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    SYSTEM AND METHOD FOR CHARACTERIZING A FILM BY X-RAY PHOTOELECTRON AND LOW-ENERGY X-RAY FLUORESCENCE SPECTROSCOPY
    6.
    发明申请
    SYSTEM AND METHOD FOR CHARACTERIZING A FILM BY X-RAY PHOTOELECTRON AND LOW-ENERGY X-RAY FLUORESCENCE SPECTROSCOPY 有权
    用X射线光电子和低能量X射线荧光光谱表征薄膜的系统和方法

    公开(公告)号：US20130077742A1

    公开(公告)日：2013-03-28

    申请号：US13246488

    申请日：2011-09-27

    申请人： Bruno W. Schueler ,  David A. Reed ,  Jeffrey T. Fanton ,  Rodney Smedt

    发明人： Bruno W. Schueler ,  David A. Reed ,  Jeffrey T. Fanton ,  Rodney Smedt

    IPC分类号： G01N23/223 ,  G21K1/00

    CPC分类号： G21K1/06 ,  G01N23/223 ,  G01N23/2273 ,  G01N2223/61 ,  G21K2201/062 ,  G21K2201/064

    摘要： Systems and methods for characterizing films by X-ray photoelectron spectroscopy (XPS) are disclosed. For example, a system for characterizing a film may include an X-ray source for generating an X-ray beam having an energy below the k-edge of silicon. A sample holder may be included for positioning a sample in a pathway of the X-ray beam. A first detector may be included for collecting an XPS signal generated by bombarding the sample with the X-ray beam. A second detector may be included for collecting an X-ray fluorescence (XRF) signal generated by bombarding the sample with the X-ray beam. Monitoring/estimation of the primary X-ray flux at the analysis site may be provided by X-ray flux detectors near and at the analysis site. Both XRF and XPS signals may be normalized to the (estimated) primary X-ray flux to enable film thickness or dose measurement without the need to employ signal intensity ratios.

    摘要翻译： 公开了通过X射线光电子能谱（XPS）表征膜的系统和方法。 例如，用于表征胶片的系统可以包括用于产生具有低于硅的k边缘的能量的X射线束的X射线源。 可以包括样品保持器以将样品定位在X射线束的通路中。 可以包括第一检测器以收集通过用X射线束轰击样品而产生的XPS信号。 可以包括第二检测器，用于收集通过用X射线束轰击样品而产生的X射线荧光（XRF）信号。 在分析现场的X射线通量探测器附近和分析现场可以提供监测/估计分析现场的主要X射线通量。 XRF和XPS信号都可以归一化为（估计的）初级X射线通量，以实现膜厚度或剂量测量，而不需要使用信号强度比。

    System and method for characterizing a film by X-ray photoelectron and low-energy X-ray fluorescence spectroscopy
    7.
    发明授权
    System and method for characterizing a film by X-ray photoelectron and low-energy X-ray fluorescence spectroscopy 有权
    通过X射线光电子和低能X射线荧光光谱表征膜的系统和方法

    公开(公告)号：US09240254B2

    公开(公告)日：2016-01-19

    申请号：US13246488

    申请日：2011-09-27

    申请人： Bruno W. Schueler ,  David A. Reed ,  Jeffrey Thomas Fanton ,  Rodney Smedt

    发明人： Bruno W. Schueler ,  David A. Reed ,  Jeffrey Thomas Fanton ,  Rodney Smedt

    IPC分类号： G01N23/223 ,  G21K1/00 ,  G21K1/06 ,  G01N23/227

    CPC分类号： G21K1/06 ,  G01N23/223 ,  G01N23/2273 ,  G01N2223/61 ,  G21K2201/062 ,  G21K2201/064

    摘要： Systems and methods for characterizing films by X-ray photoelectron spectroscopy (XPS) are disclosed. For example, a system for characterizing a film may include an X-ray source for generating an X-ray beam having an energy below the k-edge of silicon. A sample holder may be included for positioning a sample in a pathway of the X-ray beam. A first detector may be included for collecting an XPS signal generated by bombarding the sample with the X-ray beam. A second detector may be included for collecting an X-ray fluorescence (XRF) signal generated by bombarding the sample with the X-ray beam. Monitoring/estimation of the primary X-ray flux at the analysis site may be provided by X-ray flux detectors near and at the analysis site. Both XRF and XPS signals may be normalized to the (estimated) primary X-ray flux to enable film thickness or dose measurement without the need to employ signal intensity ratios.

    摘要翻译： 公开了通过X射线光电子能谱（XPS）表征膜的系统和方法。 例如，用于表征胶片的系统可以包括用于产生具有低于硅的k边缘的能量的X射线束的X射线源。 可以包括样品保持器以将样品定位在X射线束的通路中。 可以包括第一检测器以收集通过用X射线束轰击样品而产生的XPS信号。 可以包括第二检测器，用于收集通过用X射线束轰击样品而产生的X射线荧光（XRF）信号。 在分析现场的X射线通量探测器附近和分析现场可以提供监测/估计分析现场的主要X射线通量。 XRF和XPS信号都可以归一化为（估计的）初级X射线通量，以实现膜厚度或剂量测量，而不需要使用信号强度比。

