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    Pump element and pump having such a pump element
    1.
    发明授权
    Pump element and pump having such a pump element 有权
    具有这种泵元件的泵元件和泵

    公开(公告)号：US08241019B2

    公开(公告)日：2012-08-14

    申请号：US12303979

    申请日：2007-03-27

    申请人： Heinz Kueck ,  Daniel Benz ,  Frank Wolter

    发明人： Heinz Kueck ,  Daniel Benz ,  Frank Wolter

    IPC分类号： F04B7/04 ,  F04B39/10

    CPC分类号： F04B7/0076 ,  F04B7/04 ,  F04B17/042 ,  F04B17/044 ,  F04B53/12

    摘要： A pump element includes a pump element housing defining a pump chamber having an inlet and an outlet, and at least a first movable element movable in the pump chamber between a first and a second position. During a movement of the first movable element in the direction from the first to the second position, a flow resistance of a flow path from the first movable element through the inlet is larger than a flow resistance of a flow path between the pump element housing and the first movable element. During a movement of the first movable element in the direction from the second position to the first position, a flow resistance of a flow path from the first movable element through the outlet is smaller than a flow resistance of the flow path between the pump element housing and the first movable element. Thus, during a reciprocating movement of the first movable element between the first and the second position, a net flow through the outlet takes place.

    摘要翻译： 泵元件包括限定具有入口和出口的泵室的泵元件壳体，以及可在泵室中在第一和第二位置之间移动的至少第一可移动元件。 在第一可移动元件在从第一位置到第二位置的方向移动期间，来自第一可移动元件的通过入口的流路的流动阻力大于泵元件壳体和 第一个可移动元件。 在第一可移动元件在从第二位置到第一位置的方向移动期间，从第一可移动元件通过出口的流路的流动阻力小于泵元件壳体 和第一可移动元件。 因此，在第一可移动元件在第一和第二位置的往复运动期间，发生通过出口的净流。

    PUMP ELEMENT AND PUMP HAVING SUCH A PUMP ELEMENT
    2.
    发明申请
    PUMP ELEMENT AND PUMP HAVING SUCH A PUMP ELEMENT 有权
    泵泵元件和泵具有这样的泵元件

    公开(公告)号：US20090180905A1

    公开(公告)日：2009-07-16

    申请号：US12303979

    申请日：2007-03-27

    申请人： Heinz Kueck ,  Daniel Benz ,  Frank Wolter

    发明人： Heinz Kueck ,  Daniel Benz ,  Frank Wolter

    IPC分类号： F04B7/04 ,  F04B17/04 ,  F04B53/12

    CPC分类号： F04B7/0076 ,  F04B7/04 ,  F04B17/042 ,  F04B17/044 ,  F04B53/12

    摘要： A pump element includes a pump element housing defining a pump chamber having an inlet and an outlet, and at least a first movable element movable in the pump chamber between a first and a second position. During a movement of the first movable element in the direction from the first to the second position, a flow resistance of a flow path from the first movable element through the inlet is larger than a flow resistance of a flow path between the pump element housing and the first movable element. During a movement of the first movable element in the direction from the second position to the first position, a flow resistance of a flow path from the first movable element through the outlet is smaller than a flow resistance of the flow path between the pump element housing and the first movable element. Thus, during a reciprocating movement of the first movable element between the first and the second position, a net flow through the outlet takes place.

    摘要翻译： 泵元件包括限定具有入口和出口的泵室的泵元件壳体，以及可在泵室中在第一和第二位置之间移动的至少第一可移动元件。 在第一可移动元件在从第一位置到第二位置的方向移动期间，来自第一可移动元件的通过入口的流路的流动阻力大于泵元件壳体和 第一个可移动元件。 在第一可移动元件在从第二位置到第一位置的方向移动期间，从第一可移动元件通过出口的流路的流动阻力小于泵元件壳体 和第一可移动元件。 因此，在第一可移动元件在第一和第二位置的往复运动期间，发生通过出口的净流。

    ILLUMINATION SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS
    3.
    发明申请
    ILLUMINATION SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS 有权
    微波投影曝光装置的照明系统

    公开(公告)号：US20110181850A1

    公开(公告)日：2011-07-28

    申请号：US13044160

    申请日：2011-03-09

    申请人： Florian Bach ,  Daniel Benz ,  Severin Waldis ,  Armin Werber ,  Berndt Warm

    发明人： Florian Bach ,  Daniel Benz ,  Severin Waldis ,  Armin Werber ,  Berndt Warm

    IPC分类号： G03B27/54

    CPC分类号： G03F7/70058 ,  G03F7/70116 ,  G03F7/70141 ,  G03F7/70266 ,  G03F7/70291 ,  G03F7/70891

    摘要： An illumination system of a microlithographic projection exposure apparatus includes a primary light source, a system pupil surface and a mirror array. The mirror array is arranged between the primary light source and the system pupil surface. The mirror array includes a plurality of adaptive mirror elements. Each mirror element includes a mirror support and a reflective coating. Each mirror element is configured to direct light produced by the primary light source towards the system pupil surface. The mirror elements can be tiltably mounted with respect to a support structure. The mirror elements include structures having a different coefficient of thermal expansion and being fixedly attached to one another. A temperature control device is configured to variably modify the temperature distribution within the structures to change the shape of the mirror elements.

    摘要翻译： 微光刻投影曝光装置的照明系统包括主光源，系统光瞳表面和反射镜阵列。 镜阵列布置在主光源和系统光瞳表面之间。 镜阵列包括多个自适应镜元件。 每个镜子元件包括镜子支撑和反射涂层。 每个镜元件被构造成将由主光源产生的光引向系统光瞳表面。 反射镜元件可相对于支撑结构倾斜地安装。 反射镜元件包括具有不同热膨胀系数并且彼此固定地附接的结构。 温度控制装置被配置为可变地修改结构内的温度分布以改变反射镜元件的形状。

    Mirror for guiding a radiation bundle
    4.
    发明授权
    Mirror for guiding a radiation bundle 有权
    用于引导辐射束的镜子

    公开(公告)号：US08717531B2

    公开(公告)日：2014-05-06

    申请号：US12707783

    申请日：2010-02-18

    申请人： Severin Waldis ,  Florian Bach ,  Daniel Benz ,  Armin Werber ,  Wilfried Noell ,  Dirk Heinrich Ehm ,  Stefan Wiesner ,  Dieter Kraus

    发明人： Severin Waldis ,  Florian Bach ,  Daniel Benz ,  Armin Werber ,  Wilfried Noell ,  Dirk Heinrich Ehm ,  Stefan Wiesner ,  Dieter Kraus

    IPC分类号： G03B27/52

    CPC分类号： G02B7/1815 ,  G02B5/0808 ,  G02B5/0891 ,  G03F7/70825 ,  G03F7/70891

    摘要： A mirror serves for guiding a radiation bundle. The mirror has a basic body and a coating of a reflective surface of the basic body, the coating increasing the reflectivity of the mirror. A heat dissipating device serves for dissipating heat deposited in the coating. The heat dissipating device has at least one Peltier element. The coating is applied directly on the Peltier element. A temperature setting apparatus has at least one temperature sensor for a temperature of the reflective surface. A regulating device of the Temperature setting apparatus can be connected to the at least one Peltier element and is signal-connected to the at least one temperature sensor. The result is a mirror in which a heat dissipating capacity of the heat dissipating device is improved.

    摘要翻译： 反射镜用于引导辐射束。 反射镜具有基体和基体的反射表面的涂层，涂层增加了反射镜的反射率。 散热装置用于消散沉积在涂层中的热量。 散热装置具有至少一个珀耳帖元件。 涂层直接施加在珀耳帖元件上。 温度设定装置具有至少一个用于反射表面的温度的温度传感器。 温度设定装置的调节装置可以连接到至少一个珀耳帖元件，并且与至少一个温度传感器信号连接。 结果是提供了散热装置的散热能力的反射镜。

    Illumination system of a microlithographic projection exposure apparatus having a temperature control device
    6.
    发明授权
    Illumination system of a microlithographic projection exposure apparatus having a temperature control device 有权
    具有温度控制装置的微光刻投影曝光装置的照明系统

    公开(公告)号：US08797507B2

    公开(公告)日：2014-08-05

    申请号：US13044160

    申请日：2011-03-09

    申请人： Florian Bach ,  Daniel Benz ,  Severin Waldis ,  Armin Werber ,  Berndt Warm

    发明人： Florian Bach ,  Daniel Benz ,  Severin Waldis ,  Armin Werber ,  Berndt Warm

    IPC分类号： G03B27/52 ,  G03B27/54

    CPC分类号： G03F7/70058 ,  G03F7/70116 ,  G03F7/70141 ,  G03F7/70266 ,  G03F7/70291 ,  G03F7/70891

    摘要： An illumination system of a microlithographic projection exposure apparatus includes a primary light source, a system pupil surface and a mirror array. The mirror array is arranged between the primary light source and the system pupil surface. The mirror array includes a plurality of adaptive mirror elements. Each mirror element includes a mirror support and a reflective coating. Each mirror element is configured to direct light produced by the primary light source towards the system pupil surface. The mirror elements can be tiltably mounted with respect to a support structure. The mirror elements include structures having a different coefficient of thermal expansion and being fixedly attached to one another. A temperature control device is configured to variably modify the temperature distribution within the structures to change the shape of the mirror elements.

    摘要翻译： 微光刻投影曝光装置的照明系统包括主光源，系统光瞳表面和反射镜阵列。 镜阵列布置在主光源和系统光瞳表面之间。 镜阵列包括多个自适应镜元件。 每个镜子元件包括镜子支撑和反射涂层。 每个镜元件被构造成将由主光源产生的光引向系统光瞳表面。 反射镜元件可相对于支撑结构倾斜地安装。 反射镜元件包括具有不同热膨胀系数并且彼此固定地附接的结构。 温度控制装置被配置为可变地修改结构内的温度分布以改变反射镜元件的形状。

    MIRROR FOR GUIDING A RADIATION BUNDLE
    8.
    发明申请
    MIRROR FOR GUIDING A RADIATION BUNDLE 有权
    用于指导辐射器的镜子

    公开(公告)号：US20100261120A1

    公开(公告)日：2010-10-14

    申请号：US12707783

    申请日：2010-02-18

    申请人： Severin Waldis ,  Florian Bach ,  Daniel Benz ,  Armin Werber ,  Wilfried Noell ,  Dirk Heinrich Ehm ,  Stefan Wiesner ,  Dieter Kraus

    发明人： Severin Waldis ,  Florian Bach ,  Daniel Benz ,  Armin Werber ,  Wilfried Noell ,  Dirk Heinrich Ehm ,  Stefan Wiesner ,  Dieter Kraus

    IPC分类号： G03F7/20 ,  G03B27/72 ,  G02B7/192

    CPC分类号： G02B7/1815 ,  G02B5/0808 ,  G02B5/0891 ,  G03F7/70825 ,  G03F7/70891

    摘要： A mirror serves for guiding a radiation bundle. The mirror has a basic body and a coating of a reflective surface of the basic body, the coating increasing the reflectivity of the mirror. A heat dissipating device serves for dissipating heat deposited in the coating. The heat dissipating device has at least one Peltier element. The coating is applied directly on the Peltier element. A temperature setting apparatus has at least one temperature sensor for a temperature of the reflective surface. A regulating device of the Temperature setting apparatus can be connected to the at least one Peltier element and is signal-connected to the at least one temperature sensor. The result is a mirror in which a heat dissipating capacity of the heat dissipating device is improved.

    摘要翻译： 反射镜用于引导辐射束。 反射镜具有基体和基体的反射表面的涂层，涂层增加了反射镜的反射率。 散热装置用于消散沉积在涂层中的热量。 散热装置具有至少一个珀耳帖元件。 涂层直接施加在珀耳帖元件上。 温度设定装置具有至少一个用于反射表面的温度的温度传感器。 温度设定装置的调节装置可以连接到至少一个珀耳帖元件，并且与至少一个温度传感器信号连接。 结果是提供了散热装置的散热能力的反射镜。