view thereof, the right side being a mirror image of the left side;
FIG. 3 is a top view thereof;
FIG. 4 is a bottom view thereof;
FIG. 5 is a top perspective view thereof;
FIG. 6 is a bottom perspective view thereof;
FIG. 7 is a front view thereof in a disassembled state;
FIG. 8 is a top perspective view thereof in a disassembled state;
FIG. 9 is a top view of the ultrafine bubble generation part;
FIG. 10 is a bottom view of the ultrafine bubble generation part;
FIG. 11 is a top perspective view of the ultrafine bubble generation part; and,
FIG. 12 is a bottom perspective view of the ultrafine bubble generation part.
The broken lines of FIGS. 1-8 illustrate portions of the container with ultrafine bubble generation part that form no part of the claimed design.

公开(公告)号：US09370746B2

公开(公告)日：2016-06-21

申请号：US13608249

申请日：2012-09-10

申请人： Atsuyuki Manabe ,  Hayato Watanabe ,  Yukio Noguchi

发明人： Atsuyuki Manabe ,  Hayato Watanabe ,  Yukio Noguchi

IPC分类号： B01D61/12 ,  C02F1/44 ,  B01D61/02

CPC分类号： B01D61/12 ,  B01D61/025 ,  B01D2311/10 ,  B01D2311/14 ,  B01D2311/16 ,  B01D2311/243 ,  B01D2311/246 ,  C02F1/441 ,  C02F2209/02

摘要： A reverse osmosis membrane separation device includes: a reverse osmosis membrane module; a flow rate detecting unit configured to detect a flow rate of permeate water to output a detected flow rate value corresponding to the flow rate; a pressure pump configured to be driven at a rotation speed corresponding to an input drive frequency and to feed supply water to the reverse osmosis membrane module; an inverter configured to output a drive frequency corresponding to an input current value signal to the pressure pump; and a control unit configured to calculate a drive frequency of the pressure pump by a velocity type digital PID algorithm, such that a detected flow rate value output from the flow rate detecting unit becomes a target flow rate value that is set in advance to output a current value signal corresponding to a calculation value of the drive frequency to the inverter.

摘要翻译： 反渗透膜分离装置包括：反渗透膜组件; 流量检测单元，被配置为检测渗透水的流量，以输出与流量对应的检测流量值; 压力泵，其构造成以与输入驱动频率对应的转速驱动，并将供水供给到所述反渗透膜组件; 反相器，被配置为将对应于输入电流值信号的驱动频率输出到所述压力泵; 以及控制单元，被配置为通过速度型数字PID算法来计算压力泵的驱动频率，使得从流量检测单元输出的检测流量值成为预先设定的目标流量值，以输出 电流值信号对应于到逆变器的驱动频率的计算值。

公开(公告)号：US09018075B2

公开(公告)日：2015-04-28

申请号：US13404162

申请日：2012-02-24

申请人： Toru Ito ,  Hiroaki Ishimura ,  Akito Kouchi ,  Hayato Watanabe

发明人： Toru Ito ,  Hiroaki Ishimura ,  Akito Kouchi ,  Hayato Watanabe

IPC分类号： H01L21/762

CPC分类号： H01L21/76229 ,  H01L21/3065 ,  H01L21/30655

摘要： The present invention provides a plasma processing method in which sideetching and microloading can be suppressed in a plasma processing method of forming trenches with a mask having a minimum opening width of 20 nm or less. The plasma processing method of the present invention is characterized by including the steps of forming trenches by plasma etching, forming a nitride film on sidewalls of trenches using plasma, and forming an oxide film on sidewalls and bottom surfaces of the trenches using plasma.

摘要翻译： 本发明提供了一种等离子体处理方法，其中在利用具有最小开口宽度为20nm或更小的掩模形成沟槽的等离子体处理方法中可以抑制边缘和微加载。 本发明的等离子体处理方法的特征在于包括通过等离子体蚀刻形成沟槽的步骤，使用等离子体在沟槽的侧壁上形成氮化物膜，以及使用等离子体在沟槽的侧壁和底表面上形成氧化物膜。

公开(公告)号：US20130164911A1

公开(公告)日：2013-06-27

申请号：US13404162

申请日：2012-02-24

申请人： Toru ITO ,  Hiroaki Ishimura ,  Akito Kouchi ,  Hayato Watanabe

发明人： Toru ITO ,  Hiroaki Ishimura ,  Akito Kouchi ,  Hayato Watanabe

IPC分类号： H01L21/762

CPC分类号： H01L21/76229 ,  H01L21/3065 ,  H01L21/30655

摘要： The present invention provides a plasma processing method in which sideetching and microloading can be suppressed in a plasma processing method of forming trenches with a mask having a minimum opening width of 20 nm or less. The plasma processing method of the present invention is characterized by including the steps of forming trenches by plasma etching, forming a nitride film on sidewalls of trenches using plasma, and forming an oxide film on sidewalls and bottom surfaces of the trenches using plasma.

摘要翻译： 本发明提供了一种等离子体处理方法，其中在利用具有最小开口宽度为20nm或更小的掩模形成沟槽的等离子体处理方法中可以抑制边缘和微加载。 本发明的等离子体处理方法的特征在于包括通过等离子体蚀刻形成沟槽的步骤，使用等离子体在沟槽的侧壁上形成氮化物膜，以及使用等离子体在沟槽的侧壁和底表面上形成氧化物膜。

公开(公告)号：US07937012B2

公开(公告)日：2011-05-03

申请号：US11376344

申请日：2006-03-16

申请人： Mitsuhiro Kawai ,  Hayato Watanabe

发明人： Mitsuhiro Kawai ,  Hayato Watanabe

IPC分类号： G03G15/00

CPC分类号： G03G15/5016 ,  B41J3/46

摘要： An angle adjusting device configured to support an operations panel so that up and down rotation of the operations panel against an apparatus main body can be made in a designated angle range and configured to adjust a rotational angle of the operations panel in up and down directions against the apparatus main body, the angle adjusting device includes i) a fixing member fixed to the apparatus main body, ii) a rotation member where the operations panel is provided, the rotation member being provided to the fixing member so as to be rotated with respect to a designated rotation shaft in the designated angle range, iii) a lock mechanism configured to lock rotation of the rotation member against the fixing member with respect to the rotation shaft, at one or more parts in the designated angle range, by using a force other than a frictional force between the fixing member and the rotation member, and iv) a setting mechanism configured to set a lock-on state and lock-off state of the lock mechanism.

摘要翻译： 一种角度调节装置，其构造成支撑操作面板，使得操作面板抵靠装置主体的上下旋转可以制成指定的角度范围，并且被配置为将操作面板的上下方向的旋转角度相对于 所述设备主体，所述角度调节装置包括：i）固定在所述装置主体上的固定构件，ii）设置有操作面板的旋转构件，所述旋转构件设置在所述固定构件上，以相对于 到指定角度范围内的指定旋转轴，iii）锁定机构，其构造成通过使用力来将所述旋转构件相对于所述旋转轴的旋转锁定在所述指定角度范围内的一个或多个部分处 除了固定构件和旋转构件之间的摩擦力之外，以及iv）设置用于设定锁定件m的锁定状态和锁定状态的设定机构 机制。

公开(公告)号：US07564002B2

公开(公告)日：2009-07-21

申请号：US11481818

申请日：2006-07-07

申请人： Hayato Watanabe

发明人： Hayato Watanabe

IPC分类号： H01H13/70

CPC分类号： H01H13/705 ,  G03G15/5016 ,  H01H2003/466 ,  H01H2219/05 ,  H01H2221/016 ,  H01H2221/064 ,  H01H2221/074 ,  H01H2223/024 ,  H01H2223/054

摘要： An electromechanical device including a key top member (i.e., a push button cover device) used in a push button mechanism. The key top member has a main body, a frame surrounding the main body, and a hinge portion supporting the key top main body. The hinge portion is formed integrally to the frame. The electromechanical device can be used in an operation panel of an image forming apparatus. The hinge and the main body are less susceptible to breakage during transport, installation and maintenance because they are surrounded by the frame.

摘要翻译： 一种机电装置，包括在按钮机构中使用的键顶构件（即，按钮盖装置）。 键顶构件具有主体，围绕主体的框架和支撑键顶主体的铰链部分。 铰链部分与框架一体形成。 机电装置可以用于图像形成装置的操作面板。 铰链和主体在运输，安装和维护时不易受到框架包围的破坏。