    Photoelectron spectroscopy apparatus and method of use
    8.
    发明授权
    Photoelectron spectroscopy apparatus and method of use 有权
    光电子能谱仪及其使用方法

    公开(公告)号：US07399963B2

    公开(公告)日：2008-07-15

    申请号：US11237041

    申请日：2005-09-27

    申请人： Bruno W. Schueler ,  David A. Reed

    发明人： Bruno W. Schueler ,  David A. Reed

    IPC分类号： H01J40/00

    CPC分类号： G01N23/2273 ,  G01N2223/085 ,  G01N2223/6116 ,  H01J2235/08

    摘要： According to one aspect of the present invention, a substrate processing system is provided. The system may include a chamber wall enclosing a chamber, a substrate support positioned within the chamber to support a substrate, an electromagnetic radiation source to emit electromagnetic radiation onto the substrate on the substrate support, the electromagnetic radiation causing photoelectrons to be emitted from a material on the substrate, an analyzer to capture the photoelectrons emitted from the substrate, and a magnetic field generator to generate a magnetic field within the chamber and guide the photoelectrons from the substrate to the analyzer.

    摘要翻译： 根据本发明的一个方面，提供了一种基板处理系统。 该系统可以包括封闭室的室壁，位于腔室内以支撑衬底的衬底支撑件，用于向衬底支撑件上的衬底上发射电磁辐射的电磁辐射源，引起光电子从材料发射的电磁辐射 在基板上，分析器捕获从基板发射的光电子，以及磁场发生器，以在室内产生磁场，并将光电子从基板引导到分析器。

    Particle analyzer apparatus and method
    9.
    发明授权
    Particle analyzer apparatus and method 失效
    粒子分析装置及方法

    公开(公告)号：US5128543A

    公开(公告)日：1992-07-07

    申请号：US425568

    申请日：1989-10-23

    申请人： David A. Reed ,  Bruno W. Schueler

    发明人： David A. Reed ,  Bruno W. Schueler

    IPC分类号： H01J37/256 ,  H01J49/14 ,  H01J49/40

    CPC分类号： H01J37/256 ,  H01J49/142 ,  H01J49/408 ,  H01J2237/2527

    摘要： A time-of-flight analyzer, such as a secondary ion surface analyzer, and method are disclosed wherein a beam of charged particles is created, magnified, directed along a path to a detector, detected and the time of flight measured. An emission lens is positioned on the path to produce the magnification and an additional lens can be provided along the path to produce variable magnification. A field aperture along the path limits the size of the image and a contrast diaphragm limits the lateral ion velocity. Two or more, preferably three, particle steering analyzers are sequentially positioned along the path from the emission lens to the detector with each of the three analyzers steering the particles through substantially 90 degrees.

    摘要翻译： 公开了一种飞行时间分析仪，例如二次离子表面分析仪和方法，其中产生，放大，沿检测器的路径被引导的带电粒子束，并且测量飞行时间。 发射透镜位于路径上以产生放大倍数，并且可以沿着路径提供附加透镜以产生可变放大倍率。 沿着路径的场孔径限制了图像的尺寸，而对比度膜片限制了横向离子速度。 两个或更多个，优选三个，颗粒转向分析器沿着从发射透镜到检测器的路径顺序地定位，三个分析器中的每一个分别将颗粒转向大致90度。

    METHOD AND SYSTEM FOR CALIBRATING AN X-RAY PHOTOELECTRON SPECTROSCOPY MEASUREMENT
    10.
    发明申请
    METHOD AND SYSTEM FOR CALIBRATING AN X-RAY PHOTOELECTRON SPECTROSCOPY MEASUREMENT 有权
    用于校准X射线光电子能谱测量的方法和系统

    公开(公告)号：US20090268877A1

    公开(公告)日：2009-10-29

    申请号：US12430687

    申请日：2009-04-27

    申请人： Bruno W. Schueler ,  David A. Reed ,  Bruce H. Newcome ,  Jeffrey A. Moore

    发明人： Bruno W. Schueler ,  David A. Reed ,  Bruce H. Newcome ,  Jeffrey A. Moore

    IPC分类号： G01D18/00

    CPC分类号： G01N23/2273

    摘要： A method and a system for calibrating an X-ray photoelectron spectroscopy (XPS) measurement are described. The method includes using an X-ray beam to generate an XPS signal from a sample and normalizing the XPS signal with a measured or estimated flux of the X-ray beam. The system includes an X-ray source for generating an X-ray beam and a sample holder for positioning a sample in a pathway of the X-ray beam. A detector is included for collecting an XPS signal generated by bombarding the sample with the X-ray beam. Also included are a flux detector for determining a measured or estimated flux of the X-ray beam and a computing system for normalizing the XPS signal with the measured or estimated flux of the X-ray beam.

    摘要翻译： 描述了用于校准X射线光电子能谱（XPS）测量的方法和系统。 该方法包括使用X射线束从样本产生XPS信号并用X射线束的测量或估计的通量对XPS信号进行归一化。 该系统包括用于产生X射线束的X射线源和用于将样品定位在X射线束的路径中的样本保持器。 包括检测器以收集通过用X射线束轰击样品产生的XPS信号。 还包括用于确定X射线束的测量或估计通量的通量检测器，以及用于利用X射线束的测量或估计通量对XPS信号进行归一化的计算系统